Patents by Inventor Shan Christopher Clark

Shan Christopher Clark has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Cleaning composition and method of cleaning semiconductor substrate
    Patent number: 7442675
    Abstract: A cleaning composition comprises at least quaternary ammonium hydroxide, a water-soluble organic solvent, water, an anticorrosive, and potassium hydroxide of 1 mass percent or less of a total amount of the solution. This cleaning composition can singly and effectively remove a photoresist film, a buried material, a metallic residue from the surface of a semiconductor substrate.
    Type: Grant
    Filed: June 10, 2004
    Date of Patent: October 28, 2008
    Assignees: Tokyo Ohka Kogyo Co., Ltd., Intel Corporation
    Inventors: Shigeru Yokoi, Kazumasa Wakiya, Takayuki Haraguchi, Makarem A. Hussein, Lana I. Jong, Shan Christopher Clark
  • Polymerization processes using aliphatic maleimides
    Patent number: 6855745
    Abstract: Aliphatic maleimides and methods using the same are disclosed. Polymerization of compositions which include the compounds of the invention may be activated by irradiating the composition with radiation.
    Type: Grant
    Filed: October 8, 2001
    Date of Patent: February 15, 2005
    Assignees: Albemarle Corporation, University of Southern Mississippi
    Inventors: Charles E. Hoyle, Shan Christopher Clark, E. Sonny Jönsson
  • Cleaning composition, method of cleaning semiconductor substrate, and method of forming wiring on semiconductor substrate
    Publication number: 20040259761
    Abstract: A cleaning composition comprises at least quaternary ammonium hydroxide, a water-soluble organic solvent, water, an anticorrosive, and potassium hydroxide of 1 mass percent or less of a total amount of the solution. This cleaning composition can singly and effectively remove a photoresist film, a buried material, a metallic residue from the surface of a semiconductor substrate.
    Type: Application
    Filed: June 10, 2004
    Publication date: December 23, 2004
    Applicant: TOKYO OHKA KOGYO CO., LTD. INTEL CORPORATION
    Inventors: Shigeru Yokoi, Kazumasa Wakiya, Takayuki Haraguchi, Makarem A. Hussein, Lana I. Jong, Shan Christopher Clark
  • Polymerization processes using alphatic maleimides
    Publication number: 20040235976
    Abstract: Aliphatic maleimide compounds having at least one maleimide unit substituted with a functionalized aliphatic radical at the nitrogen atom are provided. The aliphatic radical can be a linear or branched C1 to C10 alkyl, such as methyl or ethyl. The aliphatic maleimide compounds are useful as photoinitiators. Polymerization of compositions that include the aliphatic maleimide compounds may be activated by radiation.
    Type: Application
    Filed: May 10, 2004
    Publication date: November 25, 2004
    Inventors: Charles E. Hoyle, Shan Christopher Clark, E. Sonny Jonsson
  • Photopolymerization compositions including maleimides and processes for using the same
    Patent number: 6555593
    Abstract: Photopolymerization compositions which include maleimides and processes using the same are disclosed. Polymerization of compositions which include maleimides in combination with a benzophenone compound/hydrogen atom donor sensitizer system may be activated by irradiating the composition with radiation.
    Type: Grant
    Filed: January 29, 1999
    Date of Patent: April 29, 2003
    Assignee: Albemarle Corporation
    Inventors: Charles E. Hoyle, Rajamani Nagarajan, Christopher W. Miller, Shan Christopher Clark, E. Sonny Jönsson, Liying Shao
  • Polymerization processes using aliphatic maleimides
    Patent number: 6369124
    Abstract: Aliphatic maleimides and methods using the same are disclosed. Polymerization of compositions which include the compounds of the invention may be activated by irradiating the composition with radiation.
    Type: Grant
    Filed: July 7, 1999
    Date of Patent: April 9, 2002
    Assignees: First Chemical Corporation, University of Southern Mississippi
    Inventors: Charles E. Hoyle, Shan Christopher Clark, E. Sonny Jönsson
  • Polymerization processes using aliphatic maleimides
    Publication number: 20020019453
    Abstract: Aliphatic maleimides and methods using the same are disclosed. Polymerization of compositions which include the compounds of the invention may be activated by irradiating the composition with radiation.
    Type: Application
    Filed: October 8, 2001
    Publication date: February 14, 2002
    Applicant: First Chemical Corporation
    Inventors: Charles E. Hoyle, Shan Christopher Clark, E. Sonny Jonsson
  • Polymerization processes using aliphatic maleimides
    Patent number: 6034150
    Abstract: Aliphatic maleimides and methods using the same are disclosed. Polymerization of compositions which include the compounds of the invention may be activated by irradiating the composition with radiation in the absence of a photoinitiator.
    Type: Grant
    Filed: August 22, 1997
    Date of Patent: March 7, 2000
    Assignees: University of Southern Mississippi, First Chemical Corp.
    Inventors: Charles E. Hoyle, Shan Christopher Clark, E. Sonny Jonsson