Patents by Inventor Shawyon JAFARI
Shawyon JAFARI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240145252Abstract: Exemplary semiconductor processing chamber faceplates may include a body having a first surface and a second surface opposite the first surface. The body may define a plurality of apertures that extend through one or both of the first surface and the second surface. The faceplates may include a heater disposed within an interior of the body. The faceplates may include a first RF mesh disposed between the heater and the first surface. The faceplates may include a second RF mesh disposed between the heater and the second surface. The first RF mesh and the second RF mesh may be coupled together and form a Faraday cage about the heater.Type: ApplicationFiled: November 2, 2022Publication date: May 2, 2024Applicant: Applied Materials, Inc.Inventors: Rutvij Naik, Vijay Sarthy Mysore Sreedhara, Xiaopu Li, Shawyon Jafari, Chidambara A. Ramalingam, Edward P. Hammond, Juan Carlos Rocha-Alvarez
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Publication number: 20240061409Abstract: A method includes identifying sets of part data associated with substrate processing equipment. Each of the sets of part data includes corresponding part values and a corresponding part identifier. Each of the sets of part data is associated with hardware parameters of a corresponding equipment part of substrate processing equipment. The method further includes generating sets of aggregated data. Each of the sets of aggregated data includes a corresponding set of part data of the sets of part data and a corresponding set of additional non-part data of sets of non-part data. The method further includes causing, based on the sets of aggregated data, performance of a corrective action associated with the substrate processing equipment.Type: ApplicationFiled: October 26, 2023Publication date: February 22, 2024Inventors: Garrett Ho-Yee Sin, Sidharth Bhatia, Katty Marie Lydia Gamon Guyomard, Shawyon Jafari, Heng-Cheng Pai, Pramod Nambiar, Paul Lukas Brillhart, Ilker Durukan
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Patent number: 11853042Abstract: A method includes receiving part data associated with a corresponding part of substrate processing equipment, sensor data associated with one or more corresponding substrate processing operations performed by the substrate processing equipment to produce one or more corresponding substrates, and metrology data associated with the one or more corresponding substrates produced by the one or more corresponding substrate processing operations performed by the substrate processing equipment that includes the corresponding part. The method further includes generating sets of aggregated part-sensor-metrology data including a corresponding set of part data, a corresponding set of sensor data, and a corresponding set of metrology data. The method further includes causing analysis of the sets of aggregated part-sensor-metrology data to generate one or more outputs to perform a corrective action associated with the corresponding part of the substrate processing equipment.Type: GrantFiled: February 17, 2021Date of Patent: December 26, 2023Assignee: Applied Materials, Inc.Inventors: Garrett Ho-Yee Sin, Sidharth Bhatia, Katty Marie Lydia Gamon Guyomard, Shawyon Jafari, Heng-Cheng Pai, Pramod Nambiar, Paul Lukas Brillhart, Ilker Durukan
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Patent number: 11851758Abstract: Methods of manufacturing a semiconductor processing chamber showerheads may include forming a melted aluminum alloy composition, cooling the melted aluminum alloy composition at a rate of at least 103 K/sec to form solid aluminum alloy particles, and forming a core region of a showerhead from the solid aluminum alloy particles. The core region of the showerhead may include an inner core region and an outer core region that may be coupled together. The inner core region may define a plurality of apertures. The outer core region may define a channel that receives a heating element. The methods may include coating the core region with one of aluminum or aluminum oxide and joining a peripheral edge of the outer core region with an inner edge of a metallic annular liner. The metallic annular liner may have a lower thermal conductivity than the core region of the showerhead.Type: GrantFiled: April 20, 2021Date of Patent: December 26, 2023Assignee: Applied Materials, Inc.Inventors: Sumit Agarwal, Katherine Woo, Shawyon Jafari, Jian Li, Chidambara A. Ramalingam
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Patent number: 11848218Abstract: Exemplary semiconductor chamber component cleaning systems may include a receptacle. The receptacle may include a bottom lid that may be an annulus. The annulus may be characterized by an inner annular wall and an outer annular wall. A plurality of recessed annular ledges may be defined between the inner annular wall and the outer annular wall. Each recessed annular ledge of the plurality of recessed annular ledges may be formed at a different radial position along the bottom lid. The cleaning systems may include a top lid removably coupled with the bottom lid about an exterior region of the top lid. The cleaning systems may include a tank defining a volume to receive the receptacle.Type: GrantFiled: October 22, 2020Date of Patent: December 19, 2023Assignee: Applied Materials, Inc.Inventors: Katty Guyomard, Chidambara A. Ramalingam, Shawyon Jafari, Palash Joshi, Moin Ahmed Khan, Kirubanandan Naina Shanmugam, Subhaschandra Shreepad Salkod, Avishek Ghosh, David W. Groechel, Li Wu, Dorothea Buechel-Rimmel
