Abstract: Provided is a binarization method for CT sectional image of fiber package containing artifacts, which includes: performing brightness adjustment on the source image obtained after converting of the HSV image model by using a composite tangent function; creating a planar morphological structural element having a morphology similar to that of a target object to obtain a background image without the target object; obtaining a second intermediate image by a subtraction operation of the first intermediate image and the background image; improving an image contrast of the second intermediate image again to obtain a third intermediate image; and binarizing the third intermediate image by using a local adaptive threshold binarization algorithm and removing a background noise to obtain a final binarized image. The binarization method can improve the uneven brightness of the image under complex illumination, alleviate the artifacts, and strip similar objects from the background with similar gray scales.

Abstract: An Android penetration method and device for implementing silent installation based on accessibility services. The method includes: acquiring a second target application by adding a load program to a first target application and adding penetration permissions using an Android decompilation technology; and implementing silent installation of the second target application using an accessibility service technology.

Abstract: A method for tuning a threshold voltage of a transistor is disclosed. A channel layer is formed over a substrate. An interfacial layer is formed over and surrounds the channel layer. A gate dielectric layer is formed over and surrounds the interfacial layer. A dipole layer is formed over and wraps around the gate dielectric layer by performing a cyclic deposition etch process, and the dipole layer includes dipole metal elements and has a substantially uniform thickness. A thermal drive-in process is performed to drive the dipole metal elements in the dipole layer into the gate dielectric layer to form an interfacial dipole surface, and then the dipole layer is removed.

Abstract: A package structure is provided. The package structure includes a first conductive pad in a first insulating layer, a conductive via in a second insulating layer directly under the first conductive pad, and a first under bump metallurgy structure directly under the first conductive via. In a first horizontal direction, the conductive via is narrower than the first under bump metallurgy structure, and the first under bump metallurgy structure is narrower than the first conductive pad.

Abstract: A device includes a first cell active area asymmetrically positioned in a first device column between a first barrier line and a second barrier line, a second cell active area asymmetrically positioned in a second device column between the first barrier line and a third barrier line, where the first cell has a first cell length in a first direction perpendicular to the first barrier line which is three times a second cell length in the first direction. The first cell active area and the second cell active area are a first distance from the first barrier line, and the first cell active area is a second distance from the second barrier line, and the second cell active area is the second distance away from the third barrier line.

Abstract: A method of forming an IC structure includes forming first and second power rails at a power rail level. First metal segments are formed at a first metal level above the power rail level. Each first metal segment of the plurality of first metal segments overlap one or both of the first power rail or the second power rail. First vias are formed between the power rail level and the first metal level. Second metal segments are formed at a second metal level above the first metal level. At least one second metal segment of the plurality of second metal segments overlaps the first power rail. At least one second metal segment of the plurality of second metal segments overlaps the second power rail. A plurality of second vias are formed between the first metal level and the second metal level.

Abstract: In an integrated circuit, the gates of a first high-threshold transistor and a first low-threshold transistor are connected together, and the gates of a second high-threshold transistor and a second low-threshold transistor are connected together. The drain of the first high-threshold transistor is conductively connected to the source of the first low-threshold transistor, and the drain of the second high-threshold transistor is conductively connected to the source of the second low-threshold transistor. The gates of the first low-threshold transistor and the second low-threshold transistor are conductively connected to the drain of the first low-threshold transistor. The threshold-voltage of the first high-threshold transistor is larger than a threshold-voltage of the first low-threshold transistor. The threshold-voltage of the second high-threshold transistor is larger than a threshold-voltage of the second low-threshold transistor.

Abstract: A method includes forming a first dielectric layer, forming a first redistribution line comprising a first via extending into the first dielectric layer, and a first trace over the first dielectric layer, forming a second dielectric layer covering the first redistribution line, and patterning the second dielectric layer to form a via opening. The first redistribution line is revealed through the via opening. The method further includes forming a second via in the second dielectric layer, and a conductive pad over and contacting the second via, and forming a conductive bump over the conductive pad. The conductive pad is larger than the conductive bump, with a first center of conductive pad being offsetting from a second center of the conductive bump. The second via is further offset from the second center of the conductive bump.

Abstract: The disclosed techniques include a space filling device to be used with a wet bench in chemical replacement procedures. The space filling device has an overall density that is higher than the chemicals used to purge the wet bench. As such, when embedded into the wet bench, or more specifically, the chemical tank of the wet bench, the space filling device will occupy a portion of the interior volume space. As a result, less purging chemicals are used to fill and bath the wet bench.

Abstract: The present disclosure provides a routing structure. The routing structure includes a substrate having a boundary and a first conductive trace configured to be coupled to a first conductive pad disposed within the boundary of the substrate. The first conductive trace is inclined with respect to the boundary of the substrate.

