Patents by Inventor Sharon Brumer

Sharon Brumer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polishing process for manufacturing dopant-striation-free polished silicon wafers
    Patent number: 6189546
    Abstract: A multi-step polishing process for producing dopant-striation-free semiconductor wafers. The process includes polishing a surface of the wafer using a sodium stabilized colloidal silica slurry, an amine accelerant, and an alkaline etchant, polishing the surface of the wafer using a sodium stabilized colloidal silica slurry and an alkaline etchant which is substantially free of amine accelerants, and polishing the surface of the wafer using an ammonia stabilized colloidal silica slurry and an alkaline etchant which is substantially free of amine accelerants.
    Type: Grant
    Filed: December 29, 1999
    Date of Patent: February 20, 2001
    Assignee: MEMC Electronic Materials, Inc.
    Inventors: David Zhang, Sharon Brumer, Henry F. Erk