Patents by Inventor Sezhian Annamalai

Sezhian Annamalai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10464840
    Abstract: Near-infrared shielding includes a glass material. The shielding provides transmittance at wavelengths between 390 to 700 nm, but near infrared absorbing species are distributed throughout the glass material and the shielding blocks light in the near infrared range. Further, the glass material has a near zero or negative coefficient of thermal expansion, allowing the glass material to heat up when the shielding is blocking a near infrared laser, without expanding much.
    Type: Grant
    Filed: October 4, 2017
    Date of Patent: November 5, 2019
    Assignee: Corning Incorporated
    Inventors: Sezhian Annamalai, Steven Bruce Dawes, Carlos Alberto Duran, Jesse Kohl
  • Patent number: 10427974
    Abstract: A glass composite for use in Extreme Ultra-Violet Lithography (EUVL) is provided. The glass composite includes a first silica-titania glass section. The glass composite further includes a second doped silica-titania glass section mechanically bonded to a surface of the first silica-titania glass section, wherein the second doped silica-titania glass section has a thickness of greater than about 1.0 inch.
    Type: Grant
    Filed: March 22, 2016
    Date of Patent: October 1, 2019
    Assignee: CORNING INCORPORATED
    Inventor: Sezhian Annamalai
  • Publication number: 20190256399
    Abstract: A process for manufacturing glass articles from powder at low temperatures includes the steps of preparing a slurry of powder suspended in a liquid; depositing the slurry on a substrate; drying the slurry to form a layer on the substrate; depositing slurry on the layer; drying the slurry deposited on the layer on the substrate to form another layer; repeating the steps of depositing a slurry and drying the to form a plurality of sequential layers on the substrate; and consolidating the plurality of sequential layers to form a glass article. The process requires a small manufacturing footprint, and facilitates the manufacture of very large near-net shape glass articles.
    Type: Application
    Filed: February 18, 2019
    Publication date: August 22, 2019
    Inventors: Sezhian Annamalai, Thomas Richard Chapman, Kenneth Edward Hrdina, Douglas Hull Jennings, Nicolas LeBlond, Dale Robert Powers
  • Publication number: 20190248696
    Abstract: Annealing treatments for modified titania-silica glasses and the glasses produced by the annealing treatments. The annealing treatments include an isothermal hold that facilitates equalization of non-uniformities in fictive temperature caused by non-uniformities in modifier concentration in the glasses. The annealing treatments may also include heating the glass to a higher temperature following the isothermal hold and holding the glass at that temperature for several hours. Glasses produced by the annealing treatments exhibit high spatial uniformity of CTE, CTE slope, and fictive temperature, including in the presence of a spatially non-uniform concentration of modifier.
    Type: Application
    Filed: April 22, 2019
    Publication date: August 15, 2019
    Inventors: Sezhian Annamalai, Carlos Alberto Duran, Kenneth Edward Hrdina, William Rogers Rosch
  • Patent number: 10329184
    Abstract: Annealing treatments for modified titania-silica glasses and the glasses produced by the annealing treatments. The annealing treatments include an isothermal hold that facilitates equalization of non-uniformities in fictive temperature caused by non-uniformities in modifier concentration in the glasses. The annealing treatments may also include heating the glass to a higher temperature following the isothermal hold and holding the glass at that temperature for several hours. Glasses produced by the annealing treatments exhibit high spatial uniformity of CTE, CTE slope, and fictive temperature, including in the presence of a spatially non-uniform concentration of modifier.
    Type: Grant
    Filed: August 25, 2017
    Date of Patent: June 25, 2019
    Assignee: Corning Incorporated
    Inventors: Sezhian Annamalai, Carlos Alberto Duran, Kenneth Edward Hrdina, William Rogers Rosch
  • Publication number: 20180273419
    Abstract: Near-infrared shielding includes a glass material. The shielding provides transmittance at wavelengths between 390 to 700 nm, but near infrared absorbing species are distributed throughout the glass material and the shielding blocks light in the near infrared range. Further, the glass material has a near zero or negative coefficient of thermal expansion, allowing the glass material to heat up when the shielding is blocking a near infrared laser, without expanding much.
