Patents by Inventor Seung-Hyup Shin

Seung-Hyup Shin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220229953
    Abstract: A holographic display simulation device and a holographic display simulation method are provided. A holographic display simulation device includes a processor; and a memory including one or more instructions, wherein the one or more instructions are executed by the processor, and a holographic display is simulated by using at least one of a light source part model, a spatial light modulator model, and a display optical system model that respectively model a light source part, a spatial light modulator, and a display optical system of the holographic display.
    Type: Application
    Filed: December 6, 2021
    Publication date: July 21, 2022
    Inventors: Jeho NAM, Min-Sik PARK, Seung Hyup SHIN
  • Publication number: 20220075258
    Abstract: A blankmask includes a hard film and a light-shielding film formed on a transparent substrate. The hard film is made of a silicon compound that contains at least one of oxygen, nitrogen and carbon in addition to silicon. There are provided a blankmask and a photomask improved in resolution, desired critical dimension (CD), and process window margin. Thus, it is possible to manufacture a blankmask and a photomask of good quality when a pattern of 32 nm or below, in particular, 14 nm or below is formed.
    Type: Application
    Filed: December 20, 2019
    Publication date: March 10, 2022
    Applicant: S&S TECH Co., Ltd.
    Inventors: Cheol SHIN, Jong-Hwa LEE, Chul-Kyu YANG, Min-Ki CHOI, Seung-Hyup SHIN, Gil-Woo KONG
  • Publication number: 20210171478
    Abstract: Proposed are a polymerizable compound, a polymerizable composition, and an optical film using the same, which can exhibit superior optical properties in a wide wavelength range by reducing wavelength dependence or exhibiting reverse-wavelength dispersibility.
    Type: Application
    Filed: December 4, 2020
    Publication date: June 10, 2021
    Inventors: Ji Ho YUN, Young Kuk Kim, Sung Il Yoon, Jun Yong Song, Seung Hyup Shin, Jin Wuk Kim
  • Publication number: 20200379337
    Abstract: A blankmask includes a transparent substrate, a phase-shift film, and a light-shielding film. The phase-shift film for example has a transmissivity of 30˜100%, and in this case the light-shielding film has a thickness of 40˜70 nm and a composition ratio of 30˜80 at % chromium, 10˜50 at % nitrogen, 0˜35% oxygen, and 0˜25% carbon. A structure where the light-shielding film and the phase-shift film are stacked has an optical density of 2.5˜3.5. Thus, CD deviation is minimized when the light-shielding film is etched in a manufacturing process for a photomask.
    Type: Application
    Filed: May 13, 2020
    Publication date: December 3, 2020
    Applicant: S&S TECH Co., Ltd.
    Inventors: Cheol SHIN, Jong-Hwa LEE, Chul-Kyu YANG, Min-Ki CHOI, Seung-Hyup SHIN
  • Publication number: 20200182701
    Abstract: A method and an apparatus for measuring a coherence of a light source of a holographic display through steps of: photographing an interference pattern generated by light output from the light source; obtaining an interference pattern feature information with respect to the interference pattern from an interference pattern image of the interference pattern; and measuring the coherence of the light source based on the interference pattern feature information, are provided.
    Type: Application
    Filed: August 27, 2019
    Publication date: June 11, 2020
    Inventors: Jeho NAM, Min-Sik PARK, Seung Hyup SHIN
  • Publication number: 20180335691
    Abstract: A phase-shift blankmask according to the present disclosure includes a phase-shift film having a multi-layered film structure including two or more layers on a transparent substrate, in which the phase-shift film includes one among silicon (Si) only and silicon (Si) compounds without substantially containing transition metal. The phase-shift film according to the present disclosure is made of a silicon (Si)-based material without containing transition metal, thereby providing a blankmask and a photomask which are excellent in light-exposure resistance to exposure light and chemical resistance to chemical cleaning, precisely controlling the CD of a pattern, and increasing the life-time of the photomask.
    Type: Application
    Filed: May 16, 2018
    Publication date: November 22, 2018
    Applicant: S&S TECH Co., Ltd.
