Patents by Inventor Sheng Cho

Sheng Cho has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20260107486
    Abstract: A bipolar junction transistor includes an emitter region, a base region, a collector region and an isolation structure. The base region is disposed adjacent to a first side of the emitter region. The collector region is disposed adjacent to a second side of the emitter region. The isolation structure is disposed between the emitter region and each of the base region and the collector region.
    Type: Application
    Filed: November 13, 2024
    Publication date: April 16, 2026
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventor: Sheng Cho
  • Patent number: 12557327
    Abstract: A semiconductor device includes a substrate; a fin structure disposed over the substrate; a gate structure disposed over the substrate, wherein an extension direction of the fin structure intersects an extension direction of the gate structure; and a first well disposed under the gate structure, corresponding to an emitter region of the semiconductor device, and having a first conductivity type, wherein the first well is adjacent to a well block layer, and the well block layer is disposed under the gate structure in the emitter region; wherein the well block layer has a first doping concentration of a well implant, the first well has a second doping concentration of the well implant, and the first doping concentration is less than the second doping concentration.
    Type: Grant
    Filed: September 6, 2022
    Date of Patent: February 17, 2026
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Chen-Wei Pan, Sheng Cho
  • Publication number: 20240014323
    Abstract: A semiconductor device includes a substrate; a fin structure disposed over the substrate; a gate structure disposed over the substrate, wherein an extension direction of the fin structure intersects an extension direction of the gate structure; and a first well disposed under the gate structure, corresponding to an emitter region of the semiconductor device, and having a first conductivity type, wherein the first well is adjacent to a well block layer, and the well block layer is disposed under the gate structure in the emitter region; wherein the well block layer has a first doping concentration of a well implant, the first well has a second doping concentration of the well implant, and the first doping concentration is less than the second doping concentration.
    Type: Application
    Filed: September 6, 2022
    Publication date: January 11, 2024
    Inventors: Chen-Wei PAN, Sheng CHO
  • Patent number: 10727324
    Abstract: A bipolar junction transistor includes: an emitter region; a base region; and a collector region, wherein each of the emitter region, the base region, and the collector region comprises fin-shaped structures. Preferably, the emitter region, the base region, and the collector region are disposed along a first direction and the fin-shaped structures are disposed along a second direction, in which the first direction is orthogonal to the second direction.
    Type: Grant
    Filed: May 7, 2019
    Date of Patent: July 28, 2020
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Sheng Cho, Chen-Wei Pan
  • Patent number: 10665690
    Abstract: A gate-controlled bipolar junction transistor includes a substrate, an emitter region, a base region disposed on one side of the emitter region, and a collector region disposed on one side of the base region and being opposite to the emitter region. The emitter region includes first fin structures, first metal gates extending across the first fin structures, and an emitter contact plug on the first fin structures. A gate contact region is disposed between the emitter region and the base region. Each of the first metal gates includes an extended contact end portion protruding toward the base region. The extended contact end portion is disposed within the gate contact region. A gate contact is disposed on the extended contact end portion.
    Type: Grant
    Filed: October 17, 2018
    Date of Patent: May 26, 2020
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Chen-Wei Pan, Sheng Cho
  • Publication number: 20200105900
    Abstract: A gate-controlled bipolar junction transistor includes a substrate, an emitter region, a base region disposed on one side of the emitter region, and a collector region disposed on one side of the base region and being opposite to the emitter region. The emitter region includes first fin structures, first metal gates extending across the first fin structures, and an emitter contact plug on the first fin structures. A gate contact region is disposed between the emitter region and the base region. Each of the first metal gates includes an extended contact end portion protruding toward the base region. The extended contact end portion is disposed within the gate contact region. A gate contact is disposed on the extended contact end portion.
    Type: Application
    Filed: October 17, 2018
    Publication date: April 2, 2020
    Inventors: Chen-Wei Pan, Sheng Cho
  • Patent number: 10431674
    Abstract: A bipolar junction transistor preferably includes: an emitter region; a base region; and a collector region, in which an edge of the emitter region is aligned with an edge of the base region. Preferably, an edge of the base region is aligned with an edge of the collector region, the edge of the emitter region is aligned with the edges of the base region and the collector region, and the widths of the emitter region, the base region, and the collector region are equivalent. According to a top view of the bipolar junction transistor, each of the base region and the collector region includes a rectangle.
    Type: Grant
    Filed: June 6, 2017
    Date of Patent: October 1, 2019
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Sheng Cho, Chen-Wei Pan
  • Publication number: 20190267478
    Abstract: A bipolar junction transistor includes: an emitter region; a base region; and a collector region, wherein each of the emitter region, the base region, and the collector region comprises fin-shaped structures. Preferably, the emitter region, the base region, and the collector region are disposed along a first direction and the fin-shaped structures are disposed along a second direction, in which the first direction is orthogonal to the second direction.
    Type: Application
    Filed: May 7, 2019
    Publication date: August 29, 2019
    Inventors: Sheng Cho, Chen-Wei Pan
  • Publication number: 20180323292
    Abstract: A bipolar junction transistor preferably includes: an emitter region; a base region; and a collector region, in which an edge of the emitter region is aligned with an edge of the base region. Preferably, an edge of the base region is aligned with an edge of the collector region, the edge of the emitter region is aligned with the edges of the base region and the collector region, and the widths of the emitter region, the base region, and the collector region are equivalent. According to a top view of the bipolar junction transistor, each of the base region and the collector region includes a rectangle.
    Type: Application
    Filed: June 6, 2017
    Publication date: November 8, 2018
    Inventors: Sheng Cho, Chen-Wei Pan