Abstract: A photolithography projection lens, having a plurality of lens elements and a light diaphragm arranged among them, arranged along an optical axis, and comprising an object side and an image side respectively arranged at the front and rear ends of the plurality of lens elements; wherein: the diopters of the two lenses respectively near the object side and the image side must be positive; each of the lens elements is a single lens without cement; the angle between the chief rays at different image height positions and the optical axis is <1 degree, and the angle between the chief rays at different object height positions and the optical axis is <1 degree; and under the projection of 350˜450 nm wavelength light, it provide the imaging effect of precise magnification.

Abstract: A detection method includes: determining process data of a new process; according to the process data of the new process, detecting, by a first production system, whether a wafer carrier type of the new process matches an acceptable level of a corresponding process step or not and whether the new process matches a flag of the corresponding process step or not; if not, determining that the process data does not pass the detection and outputting first detection information; or if the wafer carrier type of the new process matches the acceptable level of the corresponding process step and the new process matches the flag of the corresponding process step, detecting, by a second production system, if the second production system detects a mismatch, determining that the process data does not pass the detection and outputting second detection information.

Abstract: A detection method includes: determining process data of a new process; according to the process data of the new process, detecting, by a first production system, whether a wafer carrier type of the new process matches an acceptable level of a corresponding process step or not and whether the new process matches a flag of the corresponding process step or not; if not, determining that the process data does not pass the detection and outputting first detection information; or if the wafer carrier type of the new process matches the acceptable level of the corresponding process step and the new process matches the flag of the corresponding process step, detecting, by a second production system, if the second production system detects a mismatch, determining that the process data does not pass the detection and outputting second detection information.

Abstract: The present disclosure provides a semiconductor intelligent detection system, an intelligent detection method and a storage medium. The semiconductor intelligent detection system includes: a data import module, configured to acquire a data table to-be-detected; a data storage module, having a process resource database stored therein, a data type of data stored in the process resource database being used to perform data detection on items to-be-detected of a corresponding type; a resource detection module, connected to the data import module and the data storage module; wherein the resource detection module is configured to perform data detection on the items to-be-detected in the data table to-be-detected one by one, and record wrong items to-be-detected in an abnormity information table; and, an abnormity export module, connected to the resource detection module and configured to detect whether the resource detection module has detected the last item to-be-detected in the data table to-be-detected.

Abstract: A data monitoring method for a standardized management system includes: obtaining log files of a standardized management system; parsing the log files to obtain parsed data, and saving the parsed data in a database; and displaying queried target data and historical data corresponding to the target data on a same interface according to a preset rule and the database.

Abstract: A method for processing process data, a process data processing apparatus, a computer-readable storage medium, and an electronic equipment are provided, belonging to the field of manufacturing technology. The method includes: acquiring modified data for process data; checking whether the modified data is compliant according to the fields of the modified data; and generating a modification record according to the modified data when it is determined that the modified data is compliant.

Abstract: The present disclosure provides a method and an apparatus for setting wafer script, a device, and a storage medium. In response to the demand unit determining that the execution necessary condition of the script to be executed satisfies the business requirement based on the parameter information, the platform unit acquires the lot identification of the script to be executed and the corresponding production information. In response to the demand unit determining that the script to be executed is executed for the wafers corresponding to the script to be executed for the first time, the platform unit detects whether the first production information corresponding to the first wafers satisfies the execution necessary condition. If satisfied, the platform unit sets parameter information and assignment information for the first wafers, and synchronizes the first wafers with the set information to the material execution unit such that the material execution unit performs corresponding operation.