Patents by Inventor Shankar Devasenathipathy
Shankar Devasenathipathy has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11923268Abstract: Techniques and mechanisms for promoting heat conduction in a packaged device using a heat spreader that is fabricated by a build-up process. In an embodiment, 3D printing of a heat spreader successively deposit layers of a thermal conductor material, where said layers variously extend each over a respective one or more IC dies. The heat spreader forms a flat top side, wherein a bottom side of the heat spreader extends over, and conforms at least partially to, different respective heights of various IC dies. In another embodiment, fabrication of a portion of the heat spreader comprises printing pore structures that contribute to a relatively low thermal conductivity of said portion. An average orientation of the oblong pores contributes to different respective thermal conduction properties for various directions of heat flow.Type: GrantFiled: February 4, 2020Date of Patent: March 5, 2024Assignee: Intel CorporationInventors: Jesus Gerardo Reyes Schuldes, Shankar Devasenathipathy, Pramod Malatkar, Aravindha Antoniswamy, Kyle Arrington
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Patent number: 11901262Abstract: Embodiments include a cooling solution having a first array of fins, where the first array of fins extend vertically from the substrate, and where adjacent individual fins of the first array are separated from each other by a microchannel. A second array of fins extend vertically from the substrate, where a channel region is between the first array of fins and the second array of fins.Type: GrantFiled: January 24, 2019Date of Patent: February 13, 2024Assignee: Intel CorporationInventors: Nicholas Neal, Zhimin Wan, Shankar Devasenathipathy, Je-Young Chang
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Patent number: 11854935Abstract: Embodiments of the present disclosure may generally relate to systems, apparatuses, techniques, and/or processes directed to packages that include stacked dies that use thermal conductivity features including thermally conductive through silicon vias (TSVs) filled with thermally conductive material located in passive areas of a first die to route heat from a first die away from a second die that is coupled with the first die. In embodiments, the first die may be referred to as a base die. Embodiments may include thermal blocks in the form of dummy dies that include TSVs at least partially filled with thermal energy conducting material such as copper, solder, or other alloy.Type: GrantFiled: February 19, 2020Date of Patent: December 26, 2023Assignee: Intel CorporationInventors: Weston Bertrand, Kyle Arrington, Shankar Devasenathipathy, Aaron McCann, Nicholas Neal, Zhimin Wan
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Patent number: 11854931Abstract: Embodiments include semiconductor packages and a method to form such packages. A semiconductor package includes first and second bottom dies on a package substrate. The semiconductor package includes first top dies on the first bottom die, second top dies on the second bottom die, and a pedestal on the first and second bottom dies. The pedestal comprises a high thermal conductive material and is positioned on a region of top surfaces of the first and second bottom dies. The semiconductor package includes an encapsulation layer over the first and second bottom dies, and surrounds the first and second top dies and the pedestal. The semiconductor package includes a TIM over the first and second top dies, pedestal, and encapsulation layer, and an integrated heat spreader (IHS) over the TIM. The pedestal is on a periphery region of the top surfaces of the first and second bottom dies.Type: GrantFiled: December 19, 2019Date of Patent: December 26, 2023Assignee: Intel CorporationInventors: Zhimin Wan, Chia-Pin Chiu, Peng Li, Shankar Devasenathipathy
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Publication number: 20230290706Abstract: A surplus liquid reservoir attached to a vapor chamber integrated heat spreader (IHS) and placed near a heat source on a heterogenous die. The vapor chamber integrated heat spreader (IHS) includes a main heat transfer portion that encloses a vapor channel, a first wick material, and a first working fluid. The surplus liquid reservoir is provided by a reservoir leg mechanically coupled, on a first side, to the main heat transfer portion, the reservoir leg has a reservoir portion with a second working fluid and second wick material that is in contact with the first wick material. The surplus liquid reservoir can either support a PL2 that is higher than a given vapor chamber Qmax for a significantly long time or increase the PL2 value to a significantly higher value.Type: ApplicationFiled: March 11, 2022Publication date: September 14, 2023Applicant: Intel CorporationInventors: Gaurav Patankar, Shankar Devasenathipathy, Krishna Vasanth Valavala
