Patents by Inventor Shane Conley

Shane Conley has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12340967
    Abstract: Techniques for adjusting the shape of an ion beam are described. Characteristics of a desired beam shape may be defined. The ion beam generator may include beam shaping elements associated with tunable parameters that can be set in combination with each other. A search space for the possible combinations is defined. A set of exploratory points in the search space are measured and used to interpolate a large number of interpolated points based on a regression model. Interpolated points that are associated with low confidence values may be measured. Based on the measured and interpolated points, clusters of tunable parameter combinations may be identified for evaluation. The clusters are evaluated for stability and sensitivity, and one of the clusters is selected based on the evaluation. The ion beam generator may be configured based on the selected cluster.
    Type: Grant
    Filed: July 14, 2021
    Date of Patent: June 24, 2025
    Assignee: Applied Materials, Inc.
    Inventors: Richard Allen Sprenkle, Richard White, Eric Donald Wilson, Shane Conley, Ana Samolov, Nilay A. Pradhan
  • Publication number: 20230013095
    Abstract: Techniques for adjusting the shape of an ion beam are described. Characteristics of a desired beam shape may be defined. The ion beam generator may include beam shaping elements associated with tunable parameters that can be set in combination with each other. A search space for the possible combinations is defined. A set of exploratory points in the search space are measured and used to interpolate a large number of interpolated points based on a regression model. Interpolated points that are associated with low confidence values may be measured. Based on the measured and interpolated points, clusters of tunable parameter combinations may be identified for evaluation. The clusters are evaluated for stability and sensitivity, and one of the clusters is selected based on the evaluation. The ion beam generator may be configured based on the selected cluster.
    Type: Application
    Filed: July 14, 2021
    Publication date: January 19, 2023
    Applicant: Applied Materials, Inc.
    Inventors: Richard Allen Sprenkle, Richard White, Eric Donald Wilson, Shane Conley, Ana Samolov, Nilay A. Pradhan
  • Publication number: 20200027698
    Abstract: An apparatus for monitoring of an ion beam. The apparatus may include a processor; and a memory unit coupled to the processor, including a display routine, where the display routine operative on the processor to manage monitoring of the ion beam. The display routine may include a measurement processor to receive a plurality of spot beam profiles of the ion beam, the spot beam profiles collected during a fast scan of the ion beam and a slow mechanical scan of a detector, conducted simultaneously with the fast scan. The fast scan may comprise a plurality of scan cycles having a frequency of 10 Hz or greater along a fast scan direction, and the slow mechanical scan being performed in a direction parallel to the fast scan direction. The measurement processor may also send a display signal to display at least one set of information, derived from the plurality of spot beam profiles.
    Type: Application
    Filed: September 30, 2019
    Publication date: January 23, 2020
    Applicant: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Eric D. Wilson, George M. Gammel, Sruthi Chennadi, Daniel Tieger, Shane Conley
  • Patent number: 10431421
    Abstract: An apparatus for monitoring of an ion beam. The apparatus may include a processor; and a memory unit coupled to the processor, including a display routine, where the display routine operative on the processor to manage monitoring of the ion beam. The display routine may include a measurement processor to receive a plurality of spot beam profiles of the ion beam, the spot beam profiles collected during a fast scan of the ion beam and a slow mechanical scan of a detector, conducted simultaneously with the fast scan. The fast scan may comprise a plurality of scan cycles having a frequency of 10 Hz or greater along a fast scan direction, and the slow mechanical scan being performed in a direction parallel to the fast scan direction. The measurement processor may also send a display signal to display at least one set of information, derived from the plurality of spot beam profiles.
    Type: Grant
    Filed: November 3, 2017
    Date of Patent: October 1, 2019
    Assignee: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC
    Inventors: Eric D. Wilson, George M. Gammel, Sruthi Chennadi, Daniel Tieger, Shane Conley
  • Publication number: 20190139740
    Abstract: An apparatus for monitoring of an ion beam. The apparatus may include a processor; and a memory unit coupled to the processor, including a display routine, where the display routine operative on the processor to manage monitoring of the ion beam. The display routine may include a measurement processor to receive a plurality of spot beam profiles of the ion beam, the spot beam profiles collected during a fast scan of the ion beam and a slow mechanical scan of a detector, conducted simultaneously with the fast scan. The fast scan may comprise a plurality of scan cycles having a frequency of 10 Hz or greater along a fast scan direction, and the slow mechanical scan being performed in a direction parallel to the fast scan direction. The measurement processor may also send a display signal to display at least one set of information, derived from the plurality of spot beam profiles.
    Type: Application
    Filed: November 3, 2017
    Publication date: May 9, 2019
    Applicant: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Eric D. Wilson, George M. Gammel, Sruthi Chennadi, Daniel Tieger, Shane Conley