Abstract: A method for manufacturing a memory device having a vertical structure according to one embodiment of the present invention comprises: a step for alternatingly laminating one or more insulation layers and one or more sacrificial layers on a substrate; a step for forming a penetration hole for penetrating the insulation layer and the sacrificial layer; a step for forming a pattern for filling up the penetration hole; a step for forming an opening for penetrating the insulation layer and the sacrificial layer; and a step for removing the sacrificial layer by supplying an etchant through the opening, wherein the step for laminating the insulation layer includes a step for depositing a first silicon oxide film by supplying to the substrate at least one gas selected from the group consisting of SiH4, Si2H6, Si3H8, Si4H10, and the step for laminating the sacrificial layer includes a step for depositing a second silicon oxide film by supplying dichlorosilane (SiCl2H2) to the substrate.

Abstract: Provided is a recurved bow including: a handle; a pair of limbs coupled at both ends of the handle; and a bowstring, wherein a projecting coupling member is provided in front of each of the limbs, and is extended forwardly from each of the limbs, and has a coupling portion in the front thereof, and is coupled with a coupling pin of a rear side of each of the limbs, and wherein a damper member is provided in which the damper member comprises a corresponding coupler that is coupled with the coupling portion formed in front of each of the projecting coupling member, and a damper coupled with the front of the corresponding coupler, to thereby rapidly damp vibrations generated in one end of each of the limbs to thus enhance a vibration damping function.

Abstract: Provided is a method and apparatus for depositing an amorphous silicon film. The method includes supplying a source gas and an atmospheric gas onto a substrate in a state where the substrate is loaded in a chamber to deposit the amorphous silicon film on the substrate. The atmospheric gas includes at least one of hydrogen and helium. The source gas includes at least one of silane (SiH2), disilane (Si2H6), and dichlorosilane (SiCl2H2).

Abstract: Provided is a method of manufacturing a memory device having a 3-dimensional structure, which includes alternately stacking one or more dielectric layers and one or more sacrificial layers on a substrate, forming a through hole passing through the dielectric layers and the sacrificial layers, forming a pattern filling the through hole, forming an opening passing through the dielectric layers and the sacrificial layers, and supplying an etchant through the opening to remove the sacrificial layers. The stacking of the dielectric layers includes supplying the substrate with one or more gases selected from the group consisting of SiH4, Si2H6, Si3H8, and Si4H10, to deposit a silicon oxide layer. The stacking of the sacrificial layers includes supplying the substrate with one or more gases selected from the group consisting of SiH4, Si2H6, Si3H8, Si4H10, and dichloro silane (SiCl2H2), and ammonia-based gas, to deposit a silicon nitride layer.

Abstract: A method for fabricating a semiconductor device, including forming gate patterns over a substrate, forming conductive layer covering top and sidewalls of each gate pattern, forming a metal layer for a silicidation process over the conductive layer, and silicifying the conductive layer and the gate patterns using the metal layer.

Abstract: A method for fabricating a semiconductor device, including forming gate patterns over a substrate, forming conductive layer covering top and sidewalls of each gate pattern, forming a metal layer for a silicidation process over the conductive layer, and silicifying the conductive layer and the gate patterns using the metal layer.

Abstract: An image processing method based on zooming for a mobile terminal permits touch zooming on touch screens of a plurality of devices. The image processing method preferably includes: displaying, in response to entering a touch on a touch screen displaying an image, a zooming GUI indicator for image zooming operation; performing image zooming on the touch screen in response to entering a touch point move while retaining the touch; and hiding the zooming GUI indicator from the touch screen in response to entering a touch release.

Abstract: Disclosed is a radiographic apparatus including a detachable manipulation panel which includes a capturing device to generate X-rays and to irradiate the X-rays to a subject so as to capture the subject, a controller connected to the capturing device to control the capturing device, and a manipulation device mounted to the capturing device to allow an inspector to input commands to control the capturing device, wherein the manipulation device is detachably mounted to the capturing device and, in a state in which the manipulation device is separated from the capturing device, is connected to the controller using a wireless interface to control the capturing device.

Abstract: An X-ray apparatus includes: a source configured to emit X-rays to an object; a detector configured to detect the X-rays that have penetrated the object; an arm configured to connect the source to the detector and move centering on a stand fixed to a bottom; a controller configured to control a movement of the arm so that the controller changes a direction of the X-rays, which are radiated to the object, and the arm rotates on the stand to move the detector in a first direction, to obtain images for a plurality of parts of the object; and an image processor configured to obtain the images for the plurality of parts of the object based on the X-rays detected by the detector.

Abstract: Disclosed is a radiographic apparatus including a detachable manipulation panel which includes a capturing device to generate X-rays and to irradiate the X-rays to a subject so as to capture the subject, a controller connected to the capturing device to control the capturing device, and a manipulation device mounted to the capturing device to allow an inspector to input commands to control the capturing device, wherein the manipulation device is detachably mounted to the capturing device and, in a state in which the manipulation device is separated from the capturing device, is connected to the controller using a wireless interface to control the capturing device.

