Patents by Inventor Sharon L. Nunes

Sharon L. Nunes has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090177505
    Abstract: The carbon footprint of a supply and distribution chain is modeled as a carbon dioxide (CO2) cost that can be considered alongside monetary or dollar ($) costs in supply, manufacturing, and distribution operations. Databases on products and services, supply chain policies, and targets, costs, and/or greenhouse gas (GHG) emissions are used by a GHG calculator to output carbon footprint data and/or by a supply chain optimizer to output supply chain planning and policy data. Client computers obtain carbon footprint and/or supply chain planning and policy data by querying a server with access to a database storing calculated carbon footprint data. Input data to the GHG calculator is updated based on choices made by users of the system.
    Type: Application
    Filed: January 4, 2008
    Publication date: July 9, 2009
    Inventors: Brenda L. Dietrich, Thomas Robert Ervolina, Kaan K. Katircioglu, Sharon L. Nunes, Peter R. Williams
  • Patent number: 5565529
    Abstract: Structures containing a dielectric material having a polymeric reactive ion etch barrier embedded therein. The preferred dielectric materials are polymers, preferably polyimide materials. The RIE etch barrier is a copolymer having an aromatic component having high thermal stability and having a cross-linking component selected from metallacyclobutane, metallabutene and vinyl groups. The etch barrier is deposited as a solvent free liquid which can fill gaps between the dielectric material and electrical conductors embedded therein. The liquid polymer is cured to a solid insoluble state. The structures with electrical conductors embedded therein are useful for electronic applications.
    Type: Grant
    Filed: June 30, 1993
    Date of Patent: October 15, 1996
    Assignee: International Business Machines Corporation
    Inventors: Edward D. Babich, Michael Hatzakis, Richard P. McGouey, Sharon L. Nunes, Jurij R. Paraszczak, Jane M. Shaw
  • Patent number: 5457005
    Abstract: A dry developable photoresist composition that contains in admixture a polymeric epoxide; a di- or polyfunctional organosilicon material; and an onium salt; and use thereof to produce an image.
    Type: Grant
    Filed: July 2, 1993
    Date of Patent: October 10, 1995
    Assignee: International Business Machines Corporation
    Inventors: Edward D. Babich, Jeffrey D. Gelorme, Ronald W. Nunes, Sharon L. Nunes, Jurij R. Paraszczak, Russell J. Serino
  • Patent number: 5340451
    Abstract: A process is disclosed for producing a metal-organic polymer combination by contacting the polymer with a plasma followed by an aqueous solution of a metal salt. In one embodiment a water or nitrous oxide plasma is used to treat a polyimide or a fluorinated polymer. The polymer is combined with a metal cation, the metal being a catalyst for a conventional electroless coating after which it is contacted with an electroless metal plating bath for the formation of electrical circuits and especially for plating high aspect ratio vias in microcircuits. Unlike the conventional electroless process, the cationic catalytic metal is not reduced to a zero valent metal catalyst prior to the application of the electroless metal coating solution.The process also improves the wettability of the polymer, especially the fluorinated polymer and is especially useful in improving the wettability of high aspect ratio vias.
    Type: Grant
    Filed: May 13, 1993
    Date of Patent: August 23, 1994
    Assignee: International Business Machines Corporation
    Inventors: Leena P. Buchwalter, Stephen L. Buchwalter, Charles R. Davis, Ronald D. Goldblatt, John E. Heidenreich, III, Sharon L. Nunes, Jae M. Park, Richard R. Thomas, Domenico Tortorella, Luis M. Ferreiro, deceased
  • Patent number: 5286599
    Abstract: A composition containing novolak polymer, and/or poly(p-vinylphenol), an organometallic material, an amino polymer a cationic photocatalyst. The composition can also include a cosensitizer material which makes a composition sensitive to near U.V. radiation.
    Type: Grant
    Filed: September 26, 1991
    Date of Patent: February 15, 1994
    Assignee: International Business Machines Corporation
    Inventors: Edward D. Babich, Eileen A. Galligan, Jeffrey D. Gelorme, Richard P. McGouey, Sharon L. Nunes, Jurij R. Paraszczak, Russell J. Serino, David F. Witman
  • Patent number: 5229251
    Abstract: A dry developable photoresist composition that contains in admixture a polymeric epoxide; a di- or polyfunctional organosilicon material; and an onium salt; and use thereof to produce an image.
    Type: Grant
    Filed: April 29, 1991
    Date of Patent: July 20, 1993
    Assignee: International Business Machines Corp.
    Inventors: Edward D. Babich, Jeffrey D. Gelorme, Ronald W. Nunes, Sharon L. Nunes, Jurij R. Paraszczak, Russell J. Serino
  • Patent number: 5141817
    Abstract: Structures containing a dielectric material having a polymeric reactive ion etch barrier embedded therein. The preferred dielectric materials are polymers, preferably polyimide materials. The RIE etch barrier is a copolymer having an aromatic component having high thermal stability and having a cross-linking component selected from metallacyclobutane, metallabutene and vinyl groups. The etch barrier is deposited as a solvent free liquid which can fill gaps between the dielectric material and electrical conductors embedded therein. The liquid polymer is cured to a solid insoluble state. The structures with electrical conductors embedded therein are useful for electronic applications.
    Type: Grant
    Filed: June 13, 1989
    Date of Patent: August 25, 1992
    Assignee: International Business Machines Corporation
    Inventors: Edward D. Babich, Michael Hatzakis, Richard P. McGouey, Sharon L. Nunes, Jurij R. Paraszczak, Jane M. Shaw