Patents by Inventor SEUNG BIN AHN

SEUNG BIN AHN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Semiconductor substrate measuring apparatus and plasma treatment apparatus using the same
    Patent number: 10481005
    Abstract: A semiconductor substrate measuring apparatus includes a light source unit generating irradiation light including light in a first wavelength band and light in a second wavelength band. An optical unit irradiates the irradiation light on a measurement object and condenses reflected light. A light splitting unit splits the reflected light, condensed in the optical unit, into a first optical path and a second optical path. A first detecting unit is disposed on the first optical path and detects first interference light in the first wavelength band in the reflected light. A second detecting unit is disposed on the second optical path and detects second interference light in the second wavelength band in the reflected light. A controlling unit calculates at least one of a surface shape or a thickness of the measurement object. The controlling unit calculates a temperature of the measurement object.
    Type: Grant
    Filed: October 11, 2018
    Date of Patent: November 19, 2019
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Se Jin Oh, Tae Kyun Kang, Yu Sin Kim, Jae Ik Kim, Chan Bin Mo, Doug Yong Sung, Seung Bin Ahn, Kul Inn, Yun Kwang Jeon
  • SEMICONDUCTOR SUBSTRATE MEASURING APPARATUS AND PLASMA TREATMENT APPARATUS USING THE SAME
    Publication number: 20190323893
    Abstract: A semiconductor substrate measuring apparatus includes a light source unit generating irradiation light including light in a first wavelength band and light in a second wavelength band. An optical unit irradiates the irradiation light on a measurement object and condenses reflected light. A light splitting unit splits the reflected light, condensed in the optical unit, into a first optical path and a second optical path. A first detecting unit is disposed on the first optical path and detects first interference light in the first wavelength band in the reflected light. A second detecting unit is disposed on the second optical path and detects second interference light in the second wavelength band in the reflected light. A controlling unit calculates at least one of a surface shape or a thickness of the measurement object. The controlling unit calculates a temperature of the measurement object.
    Type: Application
    Filed: October 11, 2018
    Publication date: October 24, 2019
    Inventors: SE JIN OH, TAE KYUN KANG, YU SIN KIM, JAE IK KIM, CHAN BIN MO, DOUG YONG SUNG, SEUNG BIN AHN, KUL INN, YUN KWANG JEON