Patents by Inventor Shad Hedges

Shad Hedges has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and system for removal of contaminates from phaseshift photomasks
    Patent number: 8627836
    Abstract: A system and method to clean the pellicle frame and adhesive ring of a photomask reticle are described. One embodiment includes a cover that isolates the photomasks from the pellicle frame. The reticle is secured between a spin chuck and the cover so that the photomasks are isolated and protected from solvents used in a cleaning process. With the reticle secured to the spin chuck, the spin chuck is rotated under a pressurized spray of solvent. The solvent, which is caustic to the photomasks, removes the contaminants from the adhesive ring. After the exposed areas are cleaned, the cover is removed and foreign material from photomasks are removed using less invasive solvents and methods.
    Type: Grant
    Filed: November 27, 2007
    Date of Patent: January 14, 2014
    Assignee: Micron Technology, Inc.
    Inventors: Shad Hedges, James Baugh
  • METHOD AND SYSTEM FOR REMOVAL OF CONTAMINATES FROM PHASESHIFT PHOTOMASKS
    Publication number: 20120237703
    Abstract: A system and method to clean the pellicle frame and adhesive ring of a photomask reticle are described. One embodiment includes a cover that isolates the photomasks from the pellicle frame. The reticle is secured between a spin chuck and the cover so that the photomasks are isolated and protected from solvents used in a cleaning process. With the reticle secured to the spin chuck, the spin chuck is rotated under a pressurized spray of solvent. The solvent, which is caustic to the photomasks, removes the contaminants from the adhesive ring. After the exposed areas are cleaned, the cover is removed and foreign material from photomasks are removed using less invasive solvents and methods.
    Type: Application
    Filed: November 27, 2007
    Publication date: September 20, 2012
    Applicant: Micron Technology, Inc.
    Inventors: Shad Hedges, James Baugh
  • Method and system for removal of contaminates from phaseshift photomasks
    Patent number: 7300526
    Abstract: A system and method to clean the pellicle frame and adhesive ring of a photomask reticle are described. One embodiment includes a cover that isolates the photomasks from the pellicle frame. The reticle is secured between a spin chuck and the cover so that the photomasks are isolated and protected from solvents used in a cleaning process. With the reticle secured to the spin chuck, the spin chuck is rotated under a pressurized spray of solvent. The solvent, which is caustic to the photomasks, removes the contaminants from the adhesive ring. After the exposed areas are cleaned, the cover is removed and foreign material from photomasks are removed using less invasive solvents and methods.
    Type: Grant
    Filed: March 6, 2006
    Date of Patent: November 27, 2007
    Assignee: Micron Technology, Inc.
    Inventors: Shad Hedges, James Baugh
  • Method and system for removal of contaminates from phaseshift photomasks
    Publication number: 20060144425
    Abstract: A system and method to clean the pellicle frame and adhesive ring of a photomask reticle are described. One embodiment includes a cover that isolates the photomasks from the pellicle frame. The reticle is secured between a spin chuck and the cover so that the photomasks are isolated and protected from solvents used in a cleaning process. With the reticle secured to the spin chuck, the spin chuck is rotated under a pressurized spray of solvent. The solvent, which is caustic to the photomasks, removes the contaminants from the adhesive ring. After the exposed areas are cleaned, the cover is removed and foreign material from photomasks are removed using less invasive solvents and methods.
    Type: Application
    Filed: March 6, 2006
    Publication date: July 6, 2006
    Applicant: Micron Technology, Inc.
    Inventors: Shad Hedges, James Baugh
  • Method and system for removal of contaminates from phaseshift photomasks
    Patent number: 7008487
    Abstract: A system and method to clean the pellicle frame and adhesive ring of a photomask reticle are described. One embodiment includes a cover that isolates the photomasks from the pellicle frame. The reticle is secured between a spin chuck and the cover so that the photomasks are isolated and protected from solvents used in a cleaning process. With the reticle secured to the spin chuck, the spin chuck is rotated under a pressurized spray of solvent. The solvent, which is caustic to the photomasks, removes the contaminants from the adhesive ring. After the exposed areas are cleaned, the cover is removed and foreign material from photomasks are removed using less invasive solvents and methods.
    Type: Grant
    Filed: March 4, 2002
    Date of Patent: March 7, 2006
    Assignee: Micron Technology, Inc.
    Inventors: Shad Hedges, James Baugh