Patents by Inventor Shay Wolfling
Shay Wolfling has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240337590Abstract: A method and system are presented for use in measuring on patterned samples, aimed at determining asymmetry in the pattern. A set of at least first and second measurements on a patterned region of a sample is performed, where each of the measurements comprises: directing illuminating light onto the patterned region along an illumination channel and collecting light reflected from the illuminated region propagating along a collection channel to be detected, such that detected light from the same patterned region has different polarization states which are different from polarization of the illuminating light, and generating a measured data piece indicative of the light detected in the measurement. Thus, at least first and second measured data pieces are generated for the at least first and second measurements on the same patterned region. The at least first and second measured data pieces are analyzed and output data is generated being indicative of a condition of asymmetry in the patterned region.Type: ApplicationFiled: January 29, 2024Publication date: October 10, 2024Applicant: NOVA LTD.Inventors: Dror SHAFIR, Gilad BARAK, Shay WOLFLING, Michal Haim YACHINI, Matthew SENDELBACH, Cornel BOZDOG
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Patent number: 11885737Abstract: A method and system are presented for use in measuring on patterned samples, aimed at determining asymmetry in the pattern. A set of at least first and second measurements on a patterned region of a sample is performed, where each of the measurements comprises: directing illuminating light onto the patterned region along an illumination channel and collecting light reflected from the illuminated region propagating along a collection channel to be detected, such that detected light from the same patterned region has different polarization states which are different from polarization of the illuminating light, and generating a measured data piece indicative of the light detected in the measurement. Thus, at least first and second measured data pieces are generated for the at least first and second measurements on the same patterned region. The at least first and second measured data pieces are analyzed and output data is generated being indicative of a condition of asymmetry in the patterned region.Type: GrantFiled: December 28, 2020Date of Patent: January 30, 2024Assignee: Nova Ltd.Inventors: Dror Shafir, Gilad Barak, Shay Wolfling, Michal Haim Yachini, Matthew Sendelbach, Cornel Bozdog
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Publication number: 20210116359Abstract: A method and system are presented for use in measuring on patterned samples, aimed at determining asymmetry in the pattern. A set of at least first and second measurements on a patterned region of a sample is performed, where each of the measurements comprises: directing illuminating light onto the patterned region along an illumination channel and collecting light reflected from the illuminated region propagating along a collection channel to be detected, such that detected light from the same patterned region has different polarization states which are different from polarization of the illuminating light, and generating a measured data piece indicative of the light detected in the measurement. Thus, at least first and second measured data pieces are generated for the at least first and second measurements on the same patterned region. The at least first and second measured data pieces are analyzed and output data is generated being indicative of a condition of asymmetry in the patterned region.Type: ApplicationFiled: December 28, 2020Publication date: April 22, 2021Applicant: NOVA MEASURING INSTRUMENTS LTD.Inventors: Dror SHAFIR, Gilad Barak, Shay WOLFLING, Michal Haim YACHINI, Matthew SENDELBACH, Cornel BOZDOG
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Patent number: 10876959Abstract: A method and system are presented for use in measuring on patterned samples, aimed at determining asymmetry in the pattern. A set of at least first and second measurements on a patterned region of a sample is performed, where each of the measurements comprises: directing illuminating light onto the patterned region along an illumination channel and collecting light reflected from the illuminated region propagating along a collection channel to be detected, such that detected light from the same patterned region has different polarization states which are different from polarization of the illuminating light, and generating a measured data piece indicative of the light detected in the measurement. Thus, at least first and second measured data pieces are generated for the at least first and second measurements on the same patterned region. The at least first and second measured data pieces are analyzed and output data is generated being indicative of a condition of asymmetry in the patterned region.Type: GrantFiled: July 23, 2018Date of Patent: December 29, 2020Assignee: NOVA MEASURING INSTRUMENTS LTD.Inventors: Dror Shafir, Gilad Barak, Shay Wolfling, Michal Haim Yachini, Matthew Sendelbach, Cornel Bozdog