    Type: Application
    Filed: October 4, 2017
    Publication date: September 27, 2018
    Inventors: Sezhian Annamalai, Steven Bruce Dawes, Carlos Alberto Duran, Jesse Kohl
  • Publication number: 20180201535
    Abstract: A method of forming a glass article is provided. The method includes the steps of positioning a first interface surface of a first glass block proximate a second interface surface of a second glass block to define an interface seam, welding the first and second glass blocks together around a majority of the interface seam to define an internal cavity, coupling a vacuum fitting to at least one of the first and second glass blocks, drawing a vacuum in the cavity between the first and second glass blocks, and heating the first and second glass blocks to fuse the first and second glass blocks together.
    Type: Application
    Filed: January 11, 2018
    Publication date: July 19, 2018
    Inventors: Sezhian Annamalai, Kenneth Edward Hrdina, Xinghua Li
  • Patent number: 10017413
    Abstract: A method of forming a doped silica-titania glass is provided. The method includes blending batch materials comprising silica, titania, and at least one dopant. The method also includes heating the batch materials to form a glass melt. The method further includes consolidating the glass melt to form a glass article, and annealing the glass article.
    Type: Grant
    Filed: November 24, 2015
    Date of Patent: July 10, 2018
    Assignee: Corning Incorporated
    Inventors: Sezhian Annamalai, Carlos Alberto Duran, Kenneth Edward Hrdina, Lisa Anne Moore
  • Publication number: 20180105452
    Abstract: A glass composite for use in Extreme Ultra-Violet Lithography (EUVL) is provided. The glass composite includes a first silica-titania glass section. The glass composite further includes a second doped silica-titania glass section mechanically bonded to a surface of the first silica-titania glass section, wherein the second doped silica-titania glass section has a thickness of greater than about 1.0 inch.
    Type: Application
    Filed: March 22, 2016
    Publication date: April 19, 2018
    Inventor: Sezhian Annamalai
  • Patent number: 9932261
    Abstract: A doped silica-titania (“DST”) glass article that includes a glass article having a glass composition comprising a silica-titania base glass containing titania at 7 to 14 wt. % and a balance of silica, and a dopant selected from the group consisting of (a) F at 0.7 to 1.5 wt. %, (b) B2O3 at 1.5 to 5 wt. %, (c) OH at 1000 to 3000 ppm, and (d) B2O3 at 0.5 to 2.5 wt. % and OH at 100 to 1400 ppm. The glass article has an expansivity slope of less than about 1.3 ppb/K2 at 20° C. For DST glass articles doped with F or B2O3, the OH level can be held to less than 10 ppm, or less than 100 ppm, respectively. In many aspects, the DST glass articles are substantially free of titania in crystalline form.
    Type: Grant
    Filed: October 19, 2016
    Date of Patent: April 3, 2018
    Assignee: Corning Incorporated
    Inventors: Sezhian Annamalai, Steven Bruce Dawes, Carlos Alberto Duran, Kenneth Edward Hrdina, William Rogers Rosch, Bryan Ray Wheaton
  • Publication number: 20170349478
    Abstract: Annealing treatments for modified titania-silica glasses and the glasses produced by the annealing treatments. The annealing treatments include an isothermal hold that facilitates equalization of non-uniformities in fictive temperature caused by non-uniformities in modifier concentration in the glasses. The annealing treatments may also include heating the glass to a higher temperature following the isothermal hold and holding the glass at that temperature for several hours. Glasses produced by the annealing treatments exhibit high spatial uniformity of CTE, CTE slope, and fictive temperature, including in the presence of a spatially non-uniform concentration of modifier.
