Abstract: An apparatus for predicting hypoglycemia according to an exemplary embodiment of the present disclosure is an apparatus for predicting hypoglycemia, which predicts the occurrence of postprandial hypoglycemia using blood glucose-related information, wherein the blood glucose-related information includes a blood glucose level at a reference time, a blood glucose change rate over a duration from a mealtime to a postprandial peak blood glucose level time, a blood glucose change rate over a duration from the postprandial peak blood glucose level time to the reference time, and a blood glucose change rate at the reference time.

Abstract: A method of determining a continuous drug dose using reinforcement learning and a pharmacokinetic-pharmacodynamic model according to an embodiment of the present invention includes, measuring or estimating a patient's pharmacokinetic-pharmacodynamic model; training a reinforcement learning algorithm using drug infusion data and patient state data based on the pharmacokinetic-pharmacodynamic model; and automatically determining a continuous drug dose by the trained reinforcement learning algorithm.

Abstract: Proposed is a composition for a thick hard mask suitable for use in a semiconductor lithography process, and particularly a spin-on carbon hard mask composition and a patterning method of forming a hard mask layer by applying the composition on an etching target layer through spin coating and baking the composition. The composition has high solubility characteristics, thereby enabling the formation of a thick hard mask which can exhibit high etching resistance to tolerate multiple etching processes and excellent mechanical properties.

Abstract: The present disclosure relates to a method of forming an etching pattern in a semiconductor manufacturing process. Unlike a conventional method of forming a four-layer structure composed of a photoresist film, an anti-reflective film, a SiON film, and an organic hard mask film on a wafer, as preparation for an etching process, the method according to the present disclosure is an innovative etching pattern forming method capable of implementing the same etching pattern as is formed by the conventional method, using a double-layer structure composed of a photoresist film and a multifunctional organic-inorganic mask film.

Abstract: Disclosed is a method of manufacturing a transparent stretchable substrate according to various embodiments of the present disclosure. The method may include generating a substrate part formed of an elastic material, generating an auxetic including a plurality of unit structures on the substrate part, and generating a fixing part on the substrate part on which the auxetic is generated.

Abstract: A variable intake system for a vehicle is provided and includes an air cleaner that filters air via a filter and supplies the air to an engine. A main duct is connected to the air cleaner to supply the air, and a variable valve has a housing that is coupled and mounted to a mounting aperture of a mounting part disposed on a front end of the filter of the air cleaner. An internal passage of the housing is opened by suction pressure of the engine in the mounting part to suction external air. A projection formed on the housing of the variable valve is inserted into a projection seat formed in the mounting part, so that the variable valve is secured to the mounting part.

Abstract: Proposed are a CMP slurry composition and a polishing method using the same. The CMP slurry composition in which the zeta potential of colloidal silica serving as an abrasive is properly controlled and metal impurities are removed from the colloidal silica and to a polishing method using the same. The CMP slurry composition is configured to improve a polishing performance for a silicon oxide film, minimize scratches on a finished surface, and to enable adjustment of a content ratio of an abrasive and an additive in the composition, thereby enabling adjustment of a polishing selectivity among a silicon oxide film, a silicon nitride film, and a polysilicon film.

Abstract: The present invention relates to a method of determining the concentration of silicon based on the solubility of silicon in a phosphoric acid solution to determine the concentration of silicon generated in the process of etching silicon nitride. The silicon concentration determination method can determine the concentration of only the silicon that is generated during a process of etching silicon nitride using a phosphoric acid solution. The method optically determines the concentration of a silicon compound that is added to increase selectivity.

Abstract: The present invention provides: a peptide having antibacterial activity; a composition for preventing or treating sepsis comprising same; and an antibacterial composition. More specifically, the peptide according to the present invention has the excellent effects of not only suppressing the growth of bacteria but removing endotoxins derived from bacteria, thus exhibiting an excellent therapeutic effect on sepsis, and thus can be usefully used to prevent or treat sepsis. In addition, the peptide according to the present invention has selectively excellent antibacterial activity against Gram positive/negative bacteria, and thus can be usefully used in an antibacterial composition for Gram-positive/negative bacteria, or to prevent or treat various infectious diseases caused by Gram-positive/negative bacteria.

Abstract: The present disclosure relates to a semiconductor wafer cleaning composition for used in a semiconductor device manufacturing process and to a method of cleaning a semiconductor wafer using the cleaning composition. The cleaning composition includes surfactants represented by Formula 1 and Formula 2, respectively, an organic or inorganic acid, and water occupying for the remaining proportion. The cleaning method is a method of immersing a semiconductor wafer in the cleaning composition for 100 to 500 seconds. The cleaning composition and the cleaning method according to the present disclosure provide an incredibility improved removal rate and an effective cleaning power for contaminants, especially organic wax, during a process of polishing the surface of a wafer used to manufacture semiconductor devices, thereby providing a super-cleaned wafer surface, resulting in production of reliable semiconductor devices.

Abstract: The present invention relates to an etching composition for selectively etching a silicon nitride layer. The etching composition includes an inorganic acid, an epoxy-based silicon compound, and water. The etching composition of the present invention selectively removes a silicon nitride layer while minimizing damage to an underlying metal layer and preventing a silicon oxide layer from being etched.