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Patent number: 11679407Abstract: To address technical problems facing silicon transient thermal management, a thermal interface material (TIM) may be used to provide improved thermal conduction. The TIM may include a liquid metal (LM) TIM, which may provide a significant reduction in thermal resistance, such as a thermal resistance RTIM?0.01-0.025° C.-cm2/W. The LM TIM may be applied using a presoaked applicator, such as an open-cell polyurethane foam applicator that has been presoaked in a controlled amount of LM TIM. This LM presoaked applicator is then used to apply the LM TIM to one or more target thermal surfaces, thereby providing thermal and mechanical coupling between the LM TIM and the thermal surface. The resulting thermal surface and thermally conductive LM TIM may be used to improve thermal conduction for various silicon-based devices, including various high-power, high-performance system-on-chip (SoC) packages, such as may be used in portable consumer products.Type: GrantFiled: June 26, 2020Date of Patent: June 20, 2023Assignee: Intel CorporationInventors: Kyle Jordan Arrington, Joseph Blaine Petrini, Aaron McCann, Shankar Devasenathipathy, James Christopher Matayabas, Jr., Mostafa Aghazadeh, Jerrod Peterson
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Patent number: 11646244Abstract: A microprocessor mounting apparatus comprising a microprocessor socket on a printed circuit board (PCB) and a bolster plate surrounding a perimeter of the microprocessor socket. The bolster plate has a first surface adjacent to the PCB, and a second surface opposite the first surface. A heat dissipation device is on the second surface of the bolster plate. The heat dissipation interface is thermally coupled to the microprocessor socket.Type: GrantFiled: June 27, 2019Date of Patent: May 9, 2023Assignee: Intel CorporationInventors: Steven A. Klein, Zhimin Wan, Chia-Pin Chiu, Shankar Devasenathipathy
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Publication number: 20230128903Abstract: Embodiments of the present disclosure may generally relate to systems, apparatuses, techniques, and/or processes directed to packages that include stacked dies that use thermal conductivity features including thermally conductive through silicon vias (TSVs) filled with thermally conductive material located in passive areas of a first die to route heat from a first die away from a second die that is coupled with the first die. In embodiments, the first die may be referred to as a base die. Embodiments may include thermal blocks in the form of dummy dies that include TSVs at least partially filled with thermal energy conducting material such as copper, solder, or other alloy.Type: ApplicationFiled: December 23, 2022Publication date: April 27, 2023Inventors: Weston BERTRAND, Kyle ARRINGTON, Shankar DEVASENATHIPATHY, Aaron MCCANN, Nicholas NEAL, Zhimin WAN
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Patent number: 11581671Abstract: An integrated circuit (IC) socket comprising a housing with a land side, an opposing die side, and sidewalls around a perimeter of the housing. The housing comprises a first dielectric. A plurality of socket pins extends from the land side of the housing through socket pin holes in the housing over the die side of the housing. A second dielectric is within the interstitial regions between the socket pins and sidewalls of the socket pin holes. A frame structure extends around at least a portion of the perimeter of the housing, and a mesh structure is embedded within the first dielectric. The mesh structure has plurality of mesh filaments extending between the plurality of socket pin holes and coupled to the frame structure.Type: GrantFiled: March 22, 2019Date of Patent: February 14, 2023Assignee: Intel CorporationInventors: Zhimin Wan, Steven A. Klein, Chia-Pin Chiu, Shankar Devasenathipathy
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Patent number: 11502008Abstract: An integrated circuit assembly including a substrate having a surface including at least one area including contact points operable for connection with an integrated circuit die; and at least one ring surrounding the at least one area, the at least one ring including an electrically conductive material. A method of forming an integrated circuit assembly including forming a plurality of electrically conductive rings around a periphery of a die area of a substrate selected for attachment of at least one integrated circuit die, wherein the plurality of rings are formed one inside the other; and forming a plurality of contact points in the die area.Type: GrantFiled: June 30, 2017Date of Patent: November 15, 2022Assignee: Intel CorporationInventors: Nicholas S. Haehn, Edvin Cetegen, Shankar Devasenathipathy
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Patent number: 11456232Abstract: Disclosed herein are thermal assemblies for multi-chip packages (MCPs), as well as related methods and devices. For example, in some embodiments, a thermal assembly for an MCP may include a heat pipe having a ring shape.Type: GrantFiled: August 10, 2018Date of Patent: September 27, 2022Assignee: Intel CorporationInventors: Zhimin Wan, Je-Young Chang, Chia-Pin Chiu, Shankar Devasenathipathy, Betsegaw Kebede Gebrehiwot, Chandra Mohan Jha
