Patents by Inventor Shaun Crawford
Shaun Crawford has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9075408Abstract: Methods and apparatus for enhanced control, monitoring and recording of incoming chemical and power use, and emissions of electronic device manufacturing systems are provided. In some embodiments, integrated sub-fab system systems may monitor the energy usage of the sub-fab equipment. The tool can enter many different depths of energy savings modes such as idle (shallow energy savings where production equipment can recover to normal production with no quality or throughput impact in seconds), sleep (deeper energy savings where production equipment can recover in minutes), or hibernate (where production equipment may require hours to recover not to have impact on quality, or throughput) for the system. In some embodiments, the system may monitor and display all gas emissions in a sub-fab as well as the Semi S23 method reporting of CO2 equivalent emission. The system may monitor effluent process gases and energy use from the process tool and sub-fab equipment.Type: GrantFiled: November 14, 2010Date of Patent: July 7, 2015Assignee: APPLIED MATERIALS, INC.Inventors: Youssef A. Loldj, Maxime Cayer, Jay J. Jung, Shaun Crawford, Dana Tribula, Daniel O. Clark
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Publication number: 20110144791Abstract: Methods and apparatus for enhanced control, monitoring and recording of incoming chemical and power use, and emissions of electronic device manufacturing systems are provided. In some embodiments, integrated sub-fab system systems may monitor the energy usage of the sub-fab equipment. The tool can enter many different depths of energy savings modes such as idle (shallow energy savings where production equipment can recover to normal production with no quality or throughput impact in seconds), sleep (deeper energy savings where production equipment can recover in minutes), or hibernate (where production equipment may require hours to recover not to have impact on quality, or throughput) for the system. In some embodiments, the system may monitor and display all gas emissions in a sub-fab as well as the Semi S23 method reporting of CO2 equivalent emission. The system may monitor effluent process gases and energy use from the process tool and sub-fab equipment.Type: ApplicationFiled: November 14, 2010Publication date: June 16, 2011Applicant: APPLIED MATERIALS, INC.Inventors: YOUSSEF A. LOLDJ, MAXIME CAYER, JAY J. JUNG, SHAUN CRAWFORD, DANA TRIBULA, DANIEL O. CLARK
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Patent number: 7960288Abstract: A photoresist trimming gas compound is provided which will selectively remove a resist foot or scum from the lower portions of sidewalls of a photoresist. Additionally, the trimmer compound hardens or toughens an upper surface of the photoresist thereby strengthening the photoresist. The trimmer compound includes O2 and at least one other gaseous oxide and is typically utilized in a dry etching process after a trench has been formed in a photoresist. The other oxide gases, in addition to the O2 may include CO2, SO2 and NO2.Type: GrantFiled: October 9, 2007Date of Patent: June 14, 2011Assignee: International Business Machines CorporationInventors: Shaun Crawford, Cuc K. Huynh, A. Gary Reid, Adam C. Smith, Thomas M. Wagner
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Patent number: 7955988Abstract: A photoresist trimming gas compound is provided which will selectively remove a resist foot or scum from the lower portions of sidewalls of a photoresist. Additionally, the trimmer compound hardens or toughens an upper surface of the photoresist thereby strengthening the photoresist. The trimmer compound includes O2 and at least one other gaseous oxide and is typically utilized in a dry etching process after a trench has been formed in a photoresist. The other oxide gases, in addition to the O2 may include CO2, SO2 and NO2.Type: GrantFiled: September 27, 2007Date of Patent: June 7, 2011Assignee: International Business Machines CorporationInventors: Shaun Crawford, Cuc K. Huynh, A. Gary Reid, Adam C. Smith, Thomas M. Wagner
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Publication number: 20090149996Abstract: A method of operating an electronic device manufacturing thermal abatement system is provided, including: flowing a gaseous effluent through an inlet into a thermal abatement reaction chamber; abating the effluent; flowing the abated effluent through an outlet out of the thermal abatement reaction chamber; using a pressure sensor to measure an inlet pressure; using the same pressure sensor to measure an outlet pressure; wherein the pressure sensor sequentially measures the inlet pressure and the outlet pressure; determining the difference between the inlet pressure and the outlet pressure; and if the difference between the inlet pressure and the outlet pressure exceeds a pre-determined pressure, diverting the flow of effluent away from the inlet. Numerous other aspects are provided.Type: ApplicationFiled: December 5, 2007Publication date: June 11, 2009Inventors: Youssef A. Loldj, Miroslav Gelo, Manuel Diaz, Shaun Crawford