Abstract: The present invention discloses a device for influent distribution and thickened sludge fermentation to enhance hydraulic impact resistance and nitrogen and phosphorus removal function of an MSBR system, which includes an influent distribution device, a hydrolysis and fermentation tank and an MSBR system connected thereto. The influent distribution device, the hydrolysis and fermentation tank and the MSBR system are all connected to an external online control platform.

Abstract: Various techniques are disclosed for automatically generating sub-cells for a non-final layout of an analog integrated circuit. Device specifications and partition information for the analog integrated circuit is received. Based on the device specifications and the partition information, first cut locations for a first set of cuts to be made along a first direction of a non-final layout of the analog integrated circuit and second cut locations for a second set of cuts to be made along a second direction in the non-final layout are determined. The first set of cuts are made in the non-final layout at the cut locations to produce a temporary layout. The second set of cuts are made in the temporary layout at the cut locations to produce a plurality of sub-cells.

Abstract: A semiconductor device includes a channel layer, an interfacial layer, a gate dielectric layer, a gate electrode, dipole elements, and additional elements. The interfacial layer is disposed on the channel layer, and includes an insulating material. The gate dielectric layer is disposed over the interfacial layer such that the channel layer is separated from the gate dielectric layer by the interfacial layer. The gate electrode is disposed on the gate dielectric layer. The dipole elements are present in at least one of the interfacial layer and the gate dielectric layer in a predetermined amount such that the semiconductor device has a predetermined threshold voltage. The additional elements are located at a region where the dipole elements are present so as to reduce interfacial defects caused by the dipole elements. The additional elements are different from the dipole elements. Methods for manufacturing the semiconductor device are also disclosed.

Abstract: A Faraday shield, a semiconductor processing apparatus, and an etching apparatus are provided. The Faraday shield includes a plurality of conductive slices and a spacer interposed between adjacent two of the conductive slices to electrically isolate the adjacent two of conductive slices from one another. The conductive slices are separately arranged aside one another and oriented along a circumference of the Faraday shield. A coil is wound around the circumference of the Faraday shield.

Abstract: The disclosed techniques include a space filling device to be used with a wet bench in chemical replacement procedures. The space filling device has an overall density that is higher than the chemicals used to purge the wet bench. As such, when embedded into the wet bench, or more specifically, the chemical tank of the wet bench, the space filling device will occupy a portion of the interior volume space. As a result, less purging chemicals are used to fill and bath the wet bench.

Abstract: A semiconductor structure includes a plurality of semiconductor devices, each of which includes at least one channel layer, at least one interfacial layer, a gate dielectric layer, a gate electrode, and dipole elements. The at least one interfacial layer is disposed on the at least one channel layer. The gate dielectric layer is disposed over the at least one interfacial layer such that the at least one channel layer is separated from the gate dielectric layer through the at least one interfacial layer. The gate electrode is disposed on the gate dielectric layer. The dipole elements are present in the interfacial layer of at least one of the semiconductor devices in a predetermined amount such that the at least one of the semiconductor devices has a tunability of threshold voltage from that of the other of the semiconductor devices. Methods for manufacturing the semiconductor structure are also disclosed.

Abstract: An electrochemical test base and apparatus for activated clotting time (ACT) is provided. The base includes a chip inlet. A magnetic field change structure is disposed above or below a position of the chip inlet. An ACT test chip is inserted from the chip inlet. The magnetic field change structure uniformly mixes a blood sample and a reactive reagent in the ACT test chip. The ACT test chip added with the blood sample is inserted from the chip inlet of the base. The magnetic field change structure is disposed above or below the position of the chip inlet, and applies a magnetic field to the chip. The magnetic field change structure can generate a changing magnetic field. An inertial magnetic rotating rod in a chip test cavity uniformly mixes the blood sample and the reactive reagent in the chip for thorough reaction, to ensure accurate test results, thereby resolving problems of the hysteresis and poor stability of test results.

Abstract: A ramp buffer circuit includes an input device having an input coupled to receive a ramp signal. A bias current source is coupled to an output of the input device. The input device and the bias current source are coupled between a power line and ground. An assist current source is coupled between the output of the input device and ground. The assist current source is configured to conduct an assist current from the output of the input device to ground only during a ramp event generated in the ramp signal.

Abstract: A switch driver circuit includes a plurality of pullup transistors. The plurality of pullup transistors includes a first pullup transistor coupled between a voltage supply and a first output node. A plurality of pulldown transistors includes a first pulldown transistor coupled between the first output node and a ground node. A slope control circuit is coupled to the ground node. A plurality of global connection switches includes a first global connection switch coupled between the first output node and the slope control circuit.

Abstract: The present application relates to an illumination system. The illumination system comprises: a first electric appliance driver, wherein a second electric appliance driver is electrically connected to the first electric appliance driver and is configured to receive power-source power from the first electric appliance driver, to convert the power-source power into driving power, and also to perform signal detection on the power-source power and generate a control signal for controlling an illumination unit and related accessories. The technical solution of the present application facilitates providing of power or control signals to an illumination unit and related accessories.