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Patent number: 10311198Abstract: A sample comprising an overlay target is presented. The overlay target comprises at least one pair of patterned structures, the patterned structures of the pair being accommodated in respectively bottom and top layers of the sample with a certain vertical distance h between them, wherein a pattern in at least one of the patterned structures has at least one pattern parameter optimized for a predetermined optical overlay measurement scheme with a predetermined wavelength range.Type: GrantFiled: February 16, 2015Date of Patent: June 4, 2019Assignee: NOVA MEASURING INSTRUMENTS LTD.Inventors: Gilad Barak, Tal Verdene, Michal Yachini, Dror Shafir, Changman Moon, Shay Wolfling
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Patent number: 10209206Abstract: A control system is presented for use in measuring one or more parameters of a sample. The control system comprises an input utility and a processor utility. The input utility is configured for receiving input data including first data comprising X-ray Diffraction or High-Resolution X-ray Diffraction (XRD) response data of the sample indicative of a material distribution in the sample, and second data comprising optical response data of the sample to incident light indicative of at least a geometry of the sample. The processor utility is configured and operable for processing and analyzing one of the first and second data for optimizing the other one of the first and second data, and utilizing the optimized data for determining said one or more parameters of the sample including a strain distribution in the sample.Type: GrantFiled: July 8, 2014Date of Patent: February 19, 2019Assignee: NOVA MEASURING INSTRUMENTS LTD.Inventors: Gilad Barak, Shay Wolfling, Cornel Bozdog, Matthew Sendelbach
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Publication number: 20180328837Abstract: A method and system are presented for use in measuring on patterned samples, aimed at determining asymmetry in the pattern. A set of at least first and second measurements on a patterned region of a sample is performed, where each of the measurements comprises: directing illuminating light onto the patterned region along an illumination channel and collecting light reflected from the illuminated region propagating along a collection channel to be detected, such that detected light from the same patterned region has different polarization states which are different from polarization of the illuminating light, and generating a measured data piece indicative of the light detected in the measurement. Thus, at least first and second measured data pieces are generated for the at least first and second measurements on the same patterned region. The at least first and second measured data pieces are analyzed and output data is generated being indicative of a condition of asymmetry in the patterned region.Type: ApplicationFiled: July 23, 2018Publication date: November 15, 2018Inventors: Dror SHAFIR, Gilad BARAK, Shay WOLFLING, Michal Haim YACHINI, Matthew SENDELBACH, Cornel BOZDOG
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Patent number: 10054423Abstract: Method and system for measuring one or more parameters of a patterned structure, using light source producing an input beam of at least partially coherent light in spatial and temporal domains, a detection system comprising a position sensitive detector for receiving light and generating measured data indicative thereof, an optical system configured for focusing the input light beam onto a diffraction limited spot on a sample's surface, collecting an output light returned from the illuminated spot, and imaging the collected output light onto a light sensitive surface of the position sensitive detector, where an image being indicative of coherent summation of output light portions propagating from the structure in different directions.Type: GrantFiled: December 26, 2013Date of Patent: August 21, 2018Assignee: NOVA MEASURING INSTRUMENTS LTD.Inventors: Dror Shafir, Gilad Barak, Shay Wolfling
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Publication number: 20170061066Abstract: A sample comprising an overlay target is presented. The overlay target comprises at least one pair of patterned structures, the patterned structures of the pair being accommodated in respectively bottom and top layers of the sample with a certain vertical distance h between them, wherein a pattern in at least one of the patterned structures has at least one pattern parameter optimized for a predetermined optical overlay measurement scheme with a predetermined wavelength range.Type: ApplicationFiled: February 16, 2015Publication date: March 2, 2017Inventors: Gilad BARAK, Tal VERDENE, Michal YACHINI, Dror SHAFIR, Changman MOON, Shay WOLFLING