    Type: Application
    Filed: August 25, 2017
    Publication date: December 7, 2017
    Inventors: Sezhian Annamalai, Carlos Alberto Duran, Kenneth Edward Hrdina, William Rogers Rosch
  • Patent number: 9822030
    Abstract: Annealing treatments for modified titania-silica glasses and the glasses produced by the annealing treatments. The annealing treatments include an isothermal hold that facilitates equalization of non-uniformities in fictive temperature caused by non-uniformities in modifier concentration in the glasses. The annealing treatments may also include heating the glass to a higher temperature following the isothermal hold and holding the glass at that temperature for several hours. Glasses produced by the annealing treatments exhibit high spatial uniformity of CTE, CTE slope, and fictive temperature, including in the presence of a spatially non-uniform concentration of modifier.
    Type: Grant
    Filed: January 21, 2016
    Date of Patent: November 21, 2017
    Assignee: Corning Incorporated
    Inventors: Sezhian Annamalai, Carlos Alberto Duran, Kenneth Edward Hrdina, William Rogers Rosch
  • Publication number: 20170144917
    Abstract: A doped silica-titania (“DST”) glass article that includes a glass article having a glass composition comprising a silica-titania base glass containing titania at 7 to 14 wt. % and a balance of silica, and a dopant selected from the group consisting of (a) F at 0.7 to 1.5 wt. %, (b) B2O3 at 1.5 to 5 wt. %, (c) OH at 1000 to 3000 ppm, and (d) B2O3 at 0.5 to 2.5 wt. % and OH at 100 to 1400 ppm. The glass article has an expansivity slope of less than about 1.3 ppb/K2 at 20° C. For DST glass articles doped with F or B2O3, the OH level can be held to less than 10 ppm, or less than 100 ppm, respectively. In many aspects, the DST glass articles are substantially free of titania in crystalline form.
    Type: Application
    Filed: October 19, 2016
    Publication date: May 25, 2017
    Inventors: Sezhian Annamalai, Steven Bruce Dawes, Carlos Alberto Duran, Kenneth Edward Hrdina, William Rogers Rosch, Bryan Ray Wheaton
  • Patent number: 9611169
    Abstract: A doped silica-titania glass article is provided that includes a glass article having a glass composition comprising (i) a silica-titania base glass, (ii) a fluorine dopant, and (iii) a second dopant. The fluorine dopant has a concentration of fluorine of up to 5 wt. % and the second dopant comprises one or more oxides selected from the group consisting of Al, Nb, Ta, B, Na, K, Mg, Ca and Li oxides at a total oxide concentration from 50 ppm to 6 wt. %. Further, the glass article has an expansivity slope of less than 0.5 ppb/K2 at 20° C. The second dopant can be optional. The composition of the glass article may also contain an OH concentration of less than 100 ppm.
    Type: Grant
    Filed: December 3, 2015
    Date of Patent: April 4, 2017
    Assignee: Corning Incorporated
    Inventors: Sezhian Annamalai, Carlos Alberto Duran, Kenneth Edward Hrdina
  • Patent number: 9580350
    Abstract: Ultralow expansion titania-silica glass. The glass has high hydroxyl content and optionally include one or more dopants. Representative optional dopants include boron, alkali elements, alkaline earth elements or metals such as Nb, Ta, Al, Mn, Sn Cu and Sn. The glass is prepared by a process that includes steam consolidation to increase the hydroxyl content. The high hydroxyl content or combination of dopant(s) and high hydroxyl content lowers the fictive temperature of the glass to provide a glass having a very low coefficient of thermal expansion (CTE), low fictive temperature (Tf), and low expansivity slope.
    Type: Grant
    Filed: October 23, 2015
    Date of Patent: February 28, 2017
    Assignee: Corning Incorporated
    Inventors: Sezhian Annamalai, Carlos Alberto Duran, Kenneth Edward Hrdina
  • Publication number: 20160236965
    Abstract: Annealing treatments for modified titania-silica glasses and the glasses produced by the annealing treatments. The annealing treatments include an isothermal hold that facilitates equalization of non-uniformities in fictive temperature caused by non-uniformities in modifier concentration in the glasses. The annealing treatments may also include heating the glass to a higher temperature following the isothermal hold and holding the glass at that temperature for several hours. Glasses produced by the annealing treatments exhibit high spatial uniformity of CTE, CTE slope, and fictive temperature, including in the presence of a spatially non-uniform concentration of modifier.
