Patents by Inventor Seung-Yoon Ryu

Seung-Yoon Ryu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240118607
    Abstract: The inventive concept provides a substrate treating method. The substrate treating method includes pre-treating a substrate by cleaning the substrate; etching the substrate by supplying an etchant and heating a substrate supplied with the etchant; and post-treating the substrate after the etching the substrate, and wherein the pre-treating the substrate, the etching the substrate, and the post-treating the substrate are each performed in different chambers, a substrate on which the pre-treating the substrate is completed is transferred in a dry state to a chamber at which the etching the substrate is performed, and a substrate on which the etching the substrate is completed is transferred in a wetted state with a liquid to a chamber at which the post-treating the substrate is performed.
    Type: Application
    Filed: March 14, 2023
    Publication date: April 11, 2024
    Applicant: SEMES CO.,LTD.
    Inventors: Hyun YOON, Ki Hoon CHOI, Seung Un OH, Young Ho PARK, Sang Hyeon RYU, Tae Hee KIM, Sang Gun LEE
  • Publication number: 20200274071
    Abstract: The present invention relates to a composition for an organic electroluminescent device, a hole injection layer material manufactured therefrom, and an organic electroluminescent device comprising the hole injection layer. Specifically, the organic electroluminescent device employing the hole injection layer material produced by using a composition for an organic electroluminescent device according to the present invention can realize remarkably improved efficiency and effectively suppress the problem of shortening the lifespan of the device due to high acidity.
    Type: Application
    Filed: February 14, 2019
    Publication date: August 27, 2020
    Inventors: Seung Yoon Ryu, Donghyun Kim, Chang Min Lee, Hafeez Hassan
  • Publication number: 20080098957
    Abstract: A deposition apparatus includes at least one deposition chamber having a source and a substrate holder, the source being configured to deposit a deposition material on a substrate on the substrate holder, a measurement chamber electrically connected to the deposition chamber, the measurement chamber configured to measure in real time a thickness of the deposition material on the substrate, and at least one layer thickness controller in contact with the deposition chamber, the layer thickness controller being configured to control deposition of the deposition material on the substrate to a predetermined thickness in real time.
    Type: Application
    Filed: October 30, 2007
    Publication date: May 1, 2008
    Inventors: Seung-Yoon Ryu, Hyun-Lae Cho