Patents by Inventor Shaobo Deng
Shaobo Deng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230271156Abstract: A process comprises feeding a stream of reactant compounds to a reactor and discharging a liquid plasma into the reactant stream in the reactor, wherein the plasma initiates or accelerates a reaction of the reactant compounds to form a product composition. The reactor can comprise one or more chambers, a high-voltage electrode positioned at a first portion of the one or more chambers, a ground electrode positioned at a second portion of the one or more chambers, and a dielectric plate between the ground electrode and the high-voltage electrode that comprises openings through which the reactant stream can pass from the first portion to the second portion or from the second portion to the first portion. Discharging the plasma can include supplying electrical power to the high-voltage electrode such that plasma is discharged where the reactant stream flows through the openings.Type: ApplicationFiled: May 9, 2023Publication date: August 31, 2023Applicant: REGENTS OF THE UNIVERSITY OF MINNESOTAInventors: Xiao WU, Shaobo DENG, Jun ZHU
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Patent number: 11679369Abstract: A process comprises feeding a stream of reactant compounds to a reactor and discharging a liquid plasma into the reactant stream in the reactor, wherein the plasma initiates or accelerates a reaction of the reactant compounds to form a product composition. The reactor can comprise one or more chambers, a high-voltage electrode positioned at a first portion of the one or more chambers, a ground electrode positioned at a second portion of the one or more chambers, and a dielectric plate between the ground electrode and the high-voltage electrode that comprises openings through which the reactant stream can pass from the first portion to the second portion or from the second portion to the first portion. Discharging the plasma can include supplying electrical power to the high-voltage electrode such that plasma is discharged where the reactant stream flows through the openings.Type: GrantFiled: January 25, 2017Date of Patent: June 20, 2023Assignee: REGENTS OF THE UNIVERSITY OF MINNESOTAInventors: Xiao Wu, Shaobo Deng, Jun Zhu
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Publication number: 20190030509Abstract: A process comprises feeding a stream of reactant compounds to a reactor and discharging a liquid plasma into the reactant stream in the reactor, wherein the plasma initiates or accelerates a reaction of the reactant compounds to form a product composition. The reactor can comprise one or more chambers, a high-voltage electrode positioned at a first portion of the one or more chambers, a ground electrode positioned at a second portion of the one or more chambers, and a dielectric plate between the ground electrode and the high-voltage electrode that comprises openings through which the reactant stream can pass from the first portion to the second portion or from the second portion to the first portion. Discharging the plasma can include supplying electrical power to the high-voltage electrode such that plasma is discharged where the reactant stream flows through the openings.Type: ApplicationFiled: January 25, 2017Publication date: January 31, 2019Inventors: Xiao Wu, Shaobo Deng, Jun Zhu
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Publication number: 20140105807Abstract: The disclosure herein describes a method for producing ammonia by introducing N2, CO and water into a non-thermal plasma in the presence of a catalyst, the catalyst being effective to promote the disassociation of N2, CO and water to form reactants that in turn react to produce NH3 and CH4. This disclosure also describes producing a reactive hydrogen ion or free radical by the method comprising passing water through a non-thermal plasma in the presence of a catalyst, the catalyst being effective to promote the dissociation of water.Type: ApplicationFiled: December 26, 2013Publication date: April 17, 2014Inventors: Rongsheng Ruan, Shaobo Deng, Zhiping Le, Yanling Cheng, Xiangyang Lin, Ling Chen
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Patent number: 8641872Abstract: The disclosure herein describes a method for producing ammonia by introducing N2, CO and water into a non-thermal plasma in the presence of a catalyst, the catalyst being effective to promote the disassociation of N2, CO and water to form reactants that in turn react to produce NH3 and CH4. This disclosure also describes producing a reactive hydrogen ion or free radical by the method comprising passing water through a non-thermal plasma in the presence of a catalyst, the catalyst being effective to promote the dissociation of water.Type: GrantFiled: September 16, 2009Date of Patent: February 4, 2014Assignee: Regents of the University of MinnesotaInventors: Rongsheng Ruan, Shaobo Deng, Zhiping Le, Yanling Cheng, Xiangyang Lin, Ling Chen
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Patent number: 7931811Abstract: A fluid treatment device and method are provided for generating an electric field across a gap between first and second electrode and for concentrating the electric field within a fluid treatment chamber located in the gap.Type: GrantFiled: October 27, 2006Date of Patent: April 26, 2011Assignee: Regents of The University of MinnesotaInventors: Rongsheng Ruan, Shaobo Deng, Ling Chen, Xingyang Lin, Lloyd Metzger
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Publication number: 20080099406Abstract: A fluid treatment device and method are provided for generating an electric field across a gap between first and second electrode and for concentrating the electric field within a fluid treatment chamber located in the gap.Type: ApplicationFiled: October 27, 2006Publication date: May 1, 2008Applicant: Regents of The University of MinnesotaInventors: Rongsheng Ruan, Shaobo Deng, Ling Chen, Xiangyang Lin, Lloyd Metzger
