Abstract: A method of generating a routing result to manufacture an integrated circuit using self-aligned double patterning includes generating an initial routing result that indicates a location and length of connections between components, and generating an initial constraint graph with trim shapes indicating gaps in the connections being represented as nodes and with arcs indicating relative position constraints between a pair of the nodes. The method also includes subdividing the initial constraint graph into two or more subgraphs, determining a final position of each of the nodes in the two or more subgraphs, and generating a routed design with the trim shapes having the final position of corresponding ones of the nodes relative to the connections and with extents filling in spaces between one or more of the trim shapes and associated connections. The routed design is provided for manufacture of the integrated circuit.

Abstract: A method of generating a routing result to manufacture an integrated circuit using self-aligned double patterning includes generating an initial routing result that indicates a location and length of connections between components, and generating an initial constraint graph with trim shapes indicating gaps in the connections being represented as nodes and with arcs indicating relative position constraints between a pair of the nodes. The method also includes subdividing the initial constraint graph into two or more subgraphs, determining a final position of each of the nodes in the two or more subgraphs, and generating a routed design with the trim shapes having the final position of corresponding ones of the nodes relative to the connections and with extents filling in spaces between one or more of the trim shapes and associated connections. The routed design is provided for manufacture of the integrated circuit.