Patents by Inventor Shao-Min Hung

Shao-Min Hung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9075195
    Abstract: A color filter including a substrate, a plurality of single film filter units and a plurality of multi-film filter units is provided. The substrate has a first region and a second region. The single-film filter units are respectively disposed on the substrate and within the first region. The multi-film filter units are respectively disposed on the substrate and within the second region. When a white beam is projected on the color filter, the single-film filter units and the multi-film filter units reflect a plurality of color beams. The multi-film filter units include a plurality of first multi-film filter units. When the white beam is projected on the first multi-film filter units, the first multi-film filter units reflect a first color beam.
    Type: Grant
    Filed: August 12, 2014
    Date of Patent: July 7, 2015
    Assignee: HIMAX SEMICONDUCTOR, INC.
    Inventors: Shao-Min Hung, Han-Kang Liu, Bo-Nan Chen
  • Publication number: 20140347759
    Abstract: A color filter including a substrate, a plurality of single film filter units and a plurality of multi-film filter units is provided. The substrate has a first region and a second region. The single-film filter units are respectively disposed on the substrate and within the first region. The multi-film filter units are respectively disposed on the substrate and within the second region. When a white beam is projected on the color filter, the single-film filter units and the multi-film filter units reflect a plurality of color beams. The multi-film filter units include a plurality of first multi-film filter units. When the white beam is projected on the first multi-film filter units, the first multi-film filter units reflect a first color beam.
    Type: Application
    Filed: August 12, 2014
    Publication date: November 27, 2014
    Inventors: Shao-Min Hung, Han-Kang Liu, Bo-Nan Chen
  • Patent number: 8837063
    Abstract: A method for manufacturing a color filter is provided. The method includes following steps. A substrate is provided. A first filter layer is formed on a first part of a first region and a first part of a second region of the substrate. A second filter layer is formed on a second part of the second region. A third filter layer is formed on a second part of the first region and a third part of the second region. When a white beam is projected on the color filter, the first region and the second region reflect a plurality of color beams. A color filter manufactured through the method is also provided.
    Type: Grant
    Filed: September 28, 2010
    Date of Patent: September 16, 2014
    Assignee: Himax Semiconductor, Inc.
    Inventors: Shao-Min Hung, Han-Kang Liu, Bo-Nan Chen
  • Patent number: 8319306
    Abstract: A method of fabricating an image sensor and an image sensor thereof are provided. The method comprises: providing a mask; utilizing the mask at a first position to form a first group of micro-lenses having a first height on a first group of color filters of a color filter array on a pixel array; shifting the mask from the first position to a second position, wherein a distance between the first position and the second position is substantially equal to a width of a pixel of the pixel array; and utilizing the mask at the second position to form a second group of micro-lenses having a second height, different from the first height, on a second group of color filters of the color filter array.
    Type: Grant
    Filed: February 1, 2010
    Date of Patent: November 27, 2012
    Assignees: Himax Technologies Limited, Himax Imaging, Inc.
    Inventors: Han-Kang Liu, Fang-Ming Huang, Shao-Min Hung, Bo-Nan Chen
  • Publication number: 20120075736
    Abstract: A method for manufacturing a color filter is provided. The method includes following steps. A substrate is provided. A first filter layer is formed on a first part of a first region and a first part of a second region of the substrate. A second filter layer is formed on a second part of the second region. A third filter layer is formed on a second part of the first region and a third part of the second region. When a white beam is projected on the color filter, the first region and the second region reflect a plurality of color beams. A color filter manufactured through the method is also provided.
    Type: Application
    Filed: September 28, 2010
    Publication date: March 29, 2012
    Applicant: HIMAX SEMICONDUCTOR, INC.
    Inventors: Shao-Min Hung, Han-Kang Liu, Bo-Nan Chen
  • Publication number: 20110186950
    Abstract: A method of fabricating an image sensor and an image sensor thereof are provided. The method comprises: providing a mask; utilizing the mask at a first position to form a first group of micro-lenses having a first height on a first group of color filters of a color filter array on a pixel array; shifting the mask from the first position to a second position, wherein a distance between the first position and the second position is substantially equal to a width of a pixel of the pixel array; and utilizing the mask at the second position to form a second group of micro-lenses having a second height, different from the first height, on a second group of color filters of the color filter array.
    Type: Application
    Filed: February 1, 2010
    Publication date: August 4, 2011
    Inventors: Han-Kang Liu, Fang-Ming Huang, Shao-Min Hung, Bo-Nan Chen