Patents by Inventor Seung Jae Yang

Seung Jae Yang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11972719
    Abstract: A display device and a method of driving a display device are disclosed.
    Type: Grant
    Filed: July 19, 2022
    Date of Patent: April 30, 2024
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Su Min Yang, Seung Ho Park, Sung Hoon Bang, Sang Jae Yeo
  • Publication number: 20240114151
    Abstract: A method for decoding an image, according to the present invention, can comprise the steps of: drawing out a vector predictor of a block vector for indicating a reference block with respect to a current block to be predicted within a current picture; drawing out the block vector on the basis of the vector predictor and a vector differential value corresponding to a different value of the block vector and the vector predictor; and generating a prediction block with respect to the current block on the basis of the block vector.
    Type: Application
    Filed: December 5, 2023
    Publication date: April 4, 2024
    Applicant: RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY
    Inventors: Byeung Woo JEON, Seung Ha YANG, Hiuk Jae SHIM, Da Hee LEE
  • Patent number: 8617944
    Abstract: An etchant composition for etching a transparent electrode is provided, the etchant composition includes an inorganic acid, an ammonium (NH4+)-containing compound, a cyclic amine compound, and the remaining amount of water.
    Type: Grant
    Filed: March 1, 2013
    Date of Patent: December 31, 2013
    Assignees: Dongwood Fine-Chem Co., Ltd., Samsung Display Co., Ltd.
    Inventors: Byeong-Jin Lee, Hong-Sik Park, Sang-Tae Kim, Joon-Woo Lee, Young-Chul Park, Young-Jun Jin, Suck-Jun Lee, Seung-Jae Yang, O-Byoung Kwon, In-Ho Yu, Sang-Hoon Jang, Min-Ki Lim, Hye-Ra Shin, Yu-Jin Lee
  • Patent number: 8409999
    Abstract: An etchant composition for etching a transparent electrode is provided, the etchant composition includes an inorganic acid, an ammonium (NH4+)-containing compound, a cyclic amine compound, and the remaining amount of water.
    Type: Grant
    Filed: November 16, 2010
    Date of Patent: April 2, 2013
    Assignee: Samsung Display Co., Ltd.
    Inventors: Byeong-Jin Lee, Hong-Sick Park, Sang-Tae Kim, Joon-Woo Lee, Young-Chul Park, Young-Jun Jin, Suck-Jun Lee, Seung-Jae Yang, O-Byoung Kwon, In-Ho Yu, Sang-Hoon Jang, Min-Ki Lim, Hye-Ra Shin, Yu-Jin Lee
  • Publication number: 20110183476
    Abstract: An etchant composition for etching a transparent electrode is provided, the etchant composition includes an inorganic acid, an ammonium (NH4+)-containing compound, a cyclic amine compound, and the remaining amount of water.
    Type: Application
    Filed: November 16, 2010
    Publication date: July 28, 2011
    Inventors: Byeong-Jin LEE, Hong-Sick Park, Sang-Tae Kim, Joon-Woo Lee, Young-Chul Park, Young-Jun Jin, Suck-Jun Lee, Seung-Jae Yang, O-Byoung Kwon, In-Ho Yu, Sang-Hoon Jang, Min-Ki Lim, Hye-Ra Shin, Yu-Jin Lee
  • Patent number: 7968000
    Abstract: An etchant composition is provided. The etchant composition includes about 40 to about 65 wt % of phosphoric acid, about 2 to about 5 wt % of nitric acid, about 2 to about 20 wt % of acetic acid, about 0.1 to about 2 wt % of a compound containing phosphate, about 0.1 to about 2 wt % of a compound simultaneously containing an amino group and a carboxyl group, and a remaining weight percent of water for the total weight of the composition.
    Type: Grant
    Filed: April 29, 2009
    Date of Patent: June 28, 2011
    Assignees: Samsung Electronics, Co., Ltd., Dongwoo Fine-Chem Co., Ltd.
    Inventors: Young-Joo Choi, Bong-Kyun Kim, Byeong-Jin Lee, Jong-Hyun Choung, Sun-Young Hong, Nam-Seok Suh, Hong-Sick Park, Ky-Sub Kim, Seung-Yong Lee, Joon-Woo Lee, Young-Chul Park, Young-Jun Jin, Seung-Jae Yang, Hyun-Kyu Lee, Sang-Hoon Jang, Min-Ki Lim
  • Publication number: 20100120209
    Abstract: An etchant composition is provided. The etchant composition includes about 40 to about 65 wt % of phosphoric acid, about 2 to about 5 wt % of nitric acid, about 2 to about 20 wt % of acetic acid, about 0.1 to about 2 wt % of a compound containing phosphate, about 0.1 to about 2 wt % of a compound simultaneously containing an amino group and a carboxyl group, and a remaining weight percent of water for the total weight of the composition.
    Type: Application
    Filed: April 29, 2009
    Publication date: May 13, 2010
    Inventors: Young-Joo CHOI, Bong-Kyun KIM, Byeong-Jin LEE, Jong-Hyun CHOUNG, Sun-Young HONG, Nam-Seok SUH, Hong-Sick PARK, Ky-Sub KIM, Seung-Yong LEE, Joon-Woo LEE, Young-Chul PARK, Young-Jun JIN, Seung-Jae YANG, Hyun-Kyu LEE, Sang-Hoon JANG, Min-Ki LIM
  • Patent number: 7291689
    Abstract: The present invention provides norbornene-based copolymers for which one monomer is at least selected from a group consisting of norbornene and dicyclopentadiene, and the other from norbornene-based comonomers of Formula 1 shown below: In Formula 1, R1, R2 and a are defined in this specification. The present invention provides insulating elements for multi-chip packages and antireflection films for the exposure process of semiconductor fabrication using said norbornene-based copolymers. Norbornene-based copolymers according to the present invention have low dielectric constant as well as high thermal stability and excellent solubility to various organic solvents.
    Type: Grant
    Filed: May 1, 2006
    Date of Patent: November 6, 2007
    Assignee: Seoul National University Industry Foundation
    Inventors: Jin Kyu Lee, Dong Woo Yoo, Seung Jae Yang, Kook Heon Char, Joo Hyeon Park