Patents by Inventor Shau-Lin Frank Chen

Shau-Lin Frank Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11219859
    Abstract: The present disclosure relates to a catalyst for NOx removal. In some embodiments, the catalyst comprises a support comprising at least one selected from the group consisting of TiO2, Al2O3, SiO2, ZrO2, CeO2, zeolite, TiO2 and WO3, and combinations thereof, and catalytically active components supported on the support. The catalytically active components comprise vanadium, antimony and at least one further component selected from the group consisting of silicon, aluminum and zirconium.
    Type: Grant
    Filed: July 26, 2016
    Date of Patent: January 11, 2022
    Assignee: BASF Corporation
    Inventors: Liang Chen, Feng Zhao, Jia Di Zhang, An Ju Shi, Shau-Lin Frank Chen, Miao Mark Chen
  • Publication number: 20190160428
    Abstract: The present invention relates to a catalyst for NOx removal. More specifically, the present invention relates to a supported catalyst, a monolithic selective catalytic reduction (SCR) catalyst, preparation method therefor, and method for NOx removal.
    Type: Application
    Filed: July 26, 2016
    Publication date: May 30, 2019
    Inventors: Liang CHEN, Feng ZHAO, Jia Di ZHANG, An Ju SHI, Shau-Lin Frank CHEN, Miao Mark CHEN
  • Patent number: 5895636
    Abstract: Methods and chemical compositions for treating a gas stream comprising non-halogenated and halogenated organic compounds while suppressing halogenation of the non-halogenated organic compounds with the oxidation products of the halogenated organic compounds in the gas stream are disclosed. The gas stream in the presence of oxygen is contacted with the catalyst compositions of the invention to oxidize the non-halogenated and the halogenated compounds to form water, carbon dioxide, and halogen molecules (Cl.sub.2, Br.sub.2, etc.) and/or halogen acids such as HCl, HBr, etc. An advantage of the present compositions and methods is that halogenation or of the treated emissions is suppressed over a process operating temperature range 400 to 550.degree. C.
    Type: Grant
    Filed: December 2, 1997
    Date of Patent: April 20, 1999
    Assignee: Engelhard Corporation
    Inventors: Pascaline H. Nguyen, James M. Chen, Chung-Zong Wan, Shau-Lin Frank Chen, Zhicheng Hu