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Publication number: 20230302582Abstract: Exemplary methods of fabricating a faceplate for a processing chamber may include drilling a first portion of each of a plurality of apertures in a first surface of a faceplate. Each first portion may extend at least partially through a thickness of the faceplate. The methods may include detecting a center of each first portion using a laser drilling apparatus. The methods may include drilling a diffuser portion in each of the plurality of apertures using the laser drilling apparatus. Each diffuser portion is centered with respect to a respective one of the first portions.Type: ApplicationFiled: March 24, 2022Publication date: September 28, 2023Applicant: Applied Materials, Inc.Inventors: Chidambara A. Ramalingam, Shawyon Jafari
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Publication number: 20220333244Abstract: Exemplary semiconductor processing chamber showerheads include an inner core region. The inner core region may define a plurality of apertures. The showerheads may include an outer core region disposed about an outer periphery of the inner core region. The outer core region may define an annular channel. The showerheads may include a heating element disposed within the annular channel. The showerheads may include an annular liner disposed about an outer periphery of the outer core region. The inner core region and the outer core region may include an aluminum alloy. The annular liner may have a lower thermal conductivity than the aluminum alloy.Type: ApplicationFiled: April 20, 2021Publication date: October 20, 2022Applicant: Applied Materials, Inc.Inventors: Sumit Agarwal, Katherine Woo, Shawyon Jafari, Jian Li, Chidambara A. Ramalingam
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Publication number: 20220260978Abstract: A method includes receiving part data associated with a corresponding part of substrate processing equipment, sensor data associated with one or more corresponding substrate processing operations performed by the substrate processing equipment to produce one or more corresponding substrates, and metrology data associated with the one or more corresponding substrates produced by the one or more corresponding substrate processing operations performed by the substrate processing equipment that includes the corresponding part. The method further includes generating sets of aggregated part-sensor-metrology data including a corresponding set of part data, a corresponding set of sensor data, and a corresponding set of metrology data. The method further includes causing analysis of the sets of aggregated part-sensor-metrology data to generate one or more outputs to perform a corrective action associated with the corresponding part of the substrate processing equipment.Type: ApplicationFiled: February 17, 2021Publication date: August 18, 2022Inventors: Garrett Ho-Yee Sin, Sidharth Bhatia, Katty Marie Lydia Gamon Guyomard, Shawyon Jafari, Heng-Cheng Pai, Pramod Nambiar, Paul Lukas Brillhart, Ilker Durukan
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Publication number: 20220130692Abstract: Exemplary semiconductor chamber component cleaning systems may include a receptacle. The receptacle may include a bottom lid that may be an annulus. The annulus may be characterized by an inner annular wall and an outer annular wall. A plurality of recessed annular ledges may be defined between the inner annular wall and the outer annular wall. Each recessed annular ledge of the plurality of recessed annular ledges may be formed at a different radial position along the bottom lid. The cleaning systems may include a top lid removably coupled with the bottom lid about an exterior region of the top lid. The cleaning systems may include a tank defining a volume to receive the receptacle.Type: ApplicationFiled: October 22, 2020Publication date: April 28, 2022Applicant: Applied Materials, Inc.Inventors: Katty Guyomard, Chidambara A. Ramalingam, Shawyon Jafari, Palash Joshi, Moin Ahmed Khan, Kirubanandan Naina Shanmugam, Subhaschandra Shreepad Salkod, Avishek Ghosh, David W. Groechel, Li Wu, Dorothea Buechel-Rimmel
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Patent number: 10883932Abstract: An FI having an in-situ particle detector and a method for particle detection therein are provided. In one aspect, the FI includes a fan, a substrate support, a particle detector, and an exhaust outlet. The fan, substrate support, and particle detector are arranged such that, in operation, the fan directs air towards the exhaust outlet and over a substrate on the substrate support to create laminar flow. The particle detector, positioned downstream from the substrate support and upstream from the exhaust outlet, analyzes the air and detects particle concentration before the particles are exhausted. The collected particle detection data may be combined with data from other sensors in the FI and used to identify the source of particle contamination. The particle detector may also be incorporated into other system components, including but not limited to, a load-lock or buffer chamber to detect particle concentration therein.Type: GrantFiled: June 27, 2019Date of Patent: January 5, 2021Assignee: Applied Materials, Inc.Inventors: Lin Zhang, Xuesong Lu, Andrew V. Le, Fa Ji, Jang Seok Oh, Patrick L. Smith, Shawyon Jafari, Ralph Peter Antonio