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Publication number: 20170018069Abstract: A computerized system and method are provided for use in measuring at least one parameter of interest of a structure. The system comprises a server utility configured for data communication with at least first and second data provider utilities. The server utility receives, from the server provider utilities, measured data comprising first and second measured data pieces of different types indicative of parameters of the same structure; and is capable of processing the first and second measured data pieces for optimizing one or more first parameters values of the structure in one of the first and second measured data pieces by utilizing one or more second parameters values of the structure of the other of said first and second measured data pieces.Type: ApplicationFiled: October 30, 2014Publication date: January 19, 2017Inventors: Alok Vaid, Cornel Bozdong, Shay Wolfling, Matthew J. Sendelbach, Jamie Tsai, Cermen Osorio
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Publication number: 20160139065Abstract: A control system is presented for use in measuring one or more parameters of a sample. The control system comprises an input utility and a processor utility. The input utility is configured for receiving input data including first data comprising X-ray Diffraction or High-Resolution X-ray Diffraction (XRD) response data of the sample indicative of a material distribution in the sample, and second data comprising optical response data of the sample to incident light indicative of at least a geometry of the sample. The processor utility is configured and operable for processing and analyzing one of the first and second data for optimizing the other one of the first and second data, and utilizing the optimized data for determining said one or more parameters of the sample including a strain distribution in the sample.Type: ApplicationFiled: July 8, 2014Publication date: May 19, 2016Inventors: Gilad BARAK, Shay WOLFLING, Cornel BOZDOG, Matthew SENDELBACH
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Publication number: 20150345934Abstract: Method and system for measuring one or more parameters of a patterned structure, using light source producing an input beam of at least partially coherent light in spatial and temporal domains, a detection system comprising a position sensitive detector for receiving light and generating measured data indicative thereof, an optical system configured for focusing the input light beam onto a diffraction limited spot on a sample's surface, collecting an output light returned from the illuminated spot, and imaging the collected output light onto a light sensitive surface of the position sensitive detector, where an image being indicative of coherent summation of output light portions propagating from the structure in different directions.Type: ApplicationFiled: December 26, 2013Publication date: December 3, 2015Inventors: Dror SHAFIR, Gilad BARAK, Shay WOLFLING
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Publication number: 20150316468Abstract: A method and system are presented for use in measuring on patterned samples, aimed at determining asymmetry in the pattern. A set of at least first and second measurements on a patterned region of a sample is performed, where each of the measurements comprises: directing illuminating light onto the patterned region along an illumination channel and collecting light reflected from the illuminated region propagating along a collection channel to be detected, such that detected light from the same patterned region has different polarization states which are different from polarization of the illuminating light, and generating a measured data piece indicative of the light detected in the measurement. Thus, at least first and second measured data pieces are generated for the at least first and second measurements on the same patterned region. The at least first and second measured data pieces are analyzed and output data is generated being indicative of a condition of asymmetry in the patterned region.Type: ApplicationFiled: April 30, 2014Publication date: November 5, 2015Inventors: Dror SHAFIR, Gilad BARAK, Shay WOLFLING, Michal Haim YACHINIA, Matthew SENDELBACH, Cornel BOZDOG
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Patent number: 8319975Abstract: Methods and apparatus to perform wavefront analysis, including phase and amplitude information, and 3D measurements in optical systems, and in particular those based on analyzing the output of an intermediate plane, such as an image plane, of an optical system. Measurement of surface topography in the presence of thin film coatings, or of the individual layers of a multilayered structure is described. Multi-wavelength analysis in combination with phase and amplitude mapping is utilized. Methods of improving phase and surface topography measurements by wavefront propagation and refocusing, using virtual wavefront propagation based on solutions of Maxwell's equations are described. Reduction of coherence noise in optical imaging systems is achieved by such phase manipulation methods, or by methods utilizing a combination of wideband and coherent sources.Type: GrantFiled: March 11, 2005Date of Patent: November 27, 2012Assignee: Nano-Or Technologies (Israel) Ltd.Inventors: Yoel Arieli, Shay Wolfling, Emmanuel Lanzmann, Gavriel Feigin, Tal Kuzniz, Yoram Saban