Abstract: Provided is a composition for shrinking a photoresist pattern, which is capable of shrinking a photoresist pattern using a photoresist during the fabrication of a semiconductor, and to a method of shrinking a pattern using the composition, whereby a pattern to be formed can be shrunken in a photoresist-patterning process, thus remarkably decreasing the number of steps of a semiconductor fabrication process and reducing the fabrication time and costs.

Abstract: Disclosed is a method of forming a fine silicon pattern with a high aspect ratio for fabrication of a semiconductor device. The method includes a cleaning process of removing organic residue or reside originating in fumes using a cleaning solution, thereby enabling formation of a desired pattern while preventing the pattern from being lifted. Thus, the present disclosure enables formation of a fine pattern by using a novel cleaning method.

Abstract: A coated separator for a secondary battery including a separator substrate including a porous polymer resin; and a coating layer present on at least one surface of the separator substrate. The coating layer includes an inorganic material and a coupling agent, the inorganic material comprises a hydroxide of a metal, or a hydroxide of a metal oxide, and the coupling agent is a titanium-based or a silane-based coupling agent.

Abstract: The present invention relates to an antigen-binding molecule comprising a heavy chain variable region comprising a heavy-chain complementarity-determining region 1 (HCDR1) comprising an amino acid sequence represented by Sequence No. 1, an HCDR2 comprising an amino acid sequence represented by Sequence No. 2, and an HCDR3 comprising an amino acid sequence represented by Sequence No. 3; a light-chain variable region comprising a light-chain complementarity-determining region 1 (LCDR1) comprising an amino acid sequence represented by Sequence No. 4, an LCDR2 comprising an amino acid sequence represented by Sequence No. 5, and an LCDR3 comprising an amino acid sequence represented by Sequence No. 6; wherein the antigen-binding molecule is a T cell receptor (TCR); and to a cell line expressing the same.

Abstract: An injector failure cylinder diagnosis method based on signal deviation of an injector failure diagnosis system measures, by a controller, noise/vibration signals due to the combustion of an engine, separates an injector abnormal frequency band signal as an injector signal from the noise/vibration signals, divides cylinder number time series data, which use a signal maximum value of the noise/vibration signals as a cylinder #1, into segments, extracts a feature vector after confirming a segment number of the cylinder #1 with a vibration reduction signal of the noise/vibration signals re-measured using one of the cylinders as an idle cylinder and sorting it by injector causing vibration time series data, and confirms a failure injector with the feature vector, thereby independently diagnosing whether the injector for each cylinder is normal or abnormal considering the deviation of the noise/vibration signals between the injectors for each cylinder from the measured noise and vibration signals.

Abstract: Proposed are a processing solution for reducing the incidence of pattern collapse and the number of defects in a photoresist pattern including polyhydroxystyrene using extreme ultraviolet rays as an exposure source, and a method of forming a pattern using the same. The processing solution for reducing the incidence of photoresist pattern collapse and the number of defects includes 0.0001 to 1 wt % of an alkaline material, 0.0001 to 1 wt % of an anionic surfactant, and 98 to 99.9998 wt % of water.

Abstract: A display device includes a polycrystalline semiconductor including a channel, a first electrode, and a second electrode of a driving transistor, a first gate insulating layer, a gate electrode of a driving transistor, a first electrode of a boost capacitor, a second gate insulating layer, a first interlayer insulating layer, an oxide semiconductor including a channel, a first electrode, and a second electrode of a second transistor, a channel, a first electrode, and a second electrode of a third transistor, and a second electrode of a boost capacitor, a third gate insulating layer disposed on the oxide semiconductor, a gate electrode of the second transistor overlapping the channel of the second transistor, a gate electrode of the third transistor overlapping the channel of the third transistor, and a second interlayer insulating layer disposed on the gate electrode of the second transistor and the gate electrode of the third transistor.

Abstract: An injector failure cylinder diagnosis method based on signal deviation of an injector failure diagnosis system measures, by a controller, noise/vibration signals due to the combustion of an engine, separates an injector abnormal frequency band signal as an injector signal from the noise/vibration signals, divides cylinder number time series data, which use a signal maximum value of the noise/vibration signals as a cylinder #1, into segments, extracts a feature vector after confirming a segment number of the cylinder #1 with a vibration reduction signal of the noise/vibration signals re-measured using one of the cylinders as an idle cylinder and sorting it by injector causing vibration time series data, and confirms a failure injector with the feature vector, thereby independently diagnosing whether the injector for each cylinder is normal or abnormal considering the deviation of the noise/vibration signals between the injectors for each cylinder from the measured noise and vibration signals.

Abstract: Disclosed is a method and an apparatus for transmitting and receiving data via a MAC protocol in a mobile communication system. The method includes inputting at least one Service Data Unit (SDU) containing transmission data through a corresponding logical channel and generating at least one first Protocol Data Unit (PDU) that includes said at least one SDU without including multiplexing information for identification of the logical channel, by a first transmission entity; acquiring the first PDU and generating a second PDU including the first PDU in a payload of the second PDU, by a second transmission entity that operates between the first transmission entity and a physical layer; inserting the multiplexing information for identification of the logical channel corresponding to said at least one first PDU into header information of the second PDU; and transmitting the second PDU through the physical layer.