Abstract: One embodiment of the present disclosure provides a copper foil including a copper film including 99.9 wt % or more of copper, and a protective layer disposed on the copper film, wherein the copper foil has a first moisture absorption rate of 0.1% or less. The first moisture absorption rate is expressed by Equation 1 below, first moisture absorption rate=(weight after 24-hour immersion-weight before immersion)/(weight after 24-hour immersion)×100??[Equation 1] wherein the immersion in Equation 1 refers to immersing a specimen in water at room temperature for 24 hours.

Abstract: One embodiment of the present disclosure provides a copper foil including a copper film having a matte surface and a shiny surface, and a protective layer disposed on the copper film, wherein the copper film includes copper and non-copper elements, and the non-copper elements include carbon (C), nitrogen (N), and oxygen (O).

Abstract: One embodiment of the present disclosure provides a copper foil including a copper film including a matte surface and a shiny surface, wherein a hydrogen vacancy density at a depth of 30 nm to 45 nm from the matte surface ranges from 80 to 250 counts, a hydrogen vacancy density at a depth of 30 nm to 45 nm from the shiny surface ranges from 3 to 20 counts. The hydrogen vacancy density refers to the number of hydrogen ions measured at a certain sputter depth from each of the matte surface and the shiny surface using time of flight-secondary ion mass spectrometry (TOF-SIMS).

Abstract: One embodiment of the present disclosure provides a copper foil including a copper film having a matte surface and a shiny surface, and a protective layer disposed on the copper film, wherein the copper film has a first surface in a direction of the matte surface and a second surface in a direction of the shiny surface, and Equation 1 below is satisfied. 3.0 kgf/mm2?tensile strength×average kinetic friction coefficient?8.0 kgf/mm2,??[Equation 1] the average kinetic friction coefficient in Equation 1 means an average value of kinetic friction coefficients of the first surface and the second surface.

Abstract: One embodiment of the present disclosure provides a copper foil including a copper film including 99.9 wt % or more of copper, and a protective layer disposed on the copper film, wherein the copper foil has a first room-temperature thermal expansion coefficient of 10 ppm/° C. to 25 ppm/° C. and a high-temperature thermal expansion coefficient of 20 ppm/° C. to 35 ppm/° C. The first room-temperature thermal expansion coefficient is a thermal expansion coefficient measured in a machine direction (MD direction), and the high-temperature thermal expansion coefficient is a thermal expansion coefficient measured in the MD direction after heat-treating the copper foil at 190° C.

Abstract: One embodiment of the present disclosure provides a copper foil including a copper film including 99.9 wt % or more of copper, and a protective layer disposed on the copper film, wherein the copper foil has a room-temperature thermal deformation index ranging from 15 to 50. The room-temperature thermal deformation index is expressed by Equation 1 below, room - temperature ? thermal ? deformation ? index = ( room - ? temperature ? thermal ? expansion ? coefficient ? ( ppm / ° ? C . ) + ? room - temperature ? elongation ? ( % ) ) / surface ? area ? ratio .

Abstract: One embodiment of the present disclosure provides a copper foil including a copper film having a matte surface and a shiny surface, and a protective layer disposed on the copper film, wherein the copper film has a first surface in a direction of the matte surface and a second surface in a direction of the shiny surface, and Equation 1 below is satisfied. 45?[(average 60° gloss)/(G.U.)×(average peak density)/(count)]/100?70,??[Equation 1] the average peak density in Equation 1 means an average value of peak densities of the first surface and the second surface, the peak density means a value acquired by dividing a peak count roughness (Rpc) by a surface area ratio, and the average 60° gloss in Equation 1 means an average value of 60° glosses of the first surface and the second surface.

Abstract: Provided in one embodiment of the present disclosure is a copper foil, which comprises a copper layer having a matte surface and a shiny surface, and an anticorrosive film arranged on the copper layer, and has a residual stress of 0.5-25 MPa on the basis of the absolute value thereof, wherein the copper layer comprises copper and carbon (C), the amount of carbon (C) in the copper layer is 2-20 ppm, the copper layer has a plane (111), a plane (200), a plane (220) and a plane (311) including crystalline particles, the ratio of the diffraction intensity of the plane (220) to the sum of the diffraction intensities of the plane (111), the plane (200), the plane (220) and the plane (311) is 10-40%, and the crystalline particles of the plane (220) have an average particle size of 70-120 nm at room temperature.

Abstract: According to one embodiment of the present disclosure, there is provided a copper foil including a copper film including 99.9 wt % or more of copper, wherein the copper foil has a first weight retention rate of 0.1% or less, and a second weight retention rate of 0.3% or less.

