Patents by Inventor Seung Yong Chae

Seung Yong Chae has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Block copolymer, and method for preparing graphene using same
    Patent number: 11192085
    Abstract: The present invention relates to a method for preparing graphene using a novel block copolymer. The present invention has features that, by using the block copolymer to mediate graphene that is hydrophobic and a solvent of a feed solution that is hydrophilic, the exfoliation efficiency of graphene as well as the dispersion stability thereof can be increased during high-pressure homogenization.
    Type: Grant
    Filed: August 28, 2020
    Date of Patent: December 7, 2021
    Inventors: Mi Jin Lee, Byeong-Hyeok Sohn, Seung Yong Chae, Won Jong Kwon, Kwon Nam Sohn
  • Block Copolymer, And Method For Preparing Graphene Using Same
    Publication number: 20200391171
    Abstract: The present invention relates to a method for preparing graphene using a novel block copolymer. The present invention has features that, by using the block copolymer to mediate graphene that is hydrophobic and a solvent of a feed solution that is hydrophilic, the exfoliation efficiency of graphene as well as the dispersion stability thereof can be increased during high-pressure homogenization.
    Type: Application
    Filed: August 28, 2020
    Publication date: December 17, 2020
    Applicants: LG Chem, Ltd., Seoul National University R&DB Foundation
    Inventors: Mi Jin Lee, Byeong-Hyeok Sohn, Seung Yong Chae, Won Jong Kwon, Kwon Nam Sohn
  • Block copolymer, and method for preparing graphene using the same
    Patent number: 10835886
    Abstract: The present invention relates to a method for preparing graphene using a novel block copolymer. The present invention has features that, by using the block copolymer to mediate graphene that is hydrophobic and a solvent of a feed solution that is hydrophilic, the exfoliation efficiency of graphene as well as the dispersion stability thereof can be increased during high-pressure homogenization.
    Type: Grant
    Filed: December 11, 2015
    Date of Patent: November 17, 2020
    Inventors: Mi Jin Lee, Byeong-Hyeok Sohn, Seung Yong Chae, Won Jong Kwon, Kwon Nam Sohn
  • BLOCK COPOLYMER, AND METHOD FOR PREPARING GRAPHENE USING THE SAME
    Publication number: 20170233256
    Abstract: The present invention relates to a method for preparing graphene using a novel block copolymer. The present invention has features that, by using the block copolymer to mediate graphene that is hydrophobic and a solvent of a feed solution that is hydrophilic, the exfoliation efficiency of graphene as well as the dispersion stability thereof can be increased during high-pressure homogenization.
    Type: Application
    Filed: December 11, 2015
    Publication date: August 17, 2017
    Applicants: LG Chem, Ltd., Seoul National University R&DB Foundation
    Inventors: Mi Jin Lee, Byeong-Hyeok Sohn, Seung Yong Chae, Won Jong Kwon, Kwon Nam Sohn