Patents by Inventor Sheng-Ching Chen

Sheng-Ching Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Product-display system
    Patent number: 11913597
    Abstract: A product-display system for displaying and securing a retail product. The system may include a retainer having a retainer bracket and a retainer body coupled to the retainer bracket. A retaining cable may be coupled to the retainer body at an opening in the retainer body. A fastener that may be unfastened to release the product from the retainer may only be accessed through the opening of the retainer body such that when the retaining cable is coupled to the opening, no fasteners of the retainer may be visible or accessible. The system may also include a display stem for holding the retainer and product. The display stem may include a recess for receiving at least a portion of the retainer body. The retaining cable may extend through the display stem and may simultaneously transmit power and data to a displayed product. The retainer may be returned to and held on top of the display stem using a retaining cable.
    Type: Grant
    Filed: December 1, 2021
    Date of Patent: February 27, 2024
    Assignee: Apple Inc.
    Inventors: Sheng Yang, Eric W. Wang, Steven C. Michalske, Olivia Ching, Clayton R. Woosley, Samuel Wing Man Yuen, Paul Joseph Hack, Ricardo A Mariano, Chien Tsun Chen, George Tziviskos, Charles A. Schwalbach
  • Semiconductor device having a spacer and a liner overlying a sidewall of a gate structure and method of forming the same
    Patent number: 8860151
    Abstract: A semiconductor device includes a gate structure over a substrate. The device further includes an isolation feature in the substrate and adjacent to an edge of the gate structure. The device also includes a spacer overlying a sidewall of the gate structure. The spacer has a bottom lower than a top surface of the substrate.
    Type: Grant
    Filed: March 1, 2013
    Date of Patent: October 14, 2014
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Sheng-Ching Chen, Kuang-Hsin Chen, Bor-Zen Tien, Tzong-Sheng Chang
  • SEMICONDUCTOR DEVICE HAVING A SPACER AND A LINER OVERLYING A SIDEWALL OF A GATE STRUCTURE AND METHOD OF FORMING THE SAME
    Publication number: 20140246709
    Abstract: A semiconductor device includes a gate structure over a substrate. The device further includes an isolation feature in the substrate and adjacent to an edge of the gate structure. The device also includes a spacer overlying a sidewall of the gate structure. The spacer has a bottom lower than a top surface of the substrate.
    Type: Application
    Filed: March 1, 2013
    Publication date: September 4, 2014
    Inventors: Sheng-Ching Chen, Kuang-Hsin Chen, Bor-Zen Tien, Tzong-Sheng Chang