Abstract: An X-ray apparatus includes: a source for emitting X-rays to an object; a detector for detecting the X-rays penetrating the object; an arm for connecting the source to the detector and moving the detector up and down according to a rotation of the source; and a controller for controlling an imaging of the object by driving the arm.

Abstract: Provided are a method and related mobile device for editing, in an integrated, convenient and quick manner, various menu pages selectively used for a home screen. In response to a given input signal, the mobile device outputs a page edit screen including a specific page displayed on the home screen. Then, in response to subsequent input signals, the mobile device may add a new page, delete a selected page, change a title of a selected page, move or remove a selected icon in a page, change a background image of a selected page, or change a positional order of pages.

Abstract: Provided are a method and related mobile device for editing, in an integrated, convenient and quick manner, various menu pages selectively used for a home screen. In response to a given input signal, the mobile device outputs a page edit screen including a specific page displayed on the home screen. Then, in response to subsequent input signals, the mobile device may add a new page, delete a selected page, change a title of a selected page, move or remove a selected icon in a page, change a background image of a selected page, or change a positional order of pages.

Abstract: The present invention relates to a motion input device for portable terminal and an operation method using the same. A motion input device of a portable terminal of the present invention includes a sensor unit configured to collect a sensor signal from at least one sensor; an operation recognition unit configured to generate a motion signal corresponding to an operation of portable terminal based on the sensor signal; a scenario preparation unit configured to generate an input scenario based on at least one motion signal; and a scenario mapping unit configured to detect, in a scenario database, a standards scenario corresponding to the input scenario, and to generate an input signal corresponding to the standards scenario.

Abstract: Provided is a method of manufacturing a memory device having a 3-dimensional structure, which includes alternately stacking one or more dielectric layers and one or more sacrificial layers on a substrate, forming a through hole passing through the dielectric layers and the sacrificial layers, forming a pattern filling the through hole, forming an opening passing through the dielectric layers and the sacrificial layers, and supplying an etchant through the opening to remove the sacrificial layers. The stacking of the dielectric layers includes supplying the substrate with one or more gases selected from the group consisting of SiH4, Si2H6, Si3H8, and Si4H10, to deposit a silicon oxide layer. The stacking of the sacrificial layers includes supplying the substrate with one or more gases selected from the group consisting of SiH4, Si2H6, Si3H8, Si4H10, and dichloro silane (SiCl2H2), and ammonia-based gas, to deposit a silicon nitride layer.

Abstract: Provided is an equipment for manufacturing a semiconductor. The equipment for manufacturing a semiconductor includes a cleaning chamber in which a cleaning process is performed on substrates, an epitaxial chamber in which an epitaxial process for forming an epitaxial layer on each of the substrates is performed, a buffer chamber having a storage space for storing the substrates, and a transfer chamber to which the cleaning chamber, the buffer chamber, and the epitaxial chamber are connected to side surfaces thereof, the transfer chamber comprising a substrate handler for transferring the substrates between the cleaning chamber, the buffer chamber, and the epitaxial chamber. The substrate handler successively transfers the substrates, on which the cleaning process is completed, into the buffer chamber, transfers the substrates stacked within the buffer chamber the epitaxial chamber, and successively transfers the substrates, on which the epitaxial layers are respectively formed, into the buffer chamber.

Abstract: A method and system for configuring an idle screen with an extended virtual area and for displaying a variety of contents on the idle screen extended by the virtual area is described. The method includes providing an idle screen that displays at least one content, and providing a virtual area that extends the idle screen and displays contents. The method may further include checking the settings of the virtual area when the virtual area is provided, and providing, if the virtual area is set, the idle screen extended by the virtual area where contents are provided by the extended idle screen.

Abstract: Provided is an equipment for manufacturing a semiconductor. The equipment for manufacturing a semiconductor includes a cleaning chamber in which a cleaning process is performed on substrates, an epitaxial chamber in which an epitaxial process for forming an epitaxial layer on each of the substrates is performed, and a transfer chamber to which the cleaning chamber and the epitaxial chamber are connected to sides surfaces thereof, the transfer chamber including a substrate handler for transferring the substrates, on which the cleaning process is completed, into the epitaxial chamber.

Abstract: Provided is an equipment for manufacturing a semiconductor. The equipment for manufacturing a semiconductor includes a cleaning chamber in which a cleaning process is performed on substrates, an epitaxial chamber in which an epitaxial process for forming an epitaxial layer on each of the substrates is performed, and a transfer chamber to which the cleaning chamber and the epitaxial chamber are connected to sides surfaces thereof, the transfer chamber including a substrate handler for transferring the substrates, on which the cleaning process is completed, into the epitaxial chamber. The cleaning chamber is performed in a batch type with respect to the plurality of substrates.