Patents by Inventor Shangpan Chen

Shangpan Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9963789
    Abstract: Provided is a display panel, which includes an active area and a vacant area surrounding the active area, and a dummy pattern area without display functionality being along a boundary between the active area and the vacant area. Also provided are a manufacturing method of a display panel and a panel display device. A dummy pattern area is provided along a boundary of an active area to withstand a loading effect and to ensure the active area is not affected by the loading effect and display patterns are normal and uniform.
    Type: Grant
    Filed: March 30, 2016
    Date of Patent: May 8, 2018
    Assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd
    Inventors: Hua Zheng, Shyh-Feng Chen, Pei Lin, Mingwen Lin, Liangdong Wu, Pan Gao, Shangpan Chen, Long Pan
  • Publication number: 20160208393
    Abstract: Provided is a display panel, which includes an active area and a vacant area surrounding the active area, and a dummy pattern area without display functionality being along a boundary between the active area and the vacant area. Also provided are a manufacturing method of a display panel and a panel display device. A dummy pattern area is provided along a boundary of an active area to withstand a loading effect and to ensure the active area is not affected by the loading effect and display patterns are normal and uniform.
    Type: Application
    Filed: March 30, 2016
    Publication date: July 21, 2016
    Applicant: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD
    Inventors: Hua ZHENG, Shyh-Feng CHEN, Pei LIN, Mingwen LIN, Liangdong WU, Pan GAO, Shangpan CHEN, Long PAN
  • Patent number: 9323080
    Abstract: The present invention provides a display panel, which includes active area and vacant area surrounding the active area, and dummy pattern area without display functionality being disposed along boundary between active area and vacant area. The present invention also provides a manufacturing method of display panel and a panel display device. The present invention disposes dummy pattern area along boundary active area to withstand loading effect and to ensure active area is not affected by loading effect and display patterns are normal and uniform.
    Type: Grant
    Filed: September 13, 2012
    Date of Patent: April 26, 2016
    Assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd
    Inventors: Hua Zheng, Shyh-Feng Chen, Pei Lin, Mingwen Lin, Liangdong Wu, Pan Gao, Shangpan Chen, Long Pan
  • Publication number: 20140103480
    Abstract: A mask for partially blocking ultraviolet rays in TFT glass substrate manufacturing process is disclosed. The mask includes a panel pattern area for forming the panel patterns, and an additional pattern area for forming additional patterns in a rim of the panel pattern area. In addition, a TFT glass substrate and the manufacturing thereof are also disclosed. By arranging the additional patterns in the rim of the panel patterns, the microstructures in the rim of the panel patterns are substantially the same with that in the middle of the panel patterns.
    Type: Application
    Filed: October 19, 2012
    Publication date: April 17, 2014
    Applicant: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO
    Inventors: Pei Lin, Hua Zheng, Liangdong Wu, Shangpan Chen, Long Pan, Pan Gao, Mingwen Lin, Shyh-Feng Chen
  • Publication number: 20140072729
    Abstract: The present invention provides a display panel, which includes active area and vacant area surrounding the active area, and dummy pattern area without display functionality being disposed along boundary between active area and vacant area. The present invention also provides a manufacturing method of display panel and a panel display device. The present invention disposes dummy pattern area along boundary active area to withstand loading effect and to ensure active area is not affected by loading effect and display patterns are normal and uniform.
    Type: Application
    Filed: September 13, 2012
    Publication date: March 13, 2014
    Applicant: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD
    Inventors: Hua Zheng, Shyh-Feng Chen, Pei Lin, Mingwen Lin, Liangdong Wu, Pan Gao, Shangpan Chen, Long Pan