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Publication number: 20060127271Abstract: A method and apparatus are provided for at least partially disinfecting biological fluid of a mammal, which comprises pathogens. The method includes contacting a non-thermal plasma with the biological fluid to kill at least a portion of the pathogens within the biological fluid, and filtering toxins from at least some components of the biological fluid.Type: ApplicationFiled: February 1, 2006Publication date: June 15, 2006Applicant: Regents of The University of MinnesotaInventors: R. Ruan, Hongbin Ma, Paul Chen, Shaobo Deng, Xiangyang Lin, Duane Oyen, Robert Bowman
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Patent number: 7011790Abstract: A method and apparatus are provided for at least partially disinfecting biological fluid of a mammal, which comprises pathogens in addition to normal cellular fractions. The method includes placing the biological fluid in a reaction volume and contacting a non-thermal plasma with the biological fluid to thereby kill at least a portion of the pathogens within the biological fluid.Type: GrantFiled: April 30, 2003Date of Patent: March 14, 2006Assignee: Regents of The University of MinnesotaInventors: R. Roger Ruan, Hongbin Ma, Paul L. Chen, Shaobo Deng, Xiangyang Lin, Duane P.M. Oyen, Robert J. Bowman
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Patent number: 6911225Abstract: A non-thermal plasma reactor is provided for treating a liquid with non-thermal plasma species. The reactor includes a liquid inlet, a liquid outlet, a reaction volume between the liquid inlet and the liquid outlet and at least one non-thermal plasma electrode adjacent to the reaction volume. The non-thermal plasma electrode is isolated physically and electrically from the flow path by a dielectric barrier.Type: GrantFiled: February 11, 2003Date of Patent: June 28, 2005Assignee: Regents of the University of MinnesotaInventors: R. Roger Ruan, Hongbin Ma, Paul L. Chen, Shaobo Deng, Xiangyang Lin
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Publication number: 20040022669Abstract: A method and apparatus are provided for at least partially disinfecting biological fluid of a mammal, which comprises pathogens in addition to normal cellular fractions. The method includes placing the biological fluid in a reaction volume and contacting a non-thermal plasma with the biological fluid to thereby kill at least a portion of the pathogens within the biological fluid.Type: ApplicationFiled: April 30, 2003Publication date: February 5, 2004Applicant: Regents of The University of MinnesotaInventors: R. Roger Ruan, Hongbin Ma, Paul L. Chen, Shaobo Deng, Xiangyang Lin, Duane P.M. Oyen, Robert J. Bowman
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Publication number: 20030180421Abstract: A non-thermal plasma reactor is provided for treating a liquid with non-thermal plasma species. The reactor includes a liquid inlet, a liquid outlet, a reaction volume between the liquid inlet and the liquid outlet and at least one non-thermal plasma electrode adjacent to the reaction volume. The non-thermal plasma electrode is isolated physically and electrically from the flow path by a dielectric barrier.Type: ApplicationFiled: February 11, 2003Publication date: September 25, 2003Inventors: R. Roger Ruan, Hongbin Ma, Paul L. Chen, Shaobo Deng, Xiangyang Lin
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Patent number: 6565716Abstract: A dielectric barrier discharge system includes first and second non-thermal plasma reactors which are coupled together in series. The first reactor includes a first surface discharge electrode which defines a first discharge path along the first surface discharge electrode. The second reactor includes second and third electrodes which are separated by a gap and define a second discharge path which extends across the gap. The system can be used to decompose hazardous compounds in a liquid or a gas, such as in power plant flue gases.Type: GrantFiled: October 17, 2000Date of Patent: May 20, 2003Assignees: Regents of The University of Minnesota, R.D. Offutt CompanyInventors: R. Roger Ruan, Paul L. Chen, Anrong Ning, Richard L. Bogaard, Donald G. Robinson, Shaobo Deng, Hongbin Ma, Chuanshuang Bie
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Patent number: 6451252Abstract: An odor removal system includes an odorous gas inlet, a treated gas outlet and a gas treatment flow path from the odorous gas inlet to the treated gas outlet. A mixer is coupled in series with the gas treatment flow path and has an ozone inlet coupled to an ozone outlet of an ozone generator. A non-thermal plasma reactor is also coupled in series with the gas treatment flow path.Type: GrantFiled: January 20, 2000Date of Patent: September 17, 2002Assignee: Regents of the University of MinnesotaInventors: R. Roger Ruan, Hongbin Ma, Ling Chen, Philip R. Goodrich, Shaobo Deng, Ye Wang
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Patent number: 6146599Abstract: A dielectric barrier discharge system includes first and second non-thermal plasma reactors which are coupled together in series. The first reactor includes a first surface discharge electrode which defines a first discharge path along the first surface discharge electrode. The second reactor includes second and third electrodes which are separated by a gap and define a second discharge path which extends across the gap. The system can be used to decompose hazardous compounds in a liquid or a gas, such as in power plant flue gases.Type: GrantFiled: February 24, 1999Date of Patent: November 14, 2000Assignee: Seagate Technology LLCInventors: R. Roger Ruan, Paul L. Chen, Anrong Ning, Richard L. Bogaard, Donald G. Robinson, Shaobo Deng, Hongbin Ma, Chuanshuang Bie
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Patent number: D877366Type: GrantFiled: January 30, 2019Date of Patent: March 3, 2020Assignee: Shenzhen Guandexin Technology Co., Ltd.Inventor: Shaobo Deng
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Patent number: D885335Type: GrantFiled: January 30, 2019Date of Patent: May 26, 2020Assignee: Shenzhen Guandexin Technology CO., LTD.Inventor: Shaobo Deng
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Patent number: D885336Type: GrantFiled: January 30, 2019Date of Patent: May 26, 2020Assignee: Shenzhen Guandexin Technology CO., LTDInventor: Shaobo Deng