Patents by Inventor Shamouil Shamouliam

Shamouil Shamouliam has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Reduction of contaminant buildup in semiconductor apparatus
    Patent number: 5622565
    Abstract: The present invention provides an apparatus for semiconductor processing in which the reactor chamber and the vacuum conduit means connected to the chamber are coated with a film of halogenated polymer material having a low vapor pressure and a low sticking coefficient. Preferred materials include low molecular weight polyfluoroethylene polymers such as polytetrafluoroethylene and polychlorotrifluoro-ethylene. A method is provided to prevent contaminant buildup on coated surfaces of semiconductor processing chambers and vacuum conduit means connected thereto during processing of a workpiece.
    Type: Grant
    Filed: January 16, 1996
    Date of Patent: April 22, 1997
    Assignee: Applied Materials, Inc.
    Inventors: Yan Ye, Anand Gupta, Shamouil Shamouliam
  • Reduction of contaminant buildup in semiconductor processing apparatus
    Patent number: 5578131
    Abstract: The present invention provides an apparatus for semiconductor processing in which the reactor chamber and the vacuum conduit means connected to the chamber are coated with a film of halogenated polymer material having a low vapor pressure and a low sticking coefficient. Preferred materials include low molecular weight polyfluoroethylene polymers such as polytetrafluoroethylene and polychlorotrifluoro-ethylene. A method is provided to prevent contaminant buildup on coated surfaces of semiconductor processing chambers and vacuum conduit means connected thereto during processing of a workpiece.
    Type: Grant
    Filed: June 2, 1995
    Date of Patent: November 26, 1996
    Inventors: Yan Ye, Anand Gupta, Shamouil Shamouliam