Patents by Inventor Shaun C. Bosar

Shaun C. Bosar has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Accurately monitored CMP recycling
    Patent number: 9050851
    Abstract: A method is provided for reformulating a chemical mechanical planarization (CMP) slurry for use in conjunction with a CMP tool having an active cycle during which the tool is being used to planarize a substrate, and a rinse cycle during which the tool is being rinsed. The method comprises (a) receiving a feed stream from the CMP tool, at least a portion of the feed stream comprising abrasive particles disposed in a liquid medium; (b) during at least a portion of the rinse cycle, sending the feedstream received from the CMP tool to a first location; and (c) during at least a portion of the active cycle, sending the feedstream received from the CMP tool to a second location where the feedstream undergoes processing to reformulate the slurry.
    Type: Grant
    Filed: July 29, 2013
    Date of Patent: June 9, 2015
    Assignee: Environmental Process Solutions, Inc.
    Inventors: Martin Boehm, Shaun C. Bosar, Robert Edward Johnston
  • Accurately Monitored CMP Recycling
    Publication number: 20130306600
    Abstract: A method is provided for reformulating a chemical mechanical planarization (CMP) slurry for use in conjunction with a CMP tool having an active cycle during which the tool is being used to planarize a substrate, and a rinse cycle during which the tool is being rinsed. The method comprises (a) receiving a feed stream from the CMP tool, at least a portion of the feed stream comprising abrasive particles disposed in a liquid medium; (b) during at least a portion of the rinse cycle, sending the feedstream received from the CMP tool to a first location; and (c) during at least a portion of the active cycle, sending the feedstream received from the CMP tool to a second location where the feedstream undergoes processing to reformulate the slurry.
    Type: Application
    Filed: July 29, 2013
    Publication date: November 21, 2013
    Applicant: Environmental Process Solutions, Inc.
    Inventors: Martin Boehm, Shaun C. Bosar, Robert Edward Johnston
  • Accurately monitored CMP recycling
    Patent number: 8557134
    Abstract: A method is provided for reformulating a chemical mechanical planarization (CMP) slurry for use in conjunction with a CMP tool having an active cycle during which the tool is being used to planarize a substrate, and a rinse cycle during which the tool is being rinsed. The method comprises (a) receiving a feed stream from the CMP tool, at least a portion of the feed stream comprising abrasive particles disposed in a liquid medium; (b) during at least a portion of the rinse cycle, sending the feedstream received from the CMP tool to a first location; and (c) during at least a portion of the active cycle, sending the feedstream received from the CMP tool to a second location where the feedstream undergoes processing to reformulate the slurry.
    Type: Grant
    Filed: January 20, 2011
    Date of Patent: October 15, 2013
    Assignee: Environmental Process Solutions, Inc.
    Inventors: Shaun C. Bosar, Martin Boehm, Robert Edward Johnston
  • Accurately Monitored CMP Recycling
    Publication number: 20110180512
    Abstract: A method is provided for reformulating a chemical mechanical planarization (CMP) slurry for use in conjunction with a CMP tool having an active cycle during which the tool is being used to planarize a substrate, and a rinse cycle during which the tool is being rinsed. The method comprises (a) receiving a feed stream from the CMP tool, at least a portion of the feed stream comprising abrasive particles disposed in a liquid medium; (b) during at least a portion of the rinse cycle, sending the feedstream received from the CMP tool to a first location; and (c) during at least a portion of the active cycle, sending the feedstream received from the CMP tool to a second location where the feedstream undergoes processing to reformulate the slurry.
    Type: Application
    Filed: January 20, 2011
    Publication date: July 28, 2011
    Inventors: Shaun C. Bosar, Martin Boehm, Robert Edward Johnston