Patents by Inventor Sheng-Chen Liao

Sheng-Chen Liao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • COPOLYMER OF DCPD-CONTAINING BENZOXAZINE (DCPDBZ) AND CYANATE ESTER RESIN, AND METHOD OF MANUFACTURING THE COPOLYMER
    Publication number: 20160137786
    Abstract: A copolymer of DCPD-containing benzoxazine (DCPDBz) and cyanate ester resin forms a low-dielectric thermosetting polymeric material for making electronic components. A method of manufacturing the copolymer is also introduced. The method includes allowing DCPD-phenol oligomer, aniline, and paraformaldehyde to react at 110° C. for 6-12 hours before being extracted and baked to obtain DCPDBz; and mixing cyanate ester and the DCPDBz at 150° C.; heating the mixture up to 220° C.
    Type: Application
    Filed: November 18, 2014
    Publication date: May 19, 2016
    Inventors: WEN-CHIUNG SU, CHING-HSUAN LIN, SHENG-CHEN LIAO, YU-WEI CHOU
  • Copolymer of DCPD-containing benzoxazine (DCPDBz) and cyanate ester resin, and method of manufacturing the copolymer
    Patent number: 9321889
    Abstract: A copolymer of DCPD-containing benzoxazine (DCPDBz) and cyanate ester resin forms a low-dielectric thermosetting polymeric material for making electronic components. A method of manufacturing the copolymer is also introduced. The method includes allowing DCPD-phenol oligomer, aniline, and paraformaldehyde to react at 110° C. for 6-12 hours before being extracted and baked to obtain DCPDBz; and mixing cyanate ester and the DCPDBz at 150° C.; heating the mixture up to 220° C.
    Type: Grant
    Filed: November 18, 2014
    Date of Patent: April 26, 2016
    Assignee: NATIONAL CHUNG SHAN INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Wen-Chiung Su, Ching-Hsuan Lin, Sheng-Chen Liao, Yu-Wei Chou