Patents by Inventor Seung-Sock CHOI

Seung-Sock CHOI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11518908
    Abstract: A water-repellent coating composition, and particularly, a water-repellent coating composition having improved adhesion and durability by including a phosphoric acid or a phosphoric acid-based compound, is provided.
    Type: Grant
    Filed: December 28, 2017
    Date of Patent: December 6, 2022
    Assignee: DONGJIN SEMICHEM CO., LTD.
    Inventors: Seong Keun Jang, Seong Yeon Oh, Doo Shik Kim, Seung Sock Choi, Dong Jin Nam, Kyu Soon Shin
  • Publication number: 20220298360
    Abstract: The present invention relates to a coating composition comprising a multifunction acrylate-based oligomer, a thermoplastic polymer, and an organic solvent. The composition can be cured and thermoformed. A coating film made from the composition is capable of being thermoformed and has excellent hardness, durability, and scratch resistance. With the coating film, plastic products, which can be used instead of glass in various industries such as construction, electronic products and automobiles, are provided.
    Type: Application
    Filed: June 10, 2022
    Publication date: September 22, 2022
    Inventors: Hyun Seok YOO, Seung Sock CHOI, Kyu Soon SHIN, Dong Jin NAM, Young Mo KIM, Kook Hee LIM, Seong Yeon OH, HaeRyang LIM, Han Bin PARK
  • Publication number: 20190352533
    Abstract: A water-repellent coating composition, and particularly, a water-repellent coating composition having improved adhesion and durability by including a phosphoric acid or a phosphoric acid-based compound, is provided.
    Type: Application
    Filed: December 28, 2017
    Publication date: November 21, 2019
    Inventors: Seong Keun JANG, Seong Yeon OH, Doo Shik KIM, Seung Sock CHOI, Dong Jin NAM, Kyu Soon SHIN
  • Patent number: 10280336
    Abstract: The present invention relates to a coating method for preventing warpage of a substrate, and more specifically, to a coating method for preventing substrate warpage comprising forming two or more coating layers by coating the surface of a substrate with coating compositions having different densities, wherein at least one layer of the two or more coating layers is coated and cured with a coating composition containing a silsesquioxane composite polymer represented by a specific chemical formula, thereby not only preventing substrate warpage but also providing high surface hardness, excellent transparency, scratch resistance, water repellent characteristics, anti-fouling characteristics, anti-fingerprint property, thermal stability and gloss characteristics to the surface of the substrate.
    Type: Grant
    Filed: March 31, 2015
    Date of Patent: May 7, 2019
    Assignee: DONGJIN SEMICHEM CO., LTD.
    Inventors: Kyu Soon Shin, Hee Jung Jung, Seung Sock Choi
  • Patent number: 10011739
    Abstract: The present invention relates to a coating composition comprising a bis-type silane compound, and particularly relates to a coating composition which has high storage stability and can form a highly transparent and high-strength coating film, a preparation method thereof and a coating film formed using the same.
    Type: Grant
    Filed: April 1, 2014
    Date of Patent: July 3, 2018
    Assignee: DONGJIN SEMICHEM CO., LTD.
    Inventors: Seung-Sock Choi, Jae-Won Yoo, Doo-Shik Kim, Dong-Jin Nam, Kyung-Min Park, Seong-Yeon Oh
  • Publication number: 20170174938
    Abstract: The present invention relates to a coating method for preventing warpage of a substrate, and more specifically, to a coating method for preventing substrate warpage comprising forming two or more coating layers by coating the surface of a substrate with coating compositions having different densities, wherein at least one layer of the two or more coating layers is coated and cured with a coating composition containing a silsesquioxane composite polymer represented by a specific chemical formula, thereby not only preventing substrate warpage but also providing high surface hardness, excellent transparency, scratch resistance, water repellent characteristics, anti-fouling characteristics, anti-fingerprint property, thermal stability and gloss characteristics to the surface of the substrate.
    Type: Application
    Filed: March 31, 2015
    Publication date: June 22, 2017
    Inventors: Kyu Soon SHIN, Hee Jung JUNG, Seung Sock CHOI
  • Publication number: 20160046837
    Abstract: The present invention relates to a coating composition comprising a bis-type silane compound, and particularly relates to a coating composition which has high storage stability and can form a highly transparent and high-strength coating film, a preparation method thereof and a coating film formed using the same.
    Type: Application
    Filed: April 1, 2014
    Publication date: February 18, 2016
    Inventors: Seung-Sock CHOI, Jae-Won YOO, Doo-Shik Kim, Dong-Jin NAM, Kyung-Min Park, Seong-Yeon OH
  • Patent number: 8927673
    Abstract: Disclosed are a method for polymerizing polysilsesquioxane from a trialkoxysiloxane monomer, including: preparing an aqueous organic solution including a trialkoxysiloxane monomer, an organic solvent, water and a catalyst; and selectively preparing a polysilsesquioxane with a cage structure or a polysilsesquioxane with a ladder structure by adjusting the amount of the organic solvent or water in the aqueous organic solution, and a polysilsesquioxane with a cage structure or a polysilsesquioxane with a ladder structure prepared therefrom.
    Type: Grant
    Filed: September 14, 2010
    Date of Patent: January 6, 2015
    Assignee: Korea Institute of Science and Technology
    Inventors: Seung Sang Hwang, Soon Man Hong, Soon Jong Kwak, Kyung Youl Baek, Chong Min Koo, Seung Sock Choi, Albert S. Lee
  • Patent number: 8865852
    Abstract: A low-dielectric constant thin film prepared from a silsesquioxane polymer matrix as a precursor and a method for preparing the same which comprises preparing silsesquioxane sol by adding a stereoisomer of a multi reactive cyclosiloxane to an alkoxysilane are provided. The low-dielectric-constant thin film retains a stable film state even at a curing temperature of ?500° C. without being decomposed, a very uniform surface property with a low surface modulus, and a superior coatability as to be coatable smoothly with no crack even with a thickness of 500 nm or larger.