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Publication number: 20080051944Abstract: Method and systems are provided for monitoring and controlling one or more abatement systems. One or more abatement systems may be represented on a display alone with one or more effluent flows from processing tools. A selected effluent flow configuration is received. An interface manifold is controlled to implement the selected effluent flow configuration. Numerous other aspects are provided.Type: ApplicationFiled: August 23, 2007Publication date: February 28, 2008Inventors: Youssef Loldj, Shaun Crawford
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Publication number: 20080032214Abstract: A photoresist trimming gas compound is provided which will selectively remove a resist foot or scum from the lower portions of sidewalls of a photoresist. Additionally, the trimmer compound hardens or toughens an upper surface of the photoresist thereby strengthening the photoresist. The trimmer compound includes O2 and at least one other gaseous oxide and is typically utilized in a dry etching process after a trench has been formed in a photoresist. The other oxide gases, in addition to the O2 may include CO2, SO2 and NO2.Type: ApplicationFiled: October 9, 2007Publication date: February 7, 2008Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Shaun Crawford, Cuc Huynh, A. Reid, Adam Smith, Thomas Wagner
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Publication number: 20080020586Abstract: A photoresist trimming gas compound is provided which will selectively remove a resist foot or scum from the lower portions of sidewalls of a photoresist. Additionally, the trimmer compound hardens or toughens an upper surface of the photoresist thereby strengthening the photoresist. The trimmer compound includes O2 and at least one other gaseous oxide and is typically utilized in a dry etching process after a trench has been formed in a photoresist. The other oxide gases, in addition to the O2 may include CO2, SO2 and NO2.Type: ApplicationFiled: September 27, 2007Publication date: January 24, 2008Applicant: International Business Machines CorporationInventors: Shaun CRAWFORD, Cuc Huynh, A. Reid, Adam Smith, Thomas Wagner
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Patent number: 7304000Abstract: A photoresist trimming gas compound is provided which will selectively remove a resist foot or scum from the lower portions of sidewalls of a photoresist. Additionally, the trimmer compound hardens or toughens an upper surface of the photoresist thereby strengthening the photoresist. The trimmer compound includes O2 and at least one other gaseous oxide and is typically utilized in a dry etching process after a trench has been formed in a photoresist The other oxide gases, in addition to the O2 may include CO2, SO2 and NO2.Type: GrantFiled: August 19, 2004Date of Patent: December 4, 2007Assignee: International Business Machines CorporationInventors: Shaun Crawford, Cuc K. Huynh, A. Gary Reid, Adam C. Smith, Thomas M. Wagner
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Publication number: 20070274876Abstract: The present invention relates to systems and methods for controlled combustion and decomposition of gaseous pollutants while reducing deposition of unwanted reaction products from within the treatment systems. The systems include a novel thermal reaction chamber design having stacked reticulated ceramic rings through which fluid, e.g., gases, may be directed to form a boundary layer along the interior wall of the thermal reaction chamber, thereby reducing particulate matter buildup thereon. The systems further include the introduction of fluids from the center pilot jet to alter the aerodynamics of the interior of the thermal reaction chamber.Type: ApplicationFiled: August 14, 2007Publication date: November 29, 2007Inventors: Ho-Man Chiu, Daniel Clark, Shaun Crawford, Jay Jung, Leonard Todd, Robbert Vermeulen
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Publication number: 20070190469Abstract: In certain embodiments, methods, systems, and apparatus are provided for use in removing pollutants from a gas stream. The invention includes a thermal reaction unit formed from a plurality of stacked porous ceramic rings. The porous rings include perforations adapted to allow fluid to be flowed into the thermal reaction unit. By flowing fluid through the porous rings, deposition of waste effluent and/or by-products on the interior of the thermal reaction unit is prevented. Numerous other aspects are provided.Type: ApplicationFiled: October 31, 2006Publication date: August 16, 2007Inventors: Daniel Clark, Sebastien Raoux, Robert Vermeulen, Shaun Crawford
