Patents by Inventor Seung Su Ahn
Seung Su Ahn has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11748723Abstract: A method for providing contents includes receiving a selection request to view specific contents, from an electronic device; providing a plurality of items corresponding to a plurality of episodes included in the specific contents, in response to the selection request; and performing one of a first process and a second process, related to a provision of the specific episode, according to a product type of the specific episode, in response to a selection of one of the plurality of items through the electronic device.Type: GrantFiled: February 3, 2021Date of Patent: September 5, 2023Assignee: NAVER WEBTOON LTD.Inventors: Jeong Eun Yoon, Ji Hoon Roh, Ellie Jieun Park, Joon Hyun Kim, Hee Jae Ahn, Seung Ik Kim, Sung Su Park, Haeng Seon Kim, Ju Young Kim
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Publication number: 20230276058Abstract: The present invention relates to an image encoding and decoding technique, and more particularly, to an image encoder and decoder using unidirectional prediction. The image encoder includes a dividing unit to divide a macro block into a plurality of sub-blocks, a unidirectional application determining unit to determine whether an identical prediction mode is applied to each of the plurality of sub-blocks, and a prediction mode determining unit to determine a prediction mode with respect to each of the plurality of sub-blocks based on a determined result of the unidirectional application determining unit.Type: ApplicationFiled: May 3, 2023Publication date: August 31, 2023Applicants: Electronics and Telecommunications Research Institute, Kwangwoon University Industry-Academic Collaboration Foundation, University-Industry Cooperation Group of Kyung Hee UniversityInventors: Hae Chul CHOI, Se Yoon JEONG, Sung-Chang LIM, Jin Soo CHOI, Jin Woo HONG, Dong Gyu SIM, Seoung-Jun OH, Chang-Beom AHN, Gwang Hoon PARK, Seung Ryong KOOK, Sea-Nae PARK, Kwang-Su JEONG
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Patent number: 11683502Abstract: The present invention relates to an image encoding and decoding technique, and more particularly, to an image encoder and decoder using unidirectional prediction. The image encoder includes a dividing unit to divide a macro block into a plurality of sub-blocks, a unidirectional application determining unit to determine whether an identical prediction mode is applied to each of the plurality of sub-blocks, and a prediction mode determining unit to determine a prediction mode with respect to each of the plurality of sub-blocks based on a determined result of the unidirectional application determining unit.Type: GrantFiled: January 5, 2021Date of Patent: June 20, 2023Assignees: Electronics and Telecommunications Research Institute, Kwangwoon University Industry-Academic Collaboration Foundation, University-Industry Cooperation Group of Kyung Hee UniversityInventors: Hae Chul Choi, Se Yoon Jeong, Sung-Chang Lim, Jin Soo Choi, Jin Woo Hong, Dong Gyu Sim, Seoung-Jun Oh, Chang-Beom Ahn, Gwang Hoon Park, Seung Ryong Kook, Sea-Nae Park, Kwang-Su Jeong
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Publication number: 20220371100Abstract: The present invention relates to a cutting tool consisting of a hard base material, such as cemented carbide, cermet, ceramic, and cubic boron nitride, and a hard coating film formed on the hard base material. In the cutting tool according to the present invention, the hard coating film, which is composed of a monolayer or multilayer structure, is formed on a base material, wherein the hard coating film comprises a layer composed of an oxide, wherein in the layer composed of an oxide, the oxygen content of an edge center of the cutting tool is higher than the oxygen content in an area distanced from the edge center by 50 ?m or more.Type: ApplicationFiled: September 29, 2020Publication date: November 24, 2022Inventors: Jin-han GWON, Je-hun PARK, Seung-su AHN
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Patent number: 11376675Abstract: The present invention relates to a cutting tool, which performs, like a drill or a ball end mill, cutting while rotating in a state in which the center of the tip end is in contact with a work material, and includes a wear-resistant layer formed at the tip end thereof, wherein a portion of the wear-resistant layer is selectively removed through tip end polishing from the center of the tip end of the drill or the ball end mill to a predetermined area, so as to restrain micro-brittle wear generated in an ultra-low speed region, and thus remarkably improving the cutting lifespan of the cutting tool such as the drill or the ball end mill.Type: GrantFiled: April 13, 2020Date of Patent: July 5, 2022Assignee: KORLOY INC.Inventors: Seung-Su Ahn, Je-Hun Park, Kyung-il Kim, Sung-Hyun Kim, Sung-Gu Lee, Sun-Yong Ahn