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Patent number: 11444003Abstract: An integrated heat spreader includes channel structures assembled in a frame. Each channel structure is independent of the other, and can be used to dissipate heat from integrated circuitry at a specific location within a package, and without allowing heat from that particular location to propagate to integrated circuitry at other locations within the package. Each channel structure can be implemented with metal having a high thermal conductivity (e.g., copper). The channel structures can be used in conjunction with liquid-based cooling or air-based cooling. The frame can be implemented with low thermal conductivity molding compound or plastic so the heat transfer from one channel structure to another is inhibited. The channel structures can have different configurations (e.g., straight, pillars, and/or pin fins) to provide different rates of flow, mixing, and/or cooling. The flow direction of air or liquid for the channel structures can be the same (parallel) or different (counter).Type: GrantFiled: September 27, 2018Date of Patent: September 13, 2022Assignee: Intel CorporationInventors: Zhimin Wan, Chia-Pin Chiu, Chandra Mohan Jha, Weihua Tang, Shankar Devasenathipathy
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Patent number: 11398414Abstract: Heat dissipation techniques include using metal features having one or more slanted or otherwise laterally-extending aspects. The metal features include, for example, tilted metal pillars, or metal bodies or fillets having an angled or sloping sidewall, or other metal features that extend both vertically and laterally. Such metal features increase the effective heat transfer area significantly by spreading heat in the in-plane (lateral) direction, in addition to the vertical direction. In some embodiments, slanted trenches are formed in photoresist/mold material deposited over a lower die, using photolithography and a multi-angle lens, or by laser drilling mold material deposited over the lower die. The trenches are then filled with metal. In other embodiments, metal features are printed on the lower die, and then molding material is deposited over the printed features. In any such cases, heat is conducted from a lower die to an upper die and/or an integrated heat spreader.Type: GrantFiled: September 26, 2018Date of Patent: July 26, 2022Assignee: Intel CorporationInventors: Zhimin Wan, Chia-Pin Chiu, Pooya Tadayon, Joe F. Walczyk, Chandra Mohan Jha, Weihua Tang, Shrenik Kothari, Shankar Devasenathipathy
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Patent number: 11322456Abstract: A foundation layer having a stiffener and methods of forming a stiffener are described. One or more dies are formed over the foundation layer. Each die has a front side surface that is electrically coupled to the foundation layer and a back side surface that is opposite from the front side surface. A stiffening layer (or a stiffener) is formed on the back side surface of at least one of the dies. The stiffening layer may be directly coupled to the back side surface of the one or more dies without an adhesive layer. The stiffening layer may include one or more materials, including at least one of a metal, a metal alloy, and a ceramic. The stiffening layer may be formed to reduce warpage based on the foundation layer and the dies. The one or more materials of the stiffening layer can be formed using a cold spray.Type: GrantFiled: June 30, 2017Date of Patent: May 3, 2022Assignee: Intel CorporationInventors: Feras Eid, Venkata Suresh R. Guthikonda, Shankar Devasenathipathy, Chandra M. Jha, Je-Young Chang, Kyle Yazzie, Prasanna Raghavan, Pramod Malatkar
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Publication number: 20210375719Abstract: A semiconductor device that has a semiconductor die coupled to a substrate. A mold compound encapsulates the semiconductor die, and at least one thermal conductive material section extends from adjacent the semiconductor die through the mold compound. The at least one conductive material section thus conveys heat from the semiconductor die through the mold compound.Type: ApplicationFiled: August 11, 2021Publication date: December 2, 2021Inventors: Feras Eid, Shrenik Kothari, Chandra M. Jha, Johanna M. Swan, Michael J. Baker, Shawna M. Liff, Thomas L. Sounart, Betsegaw K. Gebrehiwot, Shankar Devasenathipathy, Taylor Gaines, Digvijay Ashokkumar Raorane