    Inventors: Kee-Soo NAM, Cheol SHIN, Jong-Hwa LEE, Chul-Kyu YANG, Seung-Hyup SHIN, Gil-Woo KONG
  • Publication number: 20180335692
    Abstract: Disclosed are a phase-shift blankmask and a phase-shift photomask, which includes a phase-shift film made of silicon (Si) or a silicon (Si) compound on a transparent substrate and has a high transmittance characteristic. In the phase-shift blankmask according to the present disclosure, the phase-shift film has a high transmittance of 50% or higher, thereby achieving a micro pattern smaller than or equal to 32 nm, preferably 14 nm, and more preferably 10 nm for a semiconductor device, for example, a DRAM, a flash memory, a logic device.
    Type: Application
    Filed: May 9, 2018
    Publication date: November 22, 2018
    Applicant: S&S TECH Co., Ltd.
    Inventors: Kee-Soo NAM, Cheol SHIN, Jong-Hwa LEE, Chul-Kyu YANG, Chang-Jun KIM, Seung-Hyup SHIN, Gil-Woo KONG
  • Patent number: 9790877
    Abstract: A method of controlling exhaust gas recirculation (EGR) for controlling recirculation of exhaust gas discharged from a combustion chamber of an engine includes: a data obtaining operation of obtaining data about an engine state and a gas supply state; a current EGR rate calculating operation of calculating a current EGR rate of supply gas based on the data; a demand EGR rate setting operation of setting a demand EGR rate matched with the data in a pre-made target EGR rate map; an error calculating operation of calculating a difference between the demand EGR rate and the current EGR rate; and a control operation of making the current EGR rate follow the demand EGR rate by changing a recirculation rate of the exhaust gas by adjusting an inhalation side pressure of the supply gas according to the difference.
    Type: Grant
    Filed: December 13, 2013
    Date of Patent: October 17, 2017
    Assignee: Doosan Infracore Co., Ltd.
    Inventors: Eui Joon Shim, Young Deok Han, Seung Hyup Shin
  • Publication number: 20150345415
    Abstract: A method of controlling exhaust gas recirculation (EGR) for controlling recirculation of exhaust gas discharged from a combustion chamber of an engine includes: a data obtaining operation of obtaining data about an engine state and a gas supply state; a current EGR rate calculating operation of calculating a current EGR rate of supply gas based on the data; a demand EGR rate setting operation of setting a demand EGR rate matched with the data in a pre-made target EGR rate map; an error calculating operation of calculating a difference between the demand EGR rate and the current EGR rate; and a control operation of making the current EGR rate follow the demand EGR rate by changing a recirculation rate of the exhaust gas by adjusting an inhalation side pressure of the supply gas according to the difference.
    Type: Application
    Filed: December 13, 2013
    Publication date: December 3, 2015
    Inventors: Eui Joon SHIM, Young Deok HAN, Seung Hyup SHIN
  • Patent number: 9169409
    Abstract: Disclosed are an ink composition for an imprint lithography and a roll printing, wherein in forming patterns of the LCD device using the imprint lithography and the roll printing, an ink composition with high thermal resistance, consisting of polymer resin and additive both endurable even at a high temperature is used to form fine patterns with constantly maintaining pattern linewidths and line intervals, and wherein the ink composition is endurable even at a high temperature of 90-250° C.
    Type: Grant
    Filed: November 4, 2014
    Date of Patent: October 27, 2015
    Assignee: LG Display Co., Ltd.
    Inventors: Sung-Hee Kim, Soon-Sung Yoo, Jin-Wuk Kim, Byung-Geol Kim, Byung-Uk Kim, Ki-Beom Lee, Byong-Hoo Kim, Seung-Hyup Shin, Jun-Yong Song, Myoung-Soo Lee
  • Publication number: 20150206275
    Abstract: A multi-graphics processing unit (GPU)-based multi-physics simulation method and apparatus. In an exemplary embodiment, the multi-physics simulation method includes: determining a domain dividing manner by performing mock simulation; performing main simulation by using multi-graphic processing units (GPU) by targeting a plurality of physics model data on domains divided in the determined domain dividing manner; and sharing a result of the main simulation.
