Abstract: The present disclosure provides a method and an apparatus for quickly and accurately evaluating a trajectory of a projectile such as a satellite launching rocket or a missile by comparing the trajectory with a reference trajectory. The trajectory evaluation method includes: acquiring time series positioning data for a target and predetermined reference trajectory information; and mapping points representing the time series positioning data on a graph into corresponding points on a reference trajectory representing the predetermined reference trajectory information while relocating each mapped point onto a relocatable section taking into account a movable range dependent on a speed of the target, and determining a maximum value of distances moved by the points while the points are mapped and relocated as a similarity between the time series positioning data and the reference trajectory.

Abstract: The present disclosure relates to an isolated anti-FcRN antibody, which is an antibody binding to FcRN (stands for neonatal Fc receptor, also called FcRP, FcRB or Brambell receptor) that is a receptor with a high affinity for IgG or a fragment thereof, a method of preparing thereof, a composition for treating autoimmune disease, which comprises the antibody, and a method of treating and diagnosing autoimmunre diseases using the antibody. The FcRn-specific antibody according to the present disclosure binds to FcRn non-competitively with IgG to reduce serum pathogenic auto-antibody levels, and thus can be used for the treatment of autoimmune diseases.

Abstract: Provided is a semiconductor manufacturing system capable of loading a plurality of semiconductor wafers into a vertical reaction tube, and performing a thermal process. The semiconductor manufacturing system includes a first wafer loading boat, a second wafer loading boat, a plate cap, a door plate and a lifting system. The first wafer loading boat is mounted in the reaction tube and includes a plurality of holder supporters that support a wafer holder in a shape of a board, the wafer holder being loaded vertically at a predetermined interval and on which the semiconductor wafer is rested on. The second wafer loading boat is inside or outside the first wafer loading boat and has a wafer supporter that supports the semiconductor wafer. The lifting system moves either the first wafer loading boat or the second wafer loading boat vertically and separates the semiconductor wafer, which is loaded on the wafer holder, from the wafer holder at a predetermined height.

Abstract: Provided is a semiconductor manufacturing system. The semiconductor manufacturing system includes a wafer loading boat, a complementary wafer loading boat, a door assembly, and a spacing controlling system. The wafer loading boat is mounted in the reaction tube and includes a plurality of wafer supporters on which the semiconductor wafer is rested on. The complementary wafer loading boat is located inside or outside of the wafer loading boat, moves vertically, includes a wafer holder that is devised to support the semiconductor wafer. The contact between the wafer and the holder in the center part of the wafer other than edges of the wafer is adjusted by moving one of the wafer loading boats vertically. The spacing controlling system is mounted in the door assembly, controls a space between the semiconductor wafer and the wafer holder, and maintains or adjusts a contact area of the semiconductor wafer with the wafer holder dynamically during the thermal processing.

Abstract: Provided is a semiconductor manufacturing system capable of loading a plurality of semiconductor wafers into a vertical reaction tube, and performing a thermal process. The semiconductor manufacturing system includes a first wafer loading boat, a second wafer loading boat, a plate cap, a door plate and a lifting system. The first wafer loading boat is mounted in the reaction tube and includes a plurality of holder supporters that support a wafer holder in a shape of a board, the wafer holder being loaded vertically at a predetermined interval and on which the semiconductor wafer is rested on. The second wafer loading boat is inside or outside the first wafer loading boat and has a wafer supporter that supports the semiconductor wafer. The lifting system moves either the first wafer loading boat or the second wafer loading boat vertically and separates the semiconductor wafer, which is loaded on the wafer holder, from the wafer holder at a predetermined height.