Patents by Inventor Shan-Chan Suc

Shan-Chan Suc has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for repairing opaque defects on semiconductor mask reticles
    Patent number: 7223503
    Abstract: A method is disclosed for repairing an opaque defect on a mask substrate. After examining one or more opaque patterns in a predetermined area of the mask substrate, at least one opaque defect in the opaque patterns is identified based on a difference between its light reflection rate and a reference reflection rate. A residue height of the opaque defect is further determined based on its light transmission rate, and a repair formula such as an etching dosage is devised based on the determined residue height.
    Type: Grant
    Filed: December 30, 2003
    Date of Patent: May 29, 2007
    Assignee: Taiwan Semiconductor Manufacturing Company
    Inventors: Wei-Lian Lin, Chian-Hun Lai, Shao-Chi Wei, Chi-Kang Chang, Chia-Hsien Chen, Shan-Chan Suc, Chun-Hung Kung
  • Method for repairing opaque defects on semiconductor mask reticles
    Publication number: 20050146715
    Abstract: A method is disclosed for repairing an opaque defect on a mask substrate. After examining one or more opaque patterns in a predetermined area of the mask substrate, at least one opaque defect in the opaque patterns is identified based on a difference between its light reflection rate and a reference reflection rate. A residue height of the opaque defect is further determined based on its light transmission rate, and a repair formula such as an etching dosage is devised based on the determined residue height.
    Type: Application
    Filed: December 30, 2003
    Publication date: July 7, 2005
    Inventors: Wei-Lian Lin, Chian-Hun Lai, Shao-Chi Wei, Chi-Kang Chang, Chia-Hsien Chen, Shan-Chan Suc, Chun-Hung Kung