    Type: Application
    Filed: January 20, 2015
    Publication date: July 23, 2015
    Inventors: Seung Hyup SHIN, Il Kwon JEONG
  • Publication number: 20150133582
    Abstract: Disclosed are an ink composition for an imprint lithography and a roll printing, wherein in forming patterns of the LCD device using the imprint lithography and the roll printing, an ink composition with high thermal resistance, consisting of polymer resin and additive both endurable even at a high temperature is used to form fine patterns with constantly maintaining pattern linewidths and line intervals, and wherein the ink composition is endurable even at a high temperature of 90-250° C.
    Type: Application
    Filed: November 4, 2014
    Publication date: May 14, 2015
    Applicant: LG Display Co., Ltd.
    Inventors: Sung-Hee Kim, Soon-Sung Yoo, Jin-Wuk Kim, Byung-Geol Kim, Byung-Uk Kim, Ki-Beom Lee, Byong-Hoo Kim, Seung-Hyup Shin, Jun-Young Song, Myoung-Soo Lee
  • Patent number: 8953872
    Abstract: The present disclosure relates to a method of editing terrain data created by a procedure method, and particularly to a method of editing terrain data based on multiresolution for intuitively editing high-quality terrain data. To this end, the method of editing terrain data created by a procedure method includes: inputting terrain data in a form of a height map; processing a multiresolution analysis by dividing the input height map for each band; processing a terrain edition based on the multiresolution by adjusting a height value within a predetermined distance from a position selected from the multiresolution analyzed height map; and storing the multiresolution-based terrain edition processed height map in a form of a progressive mesh.
    Type: Grant
    Filed: January 3, 2013
    Date of Patent: February 10, 2015
    Assignee: Electronics and Telecommunications Research Institute
    Inventors: Seung Hyup Shin, Il Kwon Jeong
  • Patent number: 8936898
    Abstract: A photosensitive resin composition and a method for forming an organic film on a substrate are provided. Because the photosensitive resin composition for imprinting includes an erythrotol-based monomer or oligomer, an organic film formed by the photosensitive resin composition for imprinting has improved restoring force. Therefore, the photosensitive resin composition is appropriate for imprinting processes.
    Type: Grant
    Filed: November 12, 2009
    Date of Patent: January 20, 2015
    Assignee: LG Display Co., Ltd.
    Inventors: Yeon Heui Nam, Jin Wuk Kim, Tae Joon Song, Seong Pil Cho, Byung Uk Kim, Seung Hyup Shin, Jun Yong Song, Myoung Soo Lee
  • Publication number: 20140347373
    Abstract: There are provided a method of generating a terrain model and a device using the same. The method of generating a terrain model includes dividing a primitive terrain model into a plurality of partial terrain sections based on a predetermined criterion, assigning the plurality of partial terrain sections to a multiprocessor, and generating a final terrain model by performing a terrain transformation simulation of the plurality of partial terrain sections through parallel processing based on the multiprocessor. Therefore, it is possible to rapidly generate a realistic terrain model.
    Type: Application
    Filed: October 11, 2013
    Publication date: November 27, 2014
    Applicant: Electronics and Telecommunications Research Institute
    Inventors: Seung Hyup SHIN, Il Kwon JEONG
  • Patent number: 8269771
    Abstract: A three-dimensional (3D) remeshing apparatus includes a curved surface geometry module for calculating one or more geometric elements, including a normal and a curvature, based on data of an input mesh, a vertex grouping module for grouping vertices of the mesh into a general group, an edge group, and an apex group using information of the curvature calculated by the curved surface geometry module, and a projection module for searching for one or more tangent planes corresponding to one or more of the vertices grouped by the vertex grouping module, projecting one or more corresponding vertices on each of the tangent planes, and restoring one or more edges of the input mesh.
