Abstract: A display device includes: a plurality of pixels to receive data voltages based on converted grayscales; and a grayscale converter to: calculate first compensation offsets based on positions of the pixels and input grayscales for the pixels; convert the first compensation offsets into second compensation offsets according to a maximum luminance weight based on an input maximum luminance; and calculate the converted grayscales by applying the second compensation offsets to the input grayscales.

Abstract: Provided are display panel manufacturing method and apparatus. The display panel manufacturing method includes detecting a machining target area of a bottom layer, removing an area, overlapping the machining target area, of a top layer, emitting a laser beam to the machining target area of the bottom layer to provide a bottom pattern from the machining target area, and providing a compensation pattern in the removed area of the top layer.

Abstract: A multilayer capacitor includes a body including a multilayer structure in which a plurality of dielectric layers are stacked in a first direction and a plurality of internal electrodes stacked with the dielectric layer interposed therebetween and external electrodes formed outside the body and connected to the internal electrodes. The body includes an active portion and a side margin portion covering the active portion and opposing each other in a second direction, and 1<A2/M1?1.5 and A2<A1 in which A1 is an average grain size of the dielectric layers in a central region of the active portion, A2 is an average grain size of the dielectric layers at an active boundary part of the active portion adjacent to the side margin portion, and M1 is an average grain size of the dielectric layers in a central region of the side margin portion.

Abstract: The present invention relates to a method for forming a pattern by negative tone development (NTD) which is prepared by forming an anti-reflective coating composition layer comprising a photoacid generator between the substrate and the photoresist composition layer, and thus exhibits improved line width (CD) in the pattern and prevents pattern collapse owing to thorough activation of de-blocking of the photoresist composition layer during the exposure process.

Abstract: A user terminal and a driving method thereof, a control device and a driving method thereof, and a control system of a controlled device are provided. The user terminal includes: a communication interface configured to communicate with a plurality of controlled devices which are operated based on individually set setting values; a user interface configured to receive an adjustment value for collectively controlling the plurality of controlled devices as a group; and a controller configured to individually adjust each of the setting values based on a ratio which relates to the received adjustment value, and to control the plurality of controlled devices based on the adjusted setting values.

Abstract: A user terminal and a driving method thereof, a control device and a driving method thereof, and a control system of a controlled device are provided. The user terminal includes: a communication interface configured to communicate with a plurality of controlled devices which are operated based on individually set setting values; a user interface configured to receive an adjustment value for collectively controlling the plurality of controlled devices as a group; and a controller configured to individually adjust each of the setting values based on a ratio which relates to the received adjustment value, and to control the plurality of controlled devices based on the adjusted setting values.

Abstract: A user terminal and a driving method thereof, a control device and a driving method thereof, and a control system of a controlled device are provided. The user terminal includes: a communication interface configured to communicate with a plurality of controlled devices which are operated based on individually set setting values; a user interface configured to receive an adjustment value for collectively controlling the plurality of controlled devices as a group; and a controller configured to individually adjust each of the setting values based on a ratio which relates to the received adjustment value, and to control the plurality of controlled devices based on the adjusted setting values.

Abstract: The present invention relates to a method for forming a pattern by negative tone development (NTD) which is prepared by forming an anti-reflective coating composition layer comprising a photoacid generator between the substrate and the photoresist composition layer, and thus exhibits improved line width (CD) in the pattern and prevents pattern collapse owing to thorough activation of de-blocking of the photoresist composition layer during the exposure process.

Abstract: A user terminal and a driving method thereof, a control device and a driving method thereof, and a control system of a controlled device are provided. The user terminal includes: a communication interface configured to communicate with a plurality of controlled devices which are operated based on individually set setting values; a user interface configured to receive an adjustment value for collectively controlling the plurality of controlled devices as a group; and a controller configured to individually adjust each of the setting values based on a ratio which relates to the received adjustment value, and to control the plurality of controlled devices based on the adjusted setting values.