    Type: Grant
    Filed: October 21, 2010
    Date of Patent: October 21, 2014
    Assignee: Korea Institute of Science and Technology
    Inventors: Kyung Youl Baek, Seung Sang Hwang, Seung-Sock Choi, Sungyoun Oh, He Seung Lee, Eun Kyeong Kim
  • Publication number: 20130144025
    Abstract: Disclosed are a method for polymerizing polysilsesquioxane from a trialkoxysiloxane monomer, including: preparing an aqueous organic solution including a trialkoxysiloxane monomer, an organic solvent, water and a catalyst; and selectively preparing a polysilsesquioxane with a cage structure or a polysilsesquioxane with a ladder structure by adjusting the amount of the organic solvent or water in the aqueous organic solution, and a polysilsesquioxane with a cage structure or a polysilsesquioxane with a ladder structure prepared therefrom.
    Type: Application
    Filed: September 14, 2010
    Publication date: June 6, 2013
    Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Seung Sang Hwang, Soon Man Hong, Soon Jong Kwak, Kyung Youl Baek, Chong Min Koo, Seung Sock Choi, Albert. S. Lee
  • Patent number: 8441005
    Abstract: Disclosed is a light-emitting material including a polysilsesquioxane having a ladder structure with photoactive groups bonded to a siloxane backbone. In addition to superior heat resistance and mechanical property, the light-emitting material provides improved cotability and film property when prepared into a thin film. Further, it provides higher luminous efficiency than the existing organic-based light-emitting material.
    Type: Grant
    Filed: September 14, 2010
    Date of Patent: May 14, 2013
    Assignee: Korea Institute of Science and Technology
    Inventors: Kyung Youl Baek, Seung Sang Hwang, Seung-Sock Choi, Albert S. Lee, He Seung Lee, SungYoun Oh
  • Publication number: 20130040124
    Abstract: The present invention relates to transparent antistatic films using graphene, and methods for preparing the same. The films include conductive particles comprising a single-layer or multi-layer graphene, and a binder. The films are prepared by dispersing graphene in a solvent to obtain a graphene dispersion; dissolving a curable binder to a solvent to obtain a binder solution; mixing the graphene dispersion, the binder solution and optionally an additive to obtain a coating solution; applying the coating solution onto a substrate and drying the solution to form a coated film; and curing the coated film. According to the present invention, transparent or semitransparent antistatic films having excellent permeability, abrasion resistance, scratch resistance, chemical stability and dimensional stability can be prepared. The films also have superior adhesion to substrates and applicability, and thus may be advantageously applied to rigid or flexible substrates.
    Type: Application
    Filed: April 5, 2011
    Publication date: February 14, 2013
    Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Chong Min Koo, Soon Man Hong, Seung Sang Hwang, Soon Jong Kwak, Kyung Youl Baek, Kyung Ho Min, Youn Duk Park, Hee La Kwak, Myung Hee Kim, Bo Ri Kim, Seung Sock Choi, Tae Hee Han
  • Publication number: 20120004368
    Abstract: Disclosed are a low-dielectric-constant thin film prepared from a silsesquioxane polymer matrix as a precursor, the silsesquioxane polymer matrix being a silsesquioxane sol prepared by adding a stereoisomer of a multireactive cyclosiloxane to an alkoxysilane, and a method for preparing the same. The disclosed low-dielectric-constant thin film retains a stable film state even at a curing temperature of ˜500° C. without being decomposed. Also, it exhibits a very uniform surface property with a low surface modulus and has such a superior coatability as to be coatable smoothly with no crack even with a thickness of 500 nm or larger. In addition, the low-dielectric-constant thin film according to the present disclosure may exhibit low dielectric property while having superior surface modulus and hardness.
    Type: Application
    Filed: October 21, 2010
    Publication date: January 5, 2012
    Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Kyung Youl BAEK, Seung Sang HWANG, Seung-Sock CHOI, SUNGYOUN OH, He Seung LEE, Eun Kyeong KIM
  • Publication number: 20110260139
    Abstract: Disclosed is a light-emitting material including a polysilsesquioxane having a ladder structure with photoactive groups bonded to a siloxane backbone. In addition to superior heat resistance and mechanical property, the light-emitting material provides improved cotability and film property when prepared into a thin film. Further, it provides higher luminous efficiency than the existing organic-based light-emitting material.
    Type: Application
    Filed: September 14, 2010
    Publication date: October 27, 2011
    Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Kyung-Youl BAEK, Seung Sang HWANG, Seung-Sock CHOI, Albert S. LEE, He Seung LEE, SungYoun OH
  • Publication number: 20110251369
    Abstract: Disclosed are a polysilsesquioxane having a ladder structure with photoactive groups bonded at the siloxane main chain, and a method for preparing the same. Polysilsesquioxanes exhibiting superior thermal and mechanical properties and having various functionalities and characteristics depending on the photoactive groups introduced thereto may be prepared via a relatively simple method. The polysilsesquioxanes may be useful as an industrial material for organic-inorganic hybrid materials.
    Type: Application
    Filed: August 6, 2010
    Publication date: October 13, 2011
    Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Seung Sang HWANG, Kyung Youl BAEK, Seung-Sock CHOI, He Seung LEE, Albert S. LEE, Sungyoun OH