    Type: Application
    Filed: January 21, 2016
    Publication date: August 18, 2016
    Inventors: Sezhian Annamalai, Carlos Alberto Duran, Kenneth Edward Hrdina, William Rogers Rosch
  • Patent number: 9382151
    Abstract: A glass article for use in Extreme Ultra-Violet Lithography (EUVL) is provided. The glass article includes a silica-titania glass having a compositional gradient through the glass article, the compositional gradient being defined by the functions: [TiO2]=(c+f(x,y,z)), and [SiO2]=(100?{c+f(x,y,z)}??(x,y,z)) wherein [TiO2] is the concentration of titania in wt. %, [SiO2] is the concentration of silica in wt. %, c is the titania concentration in wt. % for a predetermined zero crossover temperature (Tzc), f(x, y, z) is a function in three-dimensional space that defines the difference in average composition of a volume element centered at the coordinates (x, y, z) with respect to c, and ?(x, y, z) is a function in three-dimensional space that defines the sum of all other components of a volume element centered at the coordinates (x, y, z).
    Type: Grant
    Filed: January 26, 2015
    Date of Patent: July 5, 2016
    Assignee: Corning Incorporated
    Inventors: William R. Angell, IV, Sezhian Annamalai, Carlos Alberto Duran, John Edward Maxon
  • Patent number: 9382150
    Abstract: A boron-doped titania-silica glass containing 0.1 wt % to 8.0 wt % boron, 9.0 wt % to 16.0 wt % TiO2, and 76.0 wt % to 90.9 wt % SiO2. The glass may further include F, Nb, Ta, Al, Li, Na, K, Ca, and Mg, individually or in combinations of two or more, at levels up to 4 wt %. The glass may have an OH concentration of more than 10 ppm. The glass features a CTE slope at 20° C. of less than 1 ppb/K2. The fictive temperature of the glass is less than 825° C. and the peak CTE of the glass is less than 30 ppb/K. The glass has two crossover temperatures and a wide temperature interval over which CTE is close to zero. The uniformity of each crossover temperature relative to its average over a volume of at least 50 cm3 is within ±5° C.
    Type: Grant
    Filed: March 4, 2015
    Date of Patent: July 5, 2016
    Assignee: Corning Incorporated
    Inventors: Sezhian Annamalai, Carlos Alberto Duran, Kenneth Edward Hrdina
  • Publication number: 20160168010
    Abstract: A doped silica-titania glass article is provided that includes a glass article having a glass composition comprising (i) a silica-titania base glass, (ii) a fluorine dopant, and (iii) a second dopant. The fluorine dopant has a concentration of fluorine of up to 5 wt. % and the second dopant comprises one or more oxides selected from the group consisting of Al, Nb, Ta, B, Na, K, Mg, Ca and Li oxides at a total oxide concentration from 50 ppm to 6 wt. %. Further, the glass article has an expansivity slope of less than 0.5 ppb/K2 at 20° C. The second dopant can be optional. The composition of the glass article may also contain an OH concentration of less than 100 ppm.
    Type: Application
    Filed: December 3, 2015
    Publication date: June 16, 2016
    Inventors: Sezhian Annamalai, Carlos Alberto Duran, Kenneth Edward Hrdina
  • Publication number: 20160145147
    Abstract: A method of forming a doped silica-titania glass is provided. The method includes blending batch materials comprising silica, titania, and at least one dopant. The method also includes heating the batch materials to form a glass melt. The method further includes consolidating the glass melt to form a glass article, and annealing the glass article.
    Type: Application
    Filed: November 24, 2015
    Publication date: May 26, 2016
    Inventors: Sezhian Annamalai, Carlos Alberto Duran, Kenneth Edward Hrdina, Lisa Anne Moore