Patents by Inventor Sheng-Hsiung Tseng

Sheng-Hsiung Tseng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Vacuum pump line with nickel-chromium heater layer
    Publication number: 20060021571
    Abstract: A vacuum pump line for a process chamber is disclosed. The vacuum pump line includes a pump line wall and a heater layer comprising a nickel-chromium alloy surrounding the pump line wall for heating the pump line wall. A method for fabricating a pump line for a process chamber is also disclosed.
    Type: Application
    Filed: July 28, 2004
    Publication date: February 2, 2006
    Inventors: Sheng-Hsiung Tseng, Yao-Pin Huang, Ming-Huang Wu, Chang-Jung Su, Stone Shyr, Yuan-Hung Chang, He-Ming Chuang
  • Electrostatic charge-free solvent-type dryer for semiconductor wafers
    Patent number: 6647998
    Abstract: An electrostatic charge-free solvent-type dryer for drying semiconductor wafers after a wet bench process is disclosed in a preferred embodiment and in an alternate embodiment. In the preferred embodiment, the electrostatic charge-free solvent-type dryer is constructed by a tank body, a wafer carrier, an elevator means, a tank cover and a conduit for feeding the flow of solvent vapor. At least one of the tank cover, the conduit for feeding the flow of solvent vapor and the plurality of partition plates is fabricated of a non-electrostatic material such that electrostatic charge is not generated in the flow of solvent vapor. In the alternate embodiment, a deionizer is further provided in the tank cavity for producing a flux of positive ions to neutralize any negative ions that are possibly produced in the flow of solvent vapor.
    Type: Grant
    Filed: June 20, 2001
    Date of Patent: November 18, 2003
    Assignee: Taiwan Semiconductor Manufacturing Co. Ltd.
    Inventors: Jih-Churng Twu, Ming-Dar Guo, Tsung-Chieh Tsai, Sheng-Hsiung Tseng, Wei-Ming You, Yao-Pin Huang, Chia-Chun Cheng, Chin-Hsiung Ho, Ming Te More
  • Electrostatic charge-free solvent-type dryer for semiconductor wafers
    Publication number: 20020195130
    Abstract: An electrostatic charge-free solvent-type dryer for drying semiconductor wafers after a wet bench process is disclosed in a preferred embodiment and in an alternate embodiment. In the preferred embodiment, the electrostatic charge-free solvent-type dryer is constructed by a tank body, a wafer carrier, an elevator means, a tank cover and a conduit for feeding the flow of solvent vapor. At least one of the tank cover, the conduit for feeding the flow of solvent vapor and the plurality of partition plates is fabricated of a non-electrostatic material such that electrostatic charge is not generated in the flow of solvent vapor. In the alternate embodiment, a deionizer is further provided in the tank cavity for producing a flux of positive ions to neutralize any negative ions that are possibly produced in the flow of solvent vapor.
    Type: Application
    Filed: June 20, 2001
    Publication date: December 26, 2002
    Applicant: Taiwan Semiconductor Manufactoring Co., Ltd.
    Inventors: Jih-Churng Twu, Ming-Dar Guo, Tsung-Chieh Tsai, Sheng-Hsiung Tseng, Wei-Ming You, Yao-Pin Huang, Chia-Chun Cheng, Chin-Hsiung Ho, Ming Te More