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Patent number: 11359272Abstract: The present invention relates to a hard film having improved wear resistance and improved toughness. A hard film according to the present invention is formed by using a PVD method on a surface of a base material, wherein: the hard film includes a first hard layer and a second hard layer; the first hard layer has a thickness of approximately 0.1-3.0 ?m and is composed of Ti1-aAlaN (0.3?a?0.7), and has a single phase structure; and the second hard layer has a thickness of approximately 0.5-10 ?m and is composed of Ti1-a-bAlaMebN (0.3?a?0.7, 0?b?0.05, the Me being at least one selected from V, Zr, Si, Nb, Cr, Mo, Hf, Ta and W); according to an XRD phase analysis method, a ratio ([200]/[111]) of the intensity of a [200] peak to the intensity of a [111] peak is approximately 1.5 or higher; the second hard layer preferentially grows in a [200] direction; the [200] peak is located at approximately 42.7°-44.6° and is composed of three phases, and the [111] peak is located at approximately 37.0°-38.Type: GrantFiled: June 15, 2018Date of Patent: June 14, 2022Assignee: KORLOY INC.Inventors: Je-hun Park, Seung-su Ahn, Seong-mo Park, Jin-han Gwon, Kyoung-il Kim, Beom-sik Kim, Sun-yong Ahn
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Publication number: 20210404052Abstract: A hard coating for cutting tools according to the present invention is a hard coating for cutting tools which is formed on and adjacent to a hard base material by a PVD method, and is characterized in that the thickness of the entire hard coating is 0.5 to 10 ?m, and the hard coating includes one or more nitride layers and one or more oxide layers. Each of the one or more nitride layers has a thickness of 0.1 to 5.0 ?m and is composed of AlaTibMecN (wherein Me is at least one selected from Si, W, Nb, Mo, Ta, Hf, Zr, and Y, and 0.55?a?0.7, 0.2<b?0.45, and 0?c<0.1) or AlaCrbMecN (wherein Me is at least one selected from Si, W, Nb, Mo, Ta, Hf, Zr, and Y, and 0.55?a?0.7, 0.2<b?0.45, and 0?c<0.1) in a cubic phase, and each of the one or more oxide layers has a thickness of 0.1 to 3.0 ?m and is composed of ?-Al2O3 in a cubic phase.Type: ApplicationFiled: November 21, 2019Publication date: December 30, 2021Inventors: Je-hun PARK, Jin-han GWON, Seung-su AHN
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Patent number: 11141801Abstract: The present invention relates to a cutting tool, which performs, like a drill or a ball end mill, cutting while rotating in a state in which the center of the tip end is in contact with a work material, and includes a wear-resistant layer formed at the tip end thereof, wherein a portion of the wear-resistant layer is selectively removed through tip end polishing from the center of the tip end of the drill or the ball end mill to a predetermined area, so as to restrain micro-brittle wear generated in an ultra-low speed region, and thus remarkably improving the cutting lifespan of the cutting tool such as the drill or the ball end mill.Type: GrantFiled: April 13, 2020Date of Patent: October 12, 2021Assignee: KORLOY INC.Inventors: Seung-Su Ahn, Je-Hun Park, Kyung-il Kim, Sung-Hyun Kim, Sung-Gu Lee, Sun-Yong Ahn
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Patent number: 11123803Abstract: Disclosed is a PVD ceramic thin film-coated cutting insert properly usable for machining a hard-to-cut material such as inconel or titanium having low thermal conductivity. The cutting insert for hard-to-cut materials includes a cemented carbide base material having an SMS value of 50-80% obtained by [Formula 1] below, and a ceramic thin film formed on the cemented carbide base material and having a thickness of about 0.4-1.5 ?m. [Formula 1]: SMS=Saturation magnetization value of sintered body×100/TMS, where TMS=2010×Mass ratio of Co.Type: GrantFiled: November 21, 2019Date of Patent: September 21, 2021Assignee: KORLOY INC.Inventors: Sung-gu Lee, Se-ung Oh, Seung-Su Ahn
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Publication number: 20210071290Abstract: The present invention relates to a hard film having improved wear resistance and improved toughness. A hard film according to the present invention is formed by using a PVD method on a surface of a base material, wherein: the hard film includes a first hard layer and a second hard layer; the first hard layer has a thickness of approximately 0.1-3.0 ?m and is composed of Ti1-aAlaN (0.3?a?0.7), and has a single phase structure; and the second hard layer has a thickness of approximately 0.5-10 ?m and is composed of Ti1-a-bAlaMebN (0.3?a?0.7, 0?b?0.05, the Me being at least one selected from V, Zr, Si, Nb, Cr, Mo, Hf, Ta and W); according to an XRD phase analysis method, a ratio ([200]/[111]) of the intensity of a [200] peak to the intensity of a [111] peak is approximately 1.5 or higher; the second hard layer preferentially grows in a [200] direction; the [200] peak is located at approximately 42.7°-44.6° and is composed of three phases, and the [111] peak is located at approximately 37.0°-38.Type: ApplicationFiled: June 15, 2018Publication date: March 11, 2021Inventors: Je-hun PARK, Seung-su AHN, Seong-mo PARK, Jin-han GWON, Kyoung-il KIM, Beom-sik KIM, Sun-yong AHN
