Patents by Inventor Shao-Yun Liu

Shao-Yun Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Wafer Map Recognition Method Using Artificial Intelligence AND Computer Device
    Publication number: 20250054130
    Abstract: A wafer map recognition method using artificial intelligence includes obtaining wafer maps of a plurality of wafers; performing an unsupervised algorithm on the wafer map of each wafer in the plurality of wafers to generate a feature data set for the corresponding wafer map; and performing a clustering algorithm according to a plurality of feature data sets for the plurality of wafer maps to find a wafer map with a potential defect.
    Type: Application
    Filed: August 9, 2024
    Publication date: February 13, 2025
    Applicant: MEDIATEK INC.
    Inventors: En Jen, Shao-Yun Liu, Yi-Ju Ting, Chin-Tang Lai, Chia-Shun Yeh, Ching-Yu Lin, Ching-Han Jan, Po-Hsuan Huang
  • Photoresist composition for LCD light diffuse reflecting film
    Patent number: 7270939
    Abstract: A photoresist composition for LCD light diffuse reflecting film is disclosed, which comprises (a) 8 to 90% by weight of base-soluble resin; (b) 1 to 30% by weight of polyfunctional unit; (c) 0.1 to 20% by weight of photopolymerization initiator; (d) 0.1 to 20% by weight of thermosetting cross-linking reagent; (e) 0.01 to 10% by weight of ultraviolet absorber; and (f) 8 to 90% by weight of solvent.
    Type: Grant
    Filed: March 29, 2005
    Date of Patent: September 18, 2007
    Assignee: Everlight USA, Inc.
    Inventors: Chun-Wei Juan, Shao-Yun Liu
  • Photoresist composition for LCD light diffuse reflecting film
    Publication number: 20050260523
    Abstract: A photoresist composition for LCD light diffuse reflecting film is disclosed, which comprises (a) 8 to 90% by weight of base-soluble resin; (b) 1 to 30% by weight of polyfunctional unit; (c) 0.1 to 20% by weight of photopolymerization initiator; (d) 0.1 to 20% by weight of thermosetting cross-linking reagent; (e) 0.01 to 10% by weight of ultraviolet absorber; and (f) 8 to 90% by weight of solvent.
    Type: Application
    Filed: March 29, 2005
    Publication date: November 24, 2005
    Applicant: Everlight USA, Inc.
    Inventors: Chun-Wei Juan, Shao-Yun Liu