Patents by Inventor Shaoyang ZHANG

Shaoyang ZHANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Machine vision-based automatic identification and rating method and system for low-magnification acid etching defect
    Patent number: 12260547
    Abstract: A machine vision-based automatic identification and rating method and system for a low-magnification acid etching defect.
    Type: Grant
    Filed: December 29, 2021
    Date of Patent: March 25, 2025
    Assignee: DAYE SPECIAL STEEL CO. , LTD.
    Inventors: Zhicheng Zhang, Jin Ke, Wei Fang, Shaoyang Zhang, Changyuan Zhang
  • METHODS FOR PREPARING (2S,3R)-P-METHYLSULFONYLPHENYLSERINE
    Publication number: 20250059574
    Abstract: A method for preparing (2S,3R)-p-methylsulfonylphenylserine is provided. In order to solve the existing problem of low conversion rate, provided is a method for preparing (2S,3R)-p-methylsulfonylphenylserine, including carrying out a reaction between p-methylsulfonylbenzaldehyde, L-threonine and pyridoxal phosphate in an oxygen-containing environment under the combined action of transaldolase and acetaldehyde oxidase to obtain a product (2S,3R)-p-methylsulfonylphenylserine. The method can effectively achieve the effect of improving the conversion rate of the reaction and has the advantage of high product yield.
    Type: Application
    Filed: August 5, 2024
    Publication date: February 20, 2025
    Applicants: TAIZHOU UNIVERSITY, Taizhou Lingfeng Biotechnology Co., Ltd.
    Inventors: Zhongyi YANG, Shaoyang ZHANG, Yi WEI, Kun CHENG, Jieyang LU, Ting YANG, Weijin HUANG, Qingfeng CAI
  • MACHINE VISION-BASED AUTOMATIC IDENTIFICATION AND RATING METHOD AND SYSTEM FOR LOW-MAGNIFICATION ACID ETCHING DEFECT
    Publication number: 20240233112
    Abstract: A machine vision-based automatic identification and rating method and system for a low-magnification acid etching defect.
    Type: Application
    Filed: December 29, 2021
    Publication date: July 11, 2024
    Inventors: Zhicheng ZHANG, Jin KE, Wei FANG, Shaoyang ZHANG, Changyuan ZHANG