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Patent number: 10738376Abstract: A hard coating includes a thin film layer which has a total thickness of 0.5-10 ?m and has an overall composition of Al1-a-bTiaMebN (0.2<a?0.6, 0<b?0.15), where Me is a nitride constituent element having a thermal expansion coefficient of greater than 2.7×10?6/° C. and less than 9.35×10?6/° C., wherein the thin film layer has a structure in which a nano-multilayered-structure of thin layers A, B and C, thin layer B being disposed between thin layer A and thin layer C, is repeatedly laminated at least once.Type: GrantFiled: August 29, 2016Date of Patent: August 11, 2020Assignee: KORLOY INC.Inventors: Je-Hun Park, Beom-Sik Kim, Seung-Su Ahn, Kyoung-il Kim, Dong-Youl Lee, Sun-Yong Ahn, Young-Heum Kim
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Publication number: 20200238403Abstract: The present invention relates to a cutting tool, which performs, like a drill or a ball end mill, cutting while rotating in a state in which the center of the tip end is in contact with a work material, and includes a wear-resistant layer formed at the tip end thereof, wherein a portion of the wear-resistant layer is selectively removed through tip end polishing from the center of the tip end of the drill or the ball end mill to a predetermined area, so as to restrain micro-brittle wear generated in an ultra-low speed region, and thus remarkably improving the cutting lifespan of the cutting tool such as the drill or the ball end mill.Type: ApplicationFiled: April 13, 2020Publication date: July 30, 2020Applicant: KORLOY INC.Inventors: Seung-Su AHN, Je-Hun PARK, Kyung-il KIM, Sung-Hyun KIM, Sung-Gu LEE, Sun-Yong AHN
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Publication number: 20200238404Abstract: The present invention relates to a cutting tool, which performs, like a drill or a ball end mill, cutting while rotating in a state in which the center of the tip end is in contact with a work material, and includes a wear-resistant layer formed at the tip end thereof, wherein a portion of the wear-resistant layer is selectively removed through tip end polishing from the center of the tip end of the drill or the ball end mill to a predetermined area, so as to restrain micro-brittle wear generated in an ultra-low speed region, and thus remarkably improving the cutting lifespan of the cutting tool such as the drill or the ball end mill.Type: ApplicationFiled: April 13, 2020Publication date: July 30, 2020Applicant: KORLOY INC.Inventors: Seung-Su AHN, Je-Hun PARK, Kyung-il KIM, Sung-Hyun KIM, Sung-Gu LEE, Sun-Yong AHN
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Publication number: 20200171583Abstract: Disclosed is a PVD ceramic thin film-coated cutting insert properly usable for machining a hard-to-cut material such as inconel or titanium having low thermal conductivity. The cutting insert for hard-to-cut materials includes a cemented carbide base material having an SMS value of 50-80% obtained by [Formula 1] below, and a ceramic thin film formed on the cemented carbide base material and having a thickness of about 0.4-1.5 ?m. [Formula 1]: SMS=Saturation magnetization value of sintered body×100/TMS, where TMS=2010×Mass ratio of Co.Type: ApplicationFiled: November 21, 2019Publication date: June 4, 2020Inventors: Sung-gu LEE, Se-ung OH, Seung-su AHN
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Publication number: 20180245201Abstract: A hard coating includes a thin film layer which has a total thickness of 0.5-10 ?m and has an overall composition of Al1-a-bTiaMebN (0.2<a?0.6, 0<b?0.15) , where Me is a nitride constituent element having a thermal expansion coefficient of greater than 2.7×10?6/° C. and less than 9.35×10?6/° C., wherein the thin film layer has a structure in which a nano-multilayered-structure of thin layers A, B and C, thin layer B being disposed between thin layer A and thin layer C, is repeatedly laminated at least once.Type: ApplicationFiled: August 29, 2016Publication date: August 30, 2018Applicant: KORLOY INC.Inventors: Je-Hun PARK, Beom-Sik KIM, Seung-Su AHN, Kyoung-il KIM, Dong-Youl LEE, Sun-Yong AHN, Young-Heum KIM
