Patents by Inventor Shaoxin Lu

Shaoxin Lu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10937869
    Abstract: The subject matter disclosed herein relates to wide band gap semiconductor power devices and, more specifically, to high-energy implantation masks used in forming silicon carbide (SiC) power devices, such as charge balanced (CB) SiC power devices. An intermediate semiconductor device structure includes a SiC substrate layer having a first conductivity type and silicon carbide (SiC) epitaxial (epi) layer having the first conductivity type disposed on the SiC substrate layer. The intermediate device structure also includes a silicon high-energy implantation mask (SiHEIM) disposed directly on a first portion of the SiC epi layer and having a thickness between 5 micrometers (?m) and 20 ?m. The SiHEIM is configured to block implantation of the first portion of the SiC epi layer during a high-energy implantation process having an implantation energy greater than 500 kiloelectron volts (keV).
    Type: Grant
    Filed: September 28, 2018
    Date of Patent: March 2, 2021
    Assignee: GENERAL ELECTRIC COMPANY
    Inventors: William Gregg Hawkins, Reza Ghandi, Christopher Bauer, Shaoxin Lu
  • Publication number: 20200105879
    Abstract: The subject matter disclosed herein relates to wide band gap semiconductor power devices and, more specifically, to high-energy implantation masks used in forming silicon carbide (SiC) power devices, such as charge balanced (CB) SiC power devices. An intermediate semiconductor device structure includes a SiC substrate layer having a first conductivity type and silicon carbide (SiC) epitaxial (epi) layer having the first conductivity type disposed on the SiC substrate layer. The intermediate device structure also includes a silicon high-energy implantation mask (SiHEIM) disposed directly on a first portion of the SiC epi layer and having a thickness between 5 micrometers (?m) and 20 ?m. The SiHEIM is configured to block implantation of the first portion of the SiC epi layer during a high-energy implantation process having an implantation energy greater than 500 kiloelectron volts (keV).
    Type: Application
    Filed: September 28, 2018
    Publication date: April 2, 2020
    Inventors: William Gregg Hawkins, Reza Ghandi, Christopher Bauer, Shaoxin Lu
  • Publication number: 20080185936
    Abstract: Methods for actuating, actuator devices and methods for preparing an actuator device capable of converting optical energy into mechanical energy are provided. An actuator includes a carbon nanotube film having a first optical absorption coefficient and an actuation material having a second optical absorption coefficient different from the first optical absorption coefficient. The actuator expands due to actuation by light. A carbon nanotube film is prepared by forming a carbon nanotube film on a substrate and forming a photoresist layer that exposes portions of the carbon nanotube film. The exposed portions are then etched to form an actuator device from the remaining carbon nanotube film.
    Type: Application
    Filed: September 10, 2007
    Publication date: August 7, 2008
    Inventors: Balaji Panchapakesan, Shaoxin Lu