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Publication number: 20210257277Abstract: Embodiments of the present disclosure may generally relate to systems, apparatuses, techniques, and/or processes directed to packages that include stacked dies that use thermal conductivity features including thermally conductive through silicon vias (TSVs) filled with thermally conductive material located in passive areas of a first die to route heat from a first die away from a second die that is coupled with the first die. In embodiments, the first die may be referred to as a base die. Embodiments may include thermal blocks in the form of dummy dies that include TSVs at least partially filled with thermal energy conducting material such as copper, solder, or other alloy.Type: ApplicationFiled: February 19, 2020Publication date: August 19, 2021Inventors: Weston BERTRAND, Kyle ARRINGTON, Shankar DEVASENATHIPATHY, Aaron MCCANN, Nicholas NEAL, Zhimin WAN
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Publication number: 20210242105Abstract: Techniques and mechanisms for promoting heat conduction in a packaged device using a heat spreader that is fabricated by a build-up process. In an embodiment, 3D printing of a heat spreader successively deposit layers of a thermal conductor material, where said layers variously extend each over a respective one or more IC dies. The heat spreader forms a flat top side, wherein a bottom side of the heat spreader extends over, and conforms at least partially to, different respective heights of various IC dies. In another embodiment, fabrication of a portion of the heat spreader comprises printing pore structures that contribute to a relatively low thermal conductivity of said portion. An average orientation of the oblong pores contributes to different respective thermal conduction properties for various directions of heat flow.Type: ApplicationFiled: February 4, 2020Publication date: August 5, 2021Applicant: INTEL CORPORATIONInventors: Jesus Gerardo Reyes Schuldes, Shankar Devasenathipathy, Pramod Malatkar, Aravindha Antoniswamy, Kyle Arrington
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Publication number: 20210193548Abstract: Embodiments include semiconductor packages and a method to form such packages. A semiconductor package includes first and second bottom dies on a package substrate. The semiconductor package includes first top dies on the first bottom die, second top dies on the second bottom die, and a pedestal on the first and second bottom dies. The pedestal comprises a high thermal conductive material and is positioned on a region of top surfaces of the first and second bottom dies. The semiconductor package includes an encapsulation layer over the first and second bottom dies, and surrounds the first and second top dies and the pedestal. The semiconductor package includes a TIM over the first and second top dies, pedestal, and encapsulation layer, and an integrated heat spreader (IHS) over the TIM. The pedestal is on a periphery region of the top surfaces of the first and second bottom dies.Type: ApplicationFiled: December 19, 2019Publication date: June 24, 2021Inventors: Zhimin WAN, Chia-Pin CHIU, Peng LI, Shankar DEVASENATHIPATHY
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Publication number: 20210125896Abstract: A thermal interface material may be formed comprising a liquid metal and a corrosion resistant filler material. The thermal interface material may be used in an integrated circuit assembly between at least one integrated circuit device and a heat dissipation device, wherein the corrosion resistant filler material changes the physical properties of the thermal interface material, which may prevent failure modes from occurring during the operation of the integrated circuit assembly and may assist in maintaining a bond line thickness between the at least one integrated circuit device and the heat dissipation device.Type: ApplicationFiled: October 24, 2019Publication date: April 29, 2021Applicant: Intel CorporationInventors: Kyle J. Arrington, Aaron Mccann, Kelly Lofgreen, Aravindha R. Antoniswamy, Shankar Devasenathipathy
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Publication number: 20210101175Abstract: To address technical problems facing silicon transient thermal management, a thermal interface material (TIM) may be used to provide improved thermal conduction. The TIM may include a liquid metal (LM) TIM, which may provide a significant reduction in thermal resistance, such as a thermal resistance RTIM?0.01-0.025 ° C.-cm2/W. The LM TIM may be applied using a presoaked applicator, such as an open-cell polyurethane foam applicator that has been presoaked in a controlled amount of LM TIM. This LM presoaked applicator is then used to apply the LM TIM to one or more target thermal surfaces, thereby providing thermal and mechanical coupling between the LM TIM and the thermal surface. The resulting thermal surface and thermally conductive LM TIM may be used to improve thermal conduction for various silicon-based devices, including various high-power, high-performance system-on-chip (SoC) packages, such as may be used in portable consumer products.Type: ApplicationFiled: June 26, 2020Publication date: April 8, 2021Inventors: Kyle Jordan Arrington, Joseph Blaine Petrini, Aaron McCann, Shankar Devasenathipathy, James Christopher Matayabas, JR., Mostafa Aghazadeh, Jerrod Peterson