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Patent number: 9855608Abstract: Disclosed is a hard coating film formed on a hard base material such as cemented carbide. The hard coating film has a nanoscale multilayered structure to have improved oxidation resistance and wear resistance. The hard coating film is a hard coating film formed on the base material. The first layer is composed of a TiAl nitride having a composition of Ti1-aAla (0.3?a?0.7), and the second layer has a nanoscale multilayered structure or a structure in which the nanoscale multilayered structure is repeatedly laminated at least two times, the nanoscale multilayered structure including a thin layer A composed of an AlTiSi nitride, a thin layer B, a thin layer C composed of a AlCr nitride, and a thin layer D having thicknesses of 3 nm to 20 nm. The thin film B and the thin film D are composed of a TiAl nitride.Type: GrantFiled: August 27, 2014Date of Patent: January 2, 2018Assignee: KORLOY INC.Inventors: Je-Hun Park, Seung-Su Ahn, Sung-Gu Lee, Seoun-Yong Ahn, Young Heum Kim
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Publication number: 20160325363Abstract: The present invention relates to a cutting tool, which performs, like a drill or a ball end mill, cutting while rotating in a state in which the center of the tip end is in contact with a work material, and includes a wear-resistant layer formed at the tip end thereof, wherein a portion of the wear-resistant layer is selectively removed through tip end polishing from the center of the tip end of the drill or the ball end mill to a predetermined area, so as to restrain micro-brittle wear generated in an ultra-low speed region, and thus remarkably improving the cutting lifespan of the cutting tool such as the drill or the ball end mill.Type: ApplicationFiled: April 17, 2015Publication date: November 10, 2016Applicant: KORLOY INC.Inventors: Seung-Su AHN, Je-Hun PARK, Kyung-il KIM, Sung-Hyun KIM, Sung-Gu LEE, Sun-Yong AHN
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Patent number: 9422627Abstract: Provided is a hard film for a cutting tool formed on a surface of a base material, the hard film being comprised of a nano multi-layered structure formed by sequentially stacking a thin layer A, a thin layer B, a thin layer C and a thin layer D or being comprised of a structure formed by repeatedly stacking the nano multi-layered structure at least twice, wherein the thin layer A is comprised of TixAl1-xN (0.5?x?0.7); the thin layer B is comprised of Al1-y-zTiyMezN (0.4?y?0.7, 0<z?0.1 where Me is at least one of Si, Cr, and Nb); the thin layer C is comprised of AlaTi1-aN (0.5?a?0.7); and the thin layer D is comprised of AlbCr1-bN (0.5?b?0.7).Type: GrantFiled: March 18, 2013Date of Patent: August 23, 2016Assignee: KORLOY INC.Inventors: Jae-Hoon Kang, Je-Hun Park, Seung-Su Ahn, Sung-Hyun Kim, Jung-Wook Kim, Sung-Gu Lee, Sun-Yong Ahn, Dong-Bok Park
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Patent number: 9394601Abstract: Provided is a hard film formed on a surface of a base material, the hard film being comprised of a nano multi-layered structure formed by stacking a thin layer A, a thin layer B a thin layer C in order of thin layers A-B-A-C from the base material or being comprised of a structure formed by repeatedly stacking the nano multi-layered structure at least twice, wherein the thin layer A is comprised of Ti1-xAlxN (0.3?x?0.7); the thin layer B is comprised of Al1-yCryN (0.3?y?0.7); and the thin layer C is comprised of MeN (where Me is any one of Nb, V, and Cr).Type: GrantFiled: March 18, 2013Date of Patent: July 19, 2016Assignee: KORLOY INC.Inventors: Je-Hun Park, Jae-Hoon Kang, Seung-Su Ahn, Sung-Hyun Kim, Jung-Wook Kim, Sung-Gu Lee, Sun-Yong Ahn, Dong-Bok Park
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Publication number: 20160193662Abstract: Disclosed is a hard coating film formed on a hard base material such as cemented carbide. The hard coating film has a nanoscale multilayered structure to have improved oxidation resistance and wear resistance. The hard coating film is a hard coating film formed on the base material. The first layer is composed of a TiAl nitride having a composition of Ti1-aAla (0.3?a?0.7), and the second layer has a nanoscale multilayered structure or a structure in which the nanoscale multilayered structure is repeatedly laminated at least two times, the nanoscale multilayered structure including a thin layer A composed of an AlTiSi nitride, a thin layer B, a thin layer C composed of a AlCr nitride, and a thin layer D having thicknesses of 3 nm to 20 nm. The thin film B and the thin film D are composed of a TiAl nitride.Type: ApplicationFiled: August 27, 2014Publication date: July 7, 2016Applicant: KORLOY INC.Inventors: Je-Hun PARK, Seung-Su AHN, Sung-Gu LEE, Seoun-Yong AHN, Young Heum KIM