Patents by Inventor Shankar Rananavare

Shankar Rananavare has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Stabilized alkaline hydrogen peroxide formulations
    Patent number: 10508344
    Abstract: Formulations for stabilizing hydrogen peroxide, comprising water soluble Zn+2 ions at 0.7 to 100 parts per million of an alkaline hydrogen peroxide solution. In some examples, the alkaline hydrogen peroxide solution is a silicon wafer cleaning solution comprised of H2O2 and NH4OH—H2O and the water soluble Zn+2 ions are present at 3 to 100 parts per million of the silicon wafer cleaning solution. In some examples, the alkaline hydrogen peroxide solution is a wet etching formulation selective for TiN and the water soluble Zn+2 ions are present at 0.7 to 10 parts per million of the wet etching formulation. In some examples, the alkaline hydrogen peroxide solution is a wet etching formulation selective for Ti and Zn ions are present at 2 to 7 parts per million.
    Type: Grant
    Filed: May 10, 2019
    Date of Patent: December 17, 2019
    Inventor: Shankar Rananavare