Abstract: An apparatus and a method for creating a floor plan of a building using a program that supports an editing operation of an interior structural drawing are provided. The method includes receiving a request of a user from a User Interface (UI) unit, searching at least one of a DataBase (DB) and an external DB, which is accessible through a communication unit, based on the basic layout information to obtain at least one recommended interior structural drawing, providing the at least one recommended interior structural drawing through the UI unit, editing the interior structural drawing selected by the user based on extended layout information.

Abstract: The present invention relates to an improved method of manufacturing mycophenolate mofetil. More particularly, the present invention relates to a method of manufacturing mycophenolate mofetil with high purity comprising : a) converting mycophenolate to an amine salt by reacting with an amine base; and b) reacting the resultant with a halogenating agent and 2-morpholinoethanol continuously.

Abstract: The present invention relates to a photoresist composition for an MMN (multi-micro nozzle) head coater, more particularly to a photoresist composition comprising a novolak resin with a molecular weight ranging from 2000 to 12,000, a diazide photoactive compound, an organic solvent, and a Si-based surfactant for use in liquid crystal display circuits. The photoresist composition for liquid crystal display circuits of the present invention solves the stain problem, which occurs in MMN head coaters used for large-scale substrate glass, and improves coating characteristics, so that it can be utilized industrially and is expected to significantly improve productivity.

Abstract: The present invention provides a photoresist composition and more particularly, a photoresist composition comprising a) a novolak resin, b) a diazide compound, and c) a solvent containing propylene glycol methyl ether acetate (PGMEA) and 2,2,4-triemthyl-1,3-penthanediolmonoisobutylate (TMPMB). The photoresist composition according to the invention has excellent coating uniformity and stain inhibitory properties after coating so that it can be easily applied to real industrial fields and it can improve working environments due to the reduction of amounts to be consumed, the decrease of time to be required for manufacture, etc. when manufactured on a large scale.

Abstract: The present invention provides a photoresist composition and more particularly, a photoresist composition comprising a) a novolak resin, b) a diazide compound, and c) a solvent containing propylene glycol methyl ether acetate (PGMEA) and 2,2,4-triemthyl-1,3-penthanediolmonoisobutylate (TMPMB). The photoresist composition according to the invention has excellent coating uniformity and stain inhibitory properties after coating so that it can be easily applied to real industrial fields and it can improve working environments due to the reduction of amounts to be consumed, the decrease of time to be required for manufacture, etc. when manufactured on a large scale.

Abstract: Disclosed is a photoresist composition having a good sensitivity and residual layer characteristic and a method of forming a pattern using the same. The photoresist composition includes 5-30% by weight of a polymer resin, 2-10% by weight of a photosensitive compound, 0.1-10% by weight of a sensitivity enhancing agent, 0.1-10% by weight of a sensitivity restraining agent and 60-90% by weight of an organic solvent. A photoresist layer is formed by coating the photoresist composition on a substrate and then drying the coated photoresist composition. Then, thus obtained photoresist layer is exposed by using a mask having a predetermined pattern. Then, a photoresist pattern is formed by developing thus exposed photoresist layer. The photoresist pattern exhibits a uniform layer thickness and critical dimension.

Abstract: The present invention relates to an LCD circuit photoresist composition for manufacturing fine circuit patterns on liquid crystal display circuits or semiconductor integrated circuits, and more particularly, and LCD circuit photoresist composition including (a) mixed polymer resins comprising a novolak resin with a molecular weight ranging from 3,000 to 9,000 and a fractionated novolak resin with a molecular weight ranging from 3,500 to 10,000; (b) a diazide-type photosensitive compound; (c) a photosensitizer; and (d) organic solvents. An LCD circuit photoresist composition of the present invention has excellent photosensitivity, retention ratio, resolution, contrast, heat resistance, adhesion, and stripper solubility, thus this photoresist composition can be easily applied to industrial work places for better working environments.