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Publication number: 20110149298Abstract: A method of wavefront (100) analysis including applying a transform to the wavefront, applying a plurality of different phase changes (110, 112, 114) to the transformed wavefront (108), obtaining a plurality of intensity maps (130, 132, 134) wherein the plurality of different phase changes are applied to region of the transformed wavefront, corresponding to a shape of the light source.Type: ApplicationFiled: September 3, 2009Publication date: June 23, 2011Applicant: ICOS Vision Systems NVInventors: Yoel Arieli, Shay Wolfling, David Banitt, Yosi Weitzman, Yoram Saban, Emmanuel Lanzmann, Shay Levavi
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Publication number: 20100002950Abstract: Methods and apparatus to perform wavefront analysis, including phase and amplitude information, and 3D measurements in optical systems, and in particular those based on analyzing the output of an intermediate plane, such as an image plane, of an optical system. Measurement of surface topography in the presence of thin film coatings, or of the individual layers of a multilayered structure is described. Multi-wavelength analysis in combination with phase and amplitude mapping is utilized. Methods of improving phase and surface topography measurements by wavefront propagation and refocusing, using virtual wavefront propagation based on solutions of Maxwell's equations are described. Reduction of coherence noise in optical imaging systems is achieved by such phase manipulation methods, or by methods utilizing a combination of wideband and coherent sources.Type: ApplicationFiled: March 11, 2005Publication date: January 7, 2010Applicant: ICOS VISION SYSTEMS NVInventors: Yoel Arieli, Shay Wolfling, Emmanuel Lanzmann, Gavriel Feigin, Tal Kuzniz, Yoram Saban
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Patent number: 7609388Abstract: A method of wavefront (100) analysis including applying a transform to the wavefront, applying a plurality of different phase changes (110, 112, 114) to the transformed wavefront (108), obtaining a plurality of intensity maps (130, 132, 134) wherein the plurality of different phase changes are applied to region of the transformed wavefront, corresponding to a shape of the light source.Type: GrantFiled: October 16, 2002Date of Patent: October 27, 2009Assignee: ICOS Vision Systems NVInventors: Yoel Arieli, Shay Wolfling, David Banitt, Yosi Weitzman, Yoram Saban, Emmanuel Lanzmann, Shay Levavi
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Patent number: 7542144Abstract: A method and apparatus for wavefront analysis including obtaining a plurality of differently phase changed transformed wavefronts corresponding to a wavefront being analyzed which has an amplitude and a phase, obtaining a plurality of intensity maps of the plurality of phase changed transformed wavefronts and employing the plurality of intensity maps to obtain an output indicating the amplitude and phase of the wavefront being analyzed.Type: GrantFiled: November 30, 2007Date of Patent: June 2, 2009Assignee: Icos Vision Systems N.V.Inventors: Yoel Arieli, Shay Wolfling, Eval Shekel
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Publication number: 20080088851Abstract: A method and apparatus for wavefront analysis including obtaining a plurality of differently phase changed transformed wavefronts corresponding to a wavefront being analyzed which has an amplitude and a phase, obtaining a plurality of intensity maps of the plurality of phase changed transformed wavefronts and employing the plurality of intensity maps to obtain an output indicating the amplitude and phase of the wavefront being analyzed.Type: ApplicationFiled: November 30, 2007Publication date: April 17, 2008Inventors: Yoel Arieli, Shay Wolfling, Eval Shekel
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Patent number: 7327470Abstract: A method and apparatus for wavefront analysis including obtaining a plurality of differently phase changed transformed wavefronts corresponding to a wavefront being analyzed which has an amplitude and a phase, obtaining a plurality of intensity maps of the plurality of phase changed transformed wavefronts and employing the plurality of intensity maps to obtain an output indicating the amplitude and phase of the wavefront being analyzed.Type: GrantFiled: November 12, 2004Date of Patent: February 5, 2008Assignee: Icos Vision Systems N.V.Inventors: Yoel Arieli, Shay Wolfling, Eyal Shekel