Abstract: A portable bioreactor is provided. The portable bioreactor may comprise: a frame unit; a cell culture unit which has one side mounted to the frame unit and in which a plurality of supports for cell culture are arranged, the cell culture unit being provided with an inlet, through which a medium supplied from the outside flows in, and an outlet, through which the medium inside the cell culture unit is discharged to the outside, a medium adjustment unit installed in the frame unit and storing therein a certain amount of medium for the cell culture; a circulation pump installed and fixed to the frame unit to circulate the medium stored in the medium adjustment unit; and a gas supply unit for supplying gas to the medium adjustment unit to maintain the medium stored in the medium adjustment unit at a constant pH.

Abstract: A bioreactor for suspension cells is provided. The bioreactor for suspension cells may comprise: a frame unit; a driving unit mounted on the frame unit, and a cell culture unit including a housing having an inner space filled with a medium containing suspension cells, and a plurality of supports disposed in multiple stages in the inner space to be spaced at intervals from each other, the cell culture unit having one end axially coupled to the driving unit.

Abstract: An ion detection sensor fabrication method includes: preparing an ion-sensitive film preparation solution; preparing an ion-sensitive mixed layer preparation solution by mixing the ion-sensitive film preparation solution with graphene powder; and forming an ion-sensitive mixed layer sensitive to a target ion by applying the ion-sensitive mixed layer preparation solution to fill a gap between a source and a drain spaced apart from each other and to cover at least a portion of an upper surface of each of the source and the drain.

Abstract: An ion detection sensor fabrication method includes: preparing an ion-sensitive film preparation solution; preparing an ion-sensitive mixed layer preparation solution by mixing the ion-sensitive film preparation solution with graphene powder; and forming an ion-sensitive mixed layer sensitive to a target ion by applying the ion-sensitive mixed layer preparation solution to fill a gap between a source and a drain spaced apart from each other and to cover at least a portion of an upper surface of each of the source and the drain.

Abstract: A graphene manufacturing apparatus includes a gas supplying unit supplying a gas including carbon; a gas heating unit heating the gas supplied from the gas supplying unit; a deposition chamber in which a substrate having a catalyst layer is disposed; and an inlet pipe introducing the gas of the gas heating unit into the deposition chamber. A temperature of the deposition chamber is set at a temperature lower than a temperature of the gas heating unit so that a selection range with respect to a catalyst metal to be used in the catalyst layer may be expanded, and damage of the substrate due to a high temperature heat may be minimized.

Abstract: Provided is a method of post treating graphene including providing graphene on a metal thin film, providing a carrier on the graphene, hardening the carrier, and removing the metal thin film from the graphene.

Abstract: Provided is a method of post treating graphene including providing graphene on a metal thin film, providing a carrier on the graphene, hardening the carrier, and removing the metal thin film from the graphene.

Abstract: A graphene manufacturing apparatus includes a gas supplying unit supplying a gas including carbon; a gas heating unit heating the gas supplied from the gas supplying unit; a deposition chamber in which a substrate having a catalyst layer is disposed; and an inlet pipe introducing the gas of the gas heating unit into the deposition chamber. A temperature of the deposition chamber is set at a temperature lower than a temperature of the gas heating unit so that a selection range with respect to a catalyst metal to be used in the catalyst layer may be expanded, and damage of the substrate due to a high temperature heat may be minimized.

Abstract: Provided are a method and apparatus of manufacturing high quality large area graphene in large quantities. The method includes placing a supporting belt, on which a catalyst layer is loaded, into a chamber; increasing a temperature of the catalyst layer by injecting a carbon source into the chamber; forming graphene on the catalyst layer by cooling the catalyst layer; and taking out the supporting belt, on which the catalyst layer, on which the graphene is formed, is loaded, from the chamber to an outside, wherein a ratio between a melting point of the supporting belt and a maximum temperature Tmax of the catalyst metal layer that the catalyst layer is heated in the chamber is equal to or less than 0.6.

Abstract: A micro structure includes a base member; a supporting unit disposed on a surface of the base member; a graphene unit which covers at least a portion of the supporting unit and at least a portion of an empty space adjacent to the supporting unit; and a structure unit disposed on at least a portion of the graphene unit over the supporting unit.