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Publication number: 20070169889Abstract: In certain embodiments, an apparatus is provided for use in removing pollutants from a gas stream. The apparatus may include one or more thermal reaction units formed from a plurality of stacked porous ceramic rings. The thermal reaction units may be selectively coupled to one or more process tools. In some embodiments a manifold may be used to direct waste effluent toward online primary thermal reaction units and away from back-up thermal reaction units. If a primary thermal reaction unit goes off-line, the manifold may redirect waste effluent toward one or more of the back-up thermal reaction units. Numerous other aspects are provided.Type: ApplicationFiled: October 31, 2006Publication date: July 26, 2007Inventors: Daniel Clark, Sebastien Raoux, Robert Vermeulen, Shaun Crawford
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Publication number: 20070172398Abstract: In certain embodiments, methods, systems, and apparatus are provided for use in removing pollutants from a gas stream. The invention includes a thermal reaction unit formed from a plurality of stacked porous ceramic rings. A first of the porous ceramic rings has a first coefficient of thermal expansion (CTE) and a second of the porous ceramic rings has a second CTE. Numerous other aspects are provided.Type: ApplicationFiled: October 31, 2006Publication date: July 26, 2007Inventors: Daniel Clark, Sebastien Raoux, Robert Vermeulen, Shaun Crawford
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Publication number: 20070172399Abstract: In certain embodiments, an apparatus is provided for use in removing pollutants from a gas stream. The apparatus includes a thermal reaction unit formed from a plurality of stacked porous ceramic rings. At least one of the stacked ceramic sections may be adapted to allow sensing of a characteristic of contents of the central chamber. In some embodiments, waste gas inlets to the thermal reaction unit may be angled to create a helical vortex within the thermal reaction unit. Other aspects are provided.Type: ApplicationFiled: October 31, 2006Publication date: July 26, 2007Inventors: Daniel Clark, Sebastien Raoux, Robert Vermeulen, Shaun Crawford
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Publication number: 20060104879Abstract: The present invention relates to systems and methods for controlled combustion and decomposition of gaseous pollutants while reducing deposition of unwanted reaction products from within the treatment systems. The systems include a novel thermal reaction chamber design having stacked reticulated ceramic rings through which fluid, e.g., gases, may be directed to form a boundary layer along the interior wall of the thermal reaction chamber, thereby reducing particulate matter buildup thereon. The systems further include the introduction of fluids from the center pilot jet to alter the aerodynamics of the interior of the thermal reaction chamber.Type: ApplicationFiled: November 12, 2004Publication date: May 18, 2006Inventors: Ho-Man Chiu, Daniel Clark, Shaun Crawford, Jay Jung, Leonard Todd, Robbert Vermeulen
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Publication number: 20060104878Abstract: The present invention relates to a thermal reactor apparatus used to treat industrial effluent fluids, for example waste effluent produced in semiconductor and liquid crystal display manufacturing processes. Specifically, the present invention relates to improved monitoring and control features for the thermal reactor apparatus, including a flame sensing device, an intrinsically safe flammable gas sensing device, and a sequential mode of operation having built-in safety redundancy. The improved monitoring and control features ensure the safe and efficient abatement of waste effluent within the thermal reactor apparatus.Type: ApplicationFiled: November 18, 2004Publication date: May 18, 2006Inventors: Ho-Man Chiu, Daniel Clark, Shaun Crawford, Jay Jung, Youssef Loldj, Robbert Vermeulen
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Publication number: 20060040504Abstract: A photoresist trimming gas compound is provided which will selectively remove a resist foot or scum from the lower portions of sidewalls of a photoresist. Additionally, the trimmer compound hardens or toughens an upper surface of the photoresist thereby strengthening the photoresist. The trimmer compound includes O2 and at least one other gaseous oxide and is typically utilized in a dry etching process after a trench has been formed in a photoresist The other oxide gases, in addition to the O2 may include CO2, SO2 and NO2.Type: ApplicationFiled: August 19, 2004Publication date: February 23, 2006Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Shaun Crawford, Cuc Huynh, A. Reid, Adam Smith, Thomas Wagner