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Publication number: 20200098547Abstract: Systems and methods for a process chamber that decreases the severity and occurrence of substrate defects due to loosened scale is discussed herein. A gas distribution assembly is disposed in a process chamber and includes a faceplate with a plurality of apertures formed therethrough and a second member. The faceplate is coupled to the second member which is configured to couple to the faceplate to reduce an exposed area of the faceplate and minimize an available area for material buildup during the release of gas into the process chamber. The second member is further configured to improve the glow of precursors into the process chamber. The gas distribution assembly can be heated before and during process chamber operations, and can remain heated between process chamber operations.Type: ApplicationFiled: September 25, 2019Publication date: March 26, 2020Inventors: Priyanka DASH, Zhijun JIANG, Ganesh BALASUBRAMANIAN, Qiang MA, Kalyanjit GHOSH, Kaushik ALAYAVALLI, Yuxing ZHANG, Daniel HWUNG, Shawyon JAFARI
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Patent number: 10600624Abstract: Systems and methods for depositing a film in a PECVD chamber while reducing residue buildup in the chamber. In some embodiments disclosed herein, a processing chamber includes a chamber body, a substrate support, a showerhead, and one or more heaters configured to heat the showerhead. In some embodiments, the processing chamber includes a controller.Type: GrantFiled: December 21, 2018Date of Patent: March 24, 2020Assignee: APPLIED MATERIALS, INC.Inventors: Kalyanjit Ghosh, Sanjeev Baluja, Mayur G. Kulkarni, Shailendra Srivastava, Tejas Ulavi, Yusheng Alvin Zhou, Amit Kumar Bansal, Priyanka Dash, Zhijun Jiang, Ganesh Balasubramanian, Qiang Ma, Kaushik Alayavalli, Yuxing Zhang, Daniel Hwung, Shawyon Jafari
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Publication number: 20190323960Abstract: An FI having an in-situ particle detector and a method for particle detection therein are provided. In one aspect, the FI includes a fan, a substrate support, a particle detector, and an exhaust outlet. The fan, substrate support, and particle detector are arranged such that, in operation, the fan directs air towards the exhaust outlet and over a substrate on the substrate support to create laminar flow. The particle detector, positioned downstream from the substrate support and upstream from the exhaust outlet, analyzes the air and detects particle concentration before the particles are exhausted. The collected particle detection data may be combined with data from other sensors in the FI and used to identify the source of particle contamination. The particle detector may also be incorporated into other system components, including but not limited to, a load-lock or buffer chamber to detect particle concentration therein.Type: ApplicationFiled: June 27, 2019Publication date: October 24, 2019Inventors: Lin ZHANG, Xuesong LU, Andrew V. LE, Fa JI, Jang Seok OH, Patrick L. SMITH, Shawyon JAFARI, Ralph Peter ANTONIO
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Patent number: 10365216Abstract: An FI having an in-situ particle detector and a method for particle detection therein are provided. In one aspect, the FI includes a fan, a substrate support, a particle detector, and an exhaust outlet. The fan, substrate support, and particle detector are arranged such that, in operation, the fan directs air towards the exhaust outlet and over a substrate on the substrate support to create laminar flow. The particle detector, positioned downstream from the substrate support and upstream from the exhaust outlet, analyzes the air and detects particle concentration before the particles are exhausted. The collected particle detection data may be combined with data from other sensors in the FI and used to identify the source of particle contamination. The particle detector may also be incorporated into other system components, including but not limited to, a load-lock or buffer chamber to detect particle concentration therein.Type: GrantFiled: October 25, 2017Date of Patent: July 30, 2019Assignee: Applied Materials, Inc.Inventors: Lin Zhang, Xuesong Lu, Andrew V. Le, Fa Ji, Jang Seok Oh, Patrick L. Smith, Shawyon Jafari, Ralph Peter Antonio
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Publication number: 20190122872Abstract: Systems and methods for depositing a film in a PECVD chamber while reducing residue buildup in the chamber. In some embodiments disclosed herein, a processing chamber includes a chamber body, a substrate support, a showerhead, and one or more heaters configured to heat the showerhead. In some embodiments, the processing chamber includes a controller.Type: ApplicationFiled: December 21, 2018Publication date: April 25, 2019Inventors: Kalyanjit GHOSH, Sanjeev BALUJA, Mayur G. KULKARNI, Shailendra SRIVASTAVA, Tejas ULAVI, Yusheng ALVIN ZHOU, Amit Kumar BANSAL, Priyanka DASH, Zhijun JIANG, Ganesh BALASUBRAMANIAN, Qiang MA, Kaushik ALAYAVALLI, Yuxing ZHANG, Daniel HWUNG, Shawyon JAFARI
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Publication number: 20180156727Abstract: An FI having an in-situ particle detector and a method for particle detection therein are provided. In one aspect, the FI includes a fan, a substrate support, a particle detector, and an exhaust outlet. The fan, substrate support, and particle detector are arranged such that, in operation, the fan directs air towards the exhaust outlet and over a substrate on the substrate support to create laminar flow. The particle detector, positioned downstream from the substrate support and upstream from the exhaust outlet, analyzes the air and detects particle concentration before the particles are exhausted. The collected particle detection data may be combined with data from other sensors in the FI and used to identify the source of particle contamination. The particle detector may also be incorporated into other system components, including but not limited to, a load-lock or buffer chamber to detect particle concentration therein.Type: ApplicationFiled: October 25, 2017Publication date: June 7, 2018Inventors: Lin ZHANG, Xuesong LU, Andrew V. LE, Fa JI, Jang Seok OH, Patrick L. SMITH, Shawyon JAFARI, Ralph Peter ANTONIO