    Type: Grant
    Filed: December 16, 2008
    Date of Patent: September 18, 2012
    Assignee: Electronics and Telecommunications Research Institute
    Inventors: Seung Taik Oh, Man Jai Lee, Bon Ki Koo, Soon Hyoung Pyo, Young Hee Kim, Seung Hyup Shin, Jang Hee Kim, Byung Seok Roh
  • Patent number: 8265415
    Abstract: An apparatus for transforming an image in a mobile device is disclosed. The apparatus comprises a pen style transformation unit for transforming an original image to a pen style image using a separated Gaussian filter and outputting pen style image, a cartoon style transformation unit for transforming the original image to a cartoon style image and outputting the cartoon style image, a mosaic creation unit for creating a photomosaic to which the original image is applied based on an optimum photo image set and outputting the created photo mosaic by applying the created photo mosaic to the original image, and an image output unit for outputting the images output from the pen style transformation unit, the cartoon style transformation unit, and the mosaic creation unit to an output unit.
    Type: Grant
    Filed: December 17, 2008
    Date of Patent: September 11, 2012
    Assignee: Electronics and Telecommunications Research Institute
    Inventors: Yoon-Seok Choi, Bon Ki Koo, Ji Hyung Lee, Bo Youn Kim, Hee Jeong Kim, Il Kyu Park, Seung Wook Lee, Seung Hyup Shin
  • Publication number: 20120162226
    Abstract: Disclosed herein is a fracture pattern generation apparatus for a crumbling effect includes a graph generation unit, a fragment center setting unit, a fracture pattern generation unit, and a fragment mesh generation unit. The graph generation unit generates the graph of the mesh model by filling the inside of a mesh model with a plurality of vertices and connecting the vertices using line segments. The fragment center setting unit sets the central vertices of fragments, which are separated due to fractures, from among the plurality of vertices formed on the graph. The fracture pattern generation unit generates the fracture pattern by setting the central vertices of the fragments to terminal vertices of the fracture pattern and allocating Identifications (IDs) to the respective the central vertices of fragments. The fragment mesh generation unit generates fragment meshes by performing division on the graph based on the fracture pattern.
    Type: Application
    Filed: December 20, 2011
    Publication date: June 28, 2012
    Applicant: Electronics and Telecommunications Research Institute
    Inventors: Seung-Hyup SHIN, Soon-Hyoung PYO, Bon-Ki KOO
  • Publication number: 20110224335
    Abstract: Disclosed are an ink composition and a method for fabricating a liquid crystal display (LCD) device using the same, wherein in forming patterns of the LCD device using an imprint lithography and a roll printing, an ink composition with high thermal resistance, consisting of polymer resin and additive both endurable even at a high temperature is used to form fine patterns with constantly maintaining pattern linewidths and line intervals, the ink composition consisting of 5-45% by weight of polymer resin, 5-45% by weight of additive added to retain thermal stability, and 50-90% by weight of organic solvent, wherein the ink composition is endurable even at a high temperature of 90-250° C.
    Type: Application
    Filed: April 20, 2011
    Publication date: September 15, 2011
    Inventors: Sung-Hee Kim, Soon-Sung Yoo, Jin-Wuk Kim, Byung-Geol Kim, Byung-Uk Kim, Ki-Beom Lee, Byong-Hoo Kim, Seung-Hyup Shin, Jun-Young Song, Myoung-Soo Lee
  • Patent number: 7969442
    Abstract: A method for producing cartoon animation using character animation and mesh deformation is provided. The system includes a motion analysis module, a mesh deformation module, a motion deformation module, and a skinning module. The motion analysis module receives existing motion data having information about non-deformed motions of a character, and extracts parameters from the existing motion data by analyzing an animation value that a character's each joint has. The mesh deformation module receives existing mesh data having information about an external appearance of a character and existing skinning data having information for cohering the parameters or bones with mesh, and generates deformed mesh data. The motion deformation module receives the existing motion data and deforms motion using the parameters. The skinning module receives the deformed mesh data, the deformed motion data, and the existing skinning data and generates character animation data having cartoon like motion.
    Type: Grant
    Filed: September 17, 2007
    Date of Patent: June 28, 2011
    Assignee: Electronics and Telecommunications Research Institute
    Inventors: Ji Hyung Lee, Hee Jeong Kim, Bo Youn Kim, Seung Hyup Shin, Yoon-Seok Choi, Seong-gyu Park, Jong-Myung Kim, Sun-Woo Yang, Bon Ki Koo, Jung-Ju Choi, Chi-Jung Hwang