Abstract: Some implementations described herein include operating components in a lithography system at variable speeds to reduce, minimize, and/or prevent particle generation due to rubbing of or collision between contact parts of the components. In some implementations, a component in a path of transfer of a semiconductor substrate in the lithography system is operated at a relatively high movement speed through a first portion of an actuation operation, and is operated at a reduced movement speed (e.g., a movement speed that is less than the high movement speed) through a second portion of the actuation operation in which contact parts of the component are to interact. The reduced movement speed reduces the likelihood of particle generation and/or release from the contact parts when the contact parts interact, while the high movement speed provides a high semiconductor substrate throughput in the lithography system.

Abstract: In a method of cleaning a lithography system, during idle mode, a stream of air is directed, through a first opening, into a chamber of a wafer table of an EUV lithography system. One or more particles is extracted by the directed stream of air from surfaces of one or more wafer chucks in the chamber of the wafer table. The stream of air and the extracted one or more particle are drawn, through a second opening, out of the chamber of the wafer table.

Abstract: A carrier (10) for carrying a roll of metal plate includes a frame (20), a support plate (40), a shield (60), and a flexible cushion (80). The frame includes a base (22) and a beam (24). The support plate is attached to the base and has an arcuate outer surface, for providing maximum contact area between the carrier and a center hole of the roll. The shield is attached to the beam, for preventing a side of the roll from being damaged by the beam. The cushion is attached to the support plate, for preventing surface damage to the roll. A plurality of ribs (44) is welded to the base, for reinforcing the support plate.

Abstract: A carrier (10) for carrying a roll of metal plate includes a frame (20), a support plate (40), a shield (60), and a flexible cushion (80). The frame includes a base (22) and a beam (24). The support plate is attached to the base and has an arcuate outer surface, for providing maximum contact area between the carrier and a center hole of the roll. The shield is attached to the beam, for preventing a side of the roll from being damaged by the beam. The cushion is attached to the support plate, for preventing surface damage to the roll. A plurality of ribs (44) is welded to the base, for reinforcing the support plate.

Abstract: An insect repellent composition containing, as an active ingredient, 1-dodecene is described. When applied to an insect or a habitat thereof, the composition is effective in deterring insects.