Abstract: Systems, methods, and apparatuses are described for determining compliance with a plurality of restrictions associated with one or more devices in an organization. First text indicating restrictions may be received, and second text indicating a current configuration of one or more devices may be received. Both sets of text may be processed by, e.g., removing a portion of the text based on a predetermined list of terms and simplifying the text using a lemmatization algorithm. A first vector and second vector may be generated based on the processed sets of text, and each vector may be weighted based on an inverse frequency of words in their respective text. Each vector may be normalized based on semantic analysis. The two vectors may be compared. Based on the comparison, third text corresponding to a portion of the second vector may be generated and transmitted to a third computing device.

Abstract: A method for reducing a time-to-first-print in an imaging device that includes tracking a set of sleep times between print jobs in an imaging device and determining whether a predetermined number of sleep times in the set of sleep times is reached; and upon a positive determination, identifying a first and a second most recent sleep times stored among the set of sleep times tracked; determining whether each of the first sleep time and the second sleep time is less than a predetermined threshold; and upon a positive determination, determining a value based on an average of the first sleep time and the second sleep time. The value is used as a period of time that the imaging device is powered at a snooze mode prior to transitioning to a sleep mode, and when a print job is received in the imaging device while in the snooze mode, the time-to-first-print from the snooze mode is faster than the time-to-first print when the print job is received while in the sleep mode.

Abstract: A silicon-based showerhead electrode is provided that can include a backside, a frontside, and a plurality of showerhead passages extending from the backside of the silicon-based showerhead electrode to the frontside of the silicon-based showerhead electrode. The silicon-based showerhead electrode can comprise single crystal silicon. The silicon-based showerhead electrode may further include a plurality of partial recesses formed within the single crystal silicon along the backside of the silicon-based showerhead electrode. The plurality of partial recesses can leave a thickness of single crystal silicon between each of the partial recesses and the frontside of the silicon-based showerhead electrode.

Abstract: A silicon-based showerhead electrode is provided that can include a backside, a frontside, and a plurality of showerhead passages extending from the backside of the silicon-based showerhead electrode to the frontside of the silicon-based showerhead electrode. The silicon-based showerhead electrode can comprise single crystal silicon. The silicon-based showerhead electrode may further include a plurality of partial recesses formed within the single crystal silicon along the backside of the silicon-based showerhead electrode. The plurality of partial recesses can leave a thickness of single crystal silicon between each of the partial recesses and the frontside of the silicon-based showerhead electrode.

Abstract: The present invention relates generally to plasma processing and, more particularly, to plasma processing chambers and electrode assemblies used therein. According to one embodiment of the present invention, an electrode assembly is provided comprising a thermal control plate, a silicon-based showerhead electrode, and securing hardware, wherein the silicon-based showerhead electrode comprises a plurality of partial recesses formed in the backside of the silicon-based showerhead electrode and backside inserts positioned in the partial recesses. The thermal control plate comprises securing hardware passages configured to permit securing hardware to access the backside inserts.

Abstract: The present invention relates generally to plasma processing chambers and electrode assemblies used therein. According to one embodiment, an electrode assembly comprises a thermal control plate, a silicon-based showerhead electrode, and a probe assembly comprising an electrically conductive probe body and a silicon-based cap. The electrode assembly is configured such that the handedness of a threaded engagement of the silicon-based cap and a head section of the probe body and the handedness of the threaded engagement of the thermal control plate and a mid-section of the probe body have a common direction of rotation. Thereby, an application of torque to the silicon-based cap in a tightening direction of rotation tightens both threaded engagements. Further, the electrode assembly is configured such that the threaded engagement of the silicon-based cap and a head section of the probe body permits repetitive non-destructive engagement and disengagement of the silicon-based cap and the probe body.

Abstract: A method for associating a customer accessible supply item of a first type with an imaging apparatus includes communicating identification information between the customer accessible supply item of the first type and the imaging apparatus; and operationally locking the customer accessible supply item of the first type with only the imaging apparatus based on the identification information, to the exclusion of other imaging apparatuses and other customer accessible supply items of the first type.

Abstract: The present invention relates generally to plasma processing chambers and electrode assemblies used therein. According to one embodiment, an electrode assembly comprises a thermal control plate, a silicon-based showerhead electrode, and a probe assembly comprising an electrically conductive probe body and a silicon-based cap. The electrode assembly is configured such that the handedness of a threaded engagement of the silicon-based cap and a head section of the probe body and the handedness of the threaded engagement of the thermal control plate and a mid-section of the probe body have a common direction of rotation. Thereby, an application of torque to the silicon-based cap in a tightening direction of rotation tightens both threaded engagements. Further, the electrode assembly is configured such that the threaded engagement of the silicon-based cap and a head section of the probe body permits repetitive non-destructive engagement and disengagement of the silicon-based cap and the probe body.

Abstract: The present invention relates generally to plasma processing and, more particularly, to plasma processing chambers and electrode assemblies used therein. According to one embodiment of the present invention, an electrode assembly is provided comprising a thermal control plate, a silicon-based showerhead electrode, and securing hardware, wherein the silicon-based showerhead electrode comprises a plurality of partial recesses formed in the backside of the silicon-based showerhead electrode and backside inserts positioned in the partial recesses. The thermal control plate comprises securing hardware passages configured to permit securing hardware to access the backside inserts.

Abstract: A method for associating a customer accessible supply item of a first type with an imaging apparatus includes communicating identification information between the customer accessible supply item of the first type and the imaging apparatus; and operationally locking the customer accessible supply item of the first type with only the imaging apparatus based on the identification information, to the exclusion of other imaging apparatuses and other customer accessible supply items of the first type.

Abstract: A method is disclosed for manufacturing chamber parts for plasma etching chambers involving electronic discharge machining (EDM) methods that allows silicon and other ceramic materials to be formed and drilled. Key factors disclosed relate to the clamping of such materials for the EDM machining to avoid the electrical current inhibiting influence of oxide coatings that these materials can form.

Abstract: A method of storing usage information in an ink jet printer includes storing low priority usage information in a first memory field. First high priority usage information is stored in a second memory field. Second high priority usage information is stored in a third memory field. The second high priority usage information is substantially identical to the first high priority usage information.

Abstract: A method of storing usage information in an ink jet printer includes storing low priority usage information in a first memory field. First high priority usage information is stored in a second memory field. Second high priority usage information is stored in a third memory field. The second high priority usage information is substantially identical to the first high priority usage information.

Abstract: A method of controlling a temperature of a print chip of a printhead in an ink jet printer includes providing the printer with a memory device. The print chip is provided with and at least one ink-jetting resistor. The printhead is provided with at least one substrate heater and a heatsink attached to the print chip. Power is applied to the substrate heater and/or the ink-jetting resistor. Temperature data associated with the print chip is recorded during the applying step. A thermal resistance value of the print chip to the heatsink and/or a thermal capacitance value associated with the printhead is calculated dependent upon the recorded temperature data. The thermal resistance value of the print chip to the heatsink and/or the thermal capacitance value associated with the printhead are stored in the memory device.