Patents by Inventor Shang Zhu

Shang Zhu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240112760
    Abstract: Examples are disclosed that relate to using natural language processing (NLP) to determine a recipe for a chemical synthesis described in a text to create a life cycle inventory (LCI). One example provides a method comprising receiving an input of a text from a publication comprising a description of a chemical product, and analyzing the text using NLP to determine a recipe for the chemical synthesis, the recipe comprising and action and action metadata, the action metadata comprising a reactant. The method further discloses obtaining LCI information for the reactant, determining an energy utilized for the action, and creating an estimate of an environmental impact for the product.
    Type: Application
    Filed: September 30, 2022
    Publication date: April 4, 2024
    Applicant: Microsoft Technology Licensing, LLC
    Inventors: Kali Diane FROST, Bichlien Hoang NGUYEN, Jake Allen SMITH, Yingce XIA, Shufang XIE, Griffin ADAMS, Shang ZHU
  • Publication number: 20230178710
    Abstract: The present disclosure is directed to a battery that comprise at least one electrochemical cell that comprises a cathode, an anode or an anode current collector and an electrolyte disposed between the cathode and the anode or the current collector, wherein (a) the anode comprises an isotopically enriched metal; (b) the cathode comprises isotopically enriched metal ions; (c) the electrolyte comprises an isotopically enriched metal salt; (d) a combination of (a) and (b); (e) a combination of (a) and (c); (f) a combination of (b) and (c); or (g) a combination of (a), (b) and (c).
    Type: Application
    Filed: July 16, 2021
    Publication date: June 8, 2023
    Inventors: Venkatasubramanian Viswanathan, Zeeshan Ahmad, Shang Zhu
  • Patent number: 5275686
    Abstract: An improved gas distribution scheme for a multi-wafer radially injected convergent horizontal epitaxial reactor which includes two outer distribution rings, an outer injection ring, an annular susceptor, and a central exhaust tube. The converging path of the gas stream from the outer injection ring into the central exhaust tube compensates for depletion of the reactant gases along the substrate. The injector ring has a large number of evenly spaced diffuser orifices that allow the gas to expand into the growth chamber in a laminar flow pattern. The design is compact, includes the possibility of water cooling of the quartz during deposition, and allows for a resistive bakeout furnace which can be used to etch and clean the reaction chamber between runs.
    Type: Grant
    Filed: September 25, 1991
    Date of Patent: January 4, 1994
    Assignee: University of New Mexico
    Inventors: Christian F. Schaus, Eric A. Armour, Kang Zheng, Shang-Zhu Sun, David P. Kopchik