Abstract: A wafer processing method of the present invention includes mounting a wafer part on a chuck table, loading the wafer part on the chuck table, spraying, by a spray arm module, a first processing solution onto the wafer part to process the wafer part, spraying, by the spray arm module, a second processing solution onto the wafer part to process the wafer part, drying the wafer part on the chuck table, and unloading the wafer part from the chuck table.

Abstract: A dry eye syndrome alert system through posture and work detection, includes: a data collecting unit configured to detect a posture of a user to collect posture data of the user and preprocess the posture data; an eye blink frequency calculating unit configured to identify a posture change of the user on the basis of the posture data, calculate a motion variability on the basis of the posture change, and estimate an eye blink frequency of the user on the basis of the motion variability; and a diagnosis and alert output unit configured to store data regarding the estimated eye blink frequency, compare the estimated eye blink frequency with a preset reference value, and output an alert to the user when the estimated eye blink frequency is less than or equal to the preset reference value.

Abstract: The wafer polishing system is disclosed. The wafer polishing system may comprise a polishing unit; a slurry distribution unit mounted on the polishing unit and distributing a slurry flowing into the polishing unit for wafer polishing; a slurry tank connected to the slurry distribution unit and storing the slurry; a slurry pump connected to the polishing unit and the slurry tank for transferring the slurry from the slurry tank to the polishing unit; a first circulation line in which one side is connected to the slurry tank; a second circulation line in which one side is connected to the other side of the first circulation line and the other side is connected to the slurry distribution unit; and a cleaning liquid supply unit connected to the second circulation line for supplying a cleaning liquid flowing through the second circulation line.

Abstract: A dry eye syndrome alert system through posture and work detection, includes: a data collecting unit configured to detect a posture of a user to collect posture data of the user and preprocess the posture data; an eye blink frequency calculating unit configured to identify a posture change of the user on the basis of the posture data, calculate a motion variability on the basis of the posture change, and estimate an eye blink frequency of the user on the basis of the motion variability; and a diagnosis and alert output unit configured to store data regarding the estimated eye blink frequency, compare the estimated eye blink frequency with a preset reference value, and output an alert to the user when the estimated eye blink frequency is less than or equal to the preset reference value.

Abstract: The wafer polishing system is disclosed. The wafer polishing system may comprise a polishing unit; a slurry distribution unit mounted on the polishing unit and distributing a slurry flowing into the polishing unit for wafer polishing; a slurry tank connected to the slurry distribution unit and storing the slurry; a slurry pump connected to the polishing unit and the slurry tank for transferring the slurry from the slurry tank to the polishing unit; a first circulation line in which one side is connected to the slurry tank; a second circulation line in which one side is connected to the other side of the first circulation line and the other side is connected to the slurry distribution unit; and a cleaning liquid supply unit connected to the second circulation line for supplying a cleaning liquid flowing through the second circulation line.

Abstract: A microwave signal generator includes a magnetron to generate a microwave signal, a coupler to receive the microwave signal generated by the magnetron and to send the microwave signal to a load; and a band-pass filter to receive the microwave signal from the coupler and to filter the microwave signal to obtain a signal from an oscillation frequency band of the magnetron. The band-pass filter feeds the signal from the oscillation frequency band back to the magnetron in order to fix an oscillation frequency of the magnetron and is a DR (Dielectric Resonator) filter.

Abstract: The microwave signal generator includes a magnetron generating microwave signal. A filter filters a signal that may be a signal of the intrinsic oscillation frequency band of the magnetron, which is fed-back to the magnetron.

Abstract: A magnetron is provided including a yoke having an internal space, a first magnet provided at one end of the internal space, a second magnet provided at a second end of the internal space, the second magnet being axially spaced from the first magnet. Further, an anode cylinder that generates radio frequency energy may be provided axially between the first and second magnets, a first pole piece and a second pole piece may be provided proximate first and second openings of the anode cylinder, respectively. Additionally, the magnetron may also include a seal that intercepts external leakage, the seal may have an inward protrusion extending axially towards the anode cylinder; and a choke filter that intercepts external leakage provided proximate the seal.

Abstract: Disclosed are an exposure apparatus for forming fine patterns of a semiconductor using an electric field and a method for forming fine patterns using the exposure apparatus. The exposure apparatus comprises an electric field generator for generating an electric field to be applied to infiltrate an acid (H+) produced when a photoresist film is exposed into non-exposure regions. Non-exposure regions into which an acid is infiltrated along with exposure regions in a development process can be removed by applying an electric field to the acid produced during exposure of a photoresist film such that the acid is infiltrated into the non-exposure regions.

Abstract: A magnetron is provided including a yoke having an inner space; a first magnet provided at one end of the inner space, a second magnet provided at a second end of the inner space, the second magnet being axially spaced from the first magnet. Further, there is an anode cylinder that generates a high frequency provided between the first magnet and the second magnet; a first pole piece and a second pole piece provided proximate first and second openings of the anode cylinder, respectively. Additionally, a seal that prevents outward leakage and has an inward protrusion extending axially toward the anode cylinder; and a choke filter, provided beneath a free end of the inwardly bent end of the seal to prevent outward leakage, may be provided.

Abstract: A magnetron is provided including a yoke having an internal space, a first magnet provided at one end of the internal space, a second magnet provided at a second end of the internal space, the second magnet being axially spaced from the first magnet. Further, an anode cylinder that generates radio frequency energy may be provided axially between the first and second magnets, a first pole piece and a second pole piece may be provided proximate first and second openings of the anode cylinder, respectively. Additionally, the magnetron may also include a seal that intercepts external leakage, the seal may have an inward protrusion extending axially towards the anode cylinder; and a choke filter that intercepts external leakage provided proximate the seal.

Abstract: Disclosed herein is a capacitor for a magnetron. The capacitor has dielectric members, which have a converging angle of less than 180° defined between lines extending from both sides of each dielectric member formed between corresponding ends of inner and outer electrodes of the dielectric member. The capacitor is reduced in size while having enhanced capacitance, thereby reducing a manufacturing time. The capacitor also has central conductors having enlarged portions larger than the inner electrode, thereby further enhancing the capacitance.

Abstract: A high pressure condenser for a magnetron, in which a pair of dielectric ceramics having an arch shape are separated from each other, central conductors are connected to internal peripheries of the dielectric ceramics, and a ground metal is connected to external peripheries of the dielectric ceramics, thereby not requiring any additional structure for connecting the dielectric ceramics and the central conductors, simplifying the structures of the central conductors, and reducing the quantity of the dielectric ceramics needed in proportion to the separation interval between the dielectric ceramics.

Abstract: Disclosed are an exposure apparatus for forming fine patterns of a semiconductor using an electric field and a method for forming fine patterns using the exposure apparatus. The exposure apparatus comprises an electric field generator for generating an electric field to be applied to infiltrate an acid (H+) produced when a photoresist film is exposed into non-exposure regions. Non-exposure regions into which an acid is infiltrated along with exposure regions in a development process can be removed by applying an electric field to the acid produced during exposure of a photoresist film such that the acid is infiltrated into the non-exposure regions.