Abstract: According to one embodiment of the present disclosure, there is provided a copper foil including a copper film including 99.9 wt % or more of copper, wherein the copper film has an A-value in a range of 1.1 to 1.6. “A” is calculated by Equation 1 below, A = P / Q [ Equation ? 1 ] wherein “P” in Equation 1 is a peak intensity at 1650 cm?1 of the copper film, “Q” in Equation 1 is a peak intensity at 1460 cm?1 of the copper film, and the peak intensity is measured by Fourier-transform infrared spectroscopy (FT-IR).

Abstract: According to one embodiment of the present disclosure, there is provided a copper foil including a copper film including 99.9 wt % or more of copper, wherein the copper foil has a room temperature MIT 1 of 280 or more, a high-temperature MIT 1 of 130 or more, a room temperature MIT 2 of 14 or more, and a high-temperature MIT 2 of 25 or more. The room temperature MIT 1 refers to an MIT number when a bending radius (R) is 0.38 mm at room temperature, the high-temperature MIT 1 refers to an MIT number when a bending radius (R) is 0.38 mm after heat treatment at 190° C. for one hour, the room temperature MIT 2 refers to an MIT number when a bending radius (R) is 0.1 mm at room temperature, and the high-temperature MIT 2 refers to an MIT number when a bending radius (R) is 0.1 mm after heat treatment at 190° C. for one hour.

Abstract: According to one embodiment of the present disclosure, there is provided a copper foil including a copper film including 99.9 wt % or more of copper, wherein the copper foil has a first stress factor in a range of 2.8 to 3.2, a second stress factor in a range of 2.5 to 3.0, and a third stress factor in a range of 3.5 to 4.5, and a method for manufacturing the copper foil.

Abstract: According to one embodiment of the present disclosure, there is provided a copper foil including a copper film including 99.9 wt % or more of copper, wherein the copper film has a room temperature loss factor of 0.05 or less, wherein the room temperature loss factor is calculated by Equation 1 below, room temperature loss factor=room temperature loss modulus/room temperature storage modulus.

Abstract: According to one embodiment of the present disclosure, there is provided a copper foil including a copper film including 99.9 wt % or more of copper, and a protective layer formed on the copper film, wherein the copper foil has a room temperature puncture strength in a range of 5.0 N to 7.0 N, and a high-temperature puncture strength in a range of 8.0 N to 12.5 N. At this time, the high-temperature puncture strength is a puncture strength measured after heat treatment at 190° C. for one hour.

Abstract: According one embodiment of the present disclosure, there is provided a copper foil including a copper film including 99.9 wt % or more of copper, and a protective layer formed on the copper film, wherein the copper foil has a tensile strength index of 3.0 kgf/mm2 or less, and an elongation index of 2.1% or less.

Abstract: According to one embodiment of the present disclosure, there is provided a copper foil including a copper film having 99.9 wt % or more of copper, wherein the copper foil has a color difference coefficient in a range of 0.38 to 0.7 based on the Lab color system.

Abstract: According to one embodiment of the present disclosure, there is provided a copper foil including a copper film including 99.9 wt % or more of copper, and a protective layer formed on the copper film, wherein the copper foil has a room temperature water contact angle in a range of 60° to 70°, and a room temperature surface resistivity in a range of 2.4 m?/cm to 2.7 m?/cm.

Abstract: According to one embodiment of the present disclosure, there is provided a copper foil including a copper film including 99.9 wt % or more of copper, and having an R value in a range of 2.0 to 3.5.

Abstract: The present invention relates to an electrolytic copper foil having excellent handling characteristics in the manufacture of copper foil and in post-processing for manufacturing a secondary battery. The present invention provides an electrolytic copper foil having a first surface and a second surface, wherein the texture coefficient of the (220) plane of the electrolytic copper foil is 0.4-1.32, the difference (|?(Rz/Ra)|) between Rz/Ra on the first surface and Rz/Ra on the second surface, of the electrolytic copper foil, is less than 2.42, and the difference (|?PD|) in peak density (PD) between the first surface and the second surface, of the electrolytic copper foil, is 96 ea or less.

Abstract: Disclosed is a copper foil including a copper layer having a matte surface and a shiny surface, and an anticorrosive layer disposed on the copper layer, wherein the copper foil has a residual stress of 0.5 to 25 Mpa, based on absolute value, and the copper layer has a plurality of crystal planes, wherein a ratio [TCR (220)] of a texture coefficient (TC) of (220) crystal plane of the copper layer to a total of texture coefficients (TC) of (111), (200), (220) and (311) crystal planes of the copper layer is 5 to 30%.