Abstract: Provided are a novel alkoxyaminosilylamine compound, a method for preparing the same, a composition for depositing a silicon-containing thin film including the same, and a method for manufacturing a silicon-containing thin film using the same, and since the alkoxyaminosilylamine compound according to the present disclosure is thermally stable and highly volatile and reactive, it is very useful for stably manufacturing a silicon-containing thin film having excellent characteristics in a large temperature range.

Abstract: An aminoalkoxydisilazane compound, a composition for depositing a silicon-containing thin film including the aminoalkoxydisilazane compound, and a method of manufacturing a silicon-containing thin film using the aminoalkoxydisilazane compound are described. The aminoalkoxydisilazane compound is thermally stable and has strong volatility and reactivity, and is used as a silicon-containing precursor to form a silicon-containing thin film having excellent physical and electrical properties and high purity, by various deposition methods.

Abstract: A silicon compound, a composition, and associated methods, the silicon compound being represented by Chemical Formula (1): R1m(OR2)n(OR3)3-m-nSi—O—SiR4p(OR5)q(OR6)3-p-q,??Chemical Formula (1) wherein, in Chemical Formula (1), m, n, p, and q are each independently an integer of 0 to 3, and satisfy the following relations m+p?1, m+n?3, and p+q?3, R1 is a heterocyclic group, R4 is a heterocyclic group, a carbon saturated group, or a carbon unsaturated group, and R2, R3, R5, and R6 are each independently a hydrogen atom, a C1-C7 alkyl group, a C2-C7 alkenyl group, a C3-C7 cycloalkyl group, or a C3-C7 cycloalkenyl group.

Abstract: Provided are a silicon precursor having a heterocyclic group, a composition for depositing a silicon-containing layer including the same, and a method of depositing a silicon-containing layer using the same. The silicon precursor is represented by Formula 1. In Formula 1, A1 is a heterocyclic group including one or more nitrogen, and R1 is hydrogen or an alkyl group of 1˜6 carbon atoms. R2 and R3 may be each independently an alkyl group of 1˜6 carbon atoms.

Abstract: A method of manufacturing a sacrificial layer may include providing a first compound including an amine compound including at least one secondary amine and a second compound including an isocyanate compound, and forming a sacrificial layer including polyurea through a polymerization reaction of the first compound and the second compound.

Abstract: Provided is a precursor for depositing a silicon-containing layer, the silicon precursor having a heterocyclic group, and a method of depositing a silicon-containing layer using the same. The silicon precursor is represented by Formula 1. In Formula 1, A1 is a heterocyclic group including one or more nitrogen, and R1 is hydrogen or an alkyl group of 1˜6 carbon atoms. R2 may be an alkyl group of 1˜6 carbon atoms. R3 may be an alkyl group of 1˜6 carbon atoms.

Abstract: A silicon compound, a composition, and associated methods, the silicon compound being represented by Chemical Formula (1): R1m(OR2)n(OR3)3-m-nSi—O—SiR4p(OR5)q(OR6)3-p-q,??Chemical Formula (1) wherein, in Chemical Formula (1), m, n, p, and q are each independently an integer of 0 to 3, and satisfy the following relations m+p?1, m+n?3, and p+q?3, R1 is a heterocyclic group, R4 is a heterocyclic group, a carbon saturated group, or a carbon unsaturated group, and R2, R3, R5, and R6 are each independently a hydrogen atom, a C1-C7 alkyl group, a C2-C7 alkenyl group, a C3-C7 cycloalkyl group, or a C3-C7 cycloalkenyl group.

Abstract: A silicon compound, a composition for depositing a silicon-containing film, a process of forming a silicon-containing film, and a method of manufacturing an integrated circuit device, the silicon compound is represented by Chemical Formula (1):

Abstract: Provided is a precursor for depositing a silicon-containing layer, the silicon precursor having a heterocyclic group, and a method of depositing a silicon-containing layer using the same. The silicon precursor is represented by Formula 1. In Formula 1, A1 is a heterocyclic group including one or more nitrogen, and R1 is hydrogen or an alkyl group of 1˜6 carbon atoms. R2 may be an alkyl group of 1˜6 carbon atoms. R3 may be an alkyl group of 1˜6 carbon atoms.

Abstract: Provided are a silicon precursor having a heterocyclic group, a composition for depositing a silicon-containing layer including the same, and a method of depositing a silicon-containing layer using the same. The silicon precursor is represented by Formula 1. In Formula 1, A1 is a heterocyclic group including one or more nitrogen, and R1 is hydrogen or an alkyl group of 1-6 carbon atoms. R2 and R3 may be each independently an alkyl group of 1-6 carbon atoms.

Abstract: The present invention relates to a novel multipurpose polymer and a composition containing the same. The polymer and the composition of the present invention are very useful for preparing a semiconductor device having very good mechanical and optical properties.

Abstract: The present invention relates to a novel multipurpose polymer and a composition containing the same. The polymer and the composition of the present invention are very useful for preparing a semiconductor device having very good mechanical and optical properties.

Abstract: In accordance with aspects of the invention methods of using rhodium hydroquinone catalysts for the conjugate addition of boronic acids are disclosed.

Abstract: In accordance with one aspect of the invention a rhodium quinonoid catalyst is disclosed.

Abstract: A mouse interface system is provided that allows a user to feel a virtual object displayed by a computer on a display device. The system includes (a) a force feedback device for providing the user with kinesthetic feedback related to mechanical properties in a predetermined direction of the virtual object, (b) a tactile feedback device for providing the user with normal stimulation related to texture of the virtual object, and (c) a linear actuator for providing the tactile feedback device with a translational movement so that the distal end portion of each pin moves in a substantially lateral direction with respect to the user's skin.