Patents by Inventor SHALINA D. SUDHEERAN

SHALINA D. SUDHEERAN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods and apparatus for cleaning a substrate
    Patent number: 9177782
    Abstract: A substrate cleaning apparatus may include a substrate support member to support a substrate having a first side and a contaminated second side; a liquid carbon dioxide source; a gaseous carbon dioxide source; and one or more nozzles coupled to the liquid carbon dioxide source and to the gaseous carbon dioxide source, wherein the one or more nozzles are configured to receive liquid carbon dioxide and to discharge a first mixture of solid and gaseous carbon dioxide from the liquid carbon dioxide source to the second side of the substrate and to receive gaseous carbon dioxide and to discharge a second mixture of solid and gaseous carbon dioxide from the gaseous carbon dioxide source to the second side of the substrate. Methods of cleaning a substrate may be performed in the substrate cleaning apparatus.
    Type: Grant
    Filed: March 5, 2013
    Date of Patent: November 3, 2015
    Assignee: APPLIED MATERIALS, INC.
    Inventors: James Matthew Holden, Song-Moon Suh, Shalina D. Sudheeran, Glen T. Mori
  • METHODS AND APPARATUS FOR CLEANING A SUBSTRATE
    Publication number: 20140251374
    Abstract: A substrate cleaning apparatus may include a substrate support member to support a substrate having a first side and a contaminated second side; a liquid carbon dioxide source; a gaseous carbon dioxide source; and one or more nozzles coupled to the liquid carbon dioxide source and to the gaseous carbon dioxide source, wherein the one or more nozzles are configured to receive liquid carbon dioxide and to discharge a first mixture of solid and gaseous carbon dioxide from the liquid carbon dioxide source to the second side of the substrate and to receive gaseous carbon dioxide and to discharge a second mixture of solid and gaseous carbon dioxide from the gaseous carbon dioxide source to the second side of the substrate. Methods of cleaning a substrate may be performed in the substrate cleaning apparatus.
    Type: Application
    Filed: March 5, 2013
    Publication date: September 11, 2014
    Applicant: APPLIED MATERIALS, INC.
    Inventors: JAMES MATTHEW HOLDEN, SONG-MOON SUH, SHALINA D. SUDHEERAN, GLEN T. MORI