Abstract: A system for depth estimation, comprises at least a first and a second depth estimation optical systems, each configured for receiving a light beam from a scene and estimating depths within the scene, wherein the first system is a monocular depth estimation optical system; and an image processor, configured for receiving depth information from the first and second systems, and generating a depth map or a three-dimensional image of the scene based on the received depth information.

Abstract: A method of designing an element for the manipulation of waves, comprises: accessing a computer readable medium storing a machine learning procedure, having a plurality of learnable weight parameters. A first plurality of the weight parameters corresponds to the element, and a second plurality of the weight parameters correspond to an image processing. The method comprises accessing a computer readable medium storing training imaging data, and training the machine learning procedure on the training imaging data, so as to obtain values for at least the first plurality of the weight parameters.

Abstract: An optical element is disclosed. The optical element comprises: a first phase shift mask formed on a first optical material and constituted to generate a positive phase shift, and a second phase shift mask formed on a second optical material and constituted to generate a negative phase shift, wherein the phase shift masks are arranged serially on an optical axis, and wherein a refractive index of at least one of the first and second optical materials varies with the temperature at a rate of at least 50×10?6 per degree Kelvin.

Abstract: An optical element is disclosed. The optical element comprises: a first phase shift mask formed on a first optical material and constituted to generate a positive phase shift, and a second phase shift mask formed on a second optical material and constituted to generate a negative phase shift, wherein the phase shift masks are arranged serially on an optical axis, and wherein a refractive index of at least one of the first and second optical materials varies with the temperature at a rate of at least 50×10?6 per degree Kelvin.

Abstract: An optical element is disclosed. The optical element comprises: a first phase shift mask formed on a first optical material and constituted to generate a positive phase shift, and a second phase shift mask formed on a second optical material and constituted to generate a negative phase shift, wherein the phase shift masks are arranged serially on an optical axis, and wherein a refractive index of at least one of the first and second optical materials varies with the temperature at a rate of at least 50×10?6 per degree Kelvin.

Abstract: An optical element is disclosed. The optical element comprises: a first phase shift mask formed on a first optical material and constituted to generate a positive phase shift, and a second phase shift mask formed on a second optical material and constituted to generate a negative phase shift, wherein the phase shift masks are arranged serially on an optical axis, and wherein a refractive index of at least one of the first and second optical materials varies with the temperature at a rate of at least 50×10?6 per degree Kelvin.