Patents by Inventor Sheng-Huan LlU

Sheng-Huan LlU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • CMP POLISHING PAD HAVING EDGE EXCLUSION REGION OF OFFSET CONCENTRIC GROOVE PATTERN
    Publication number: 20150111476
    Abstract: The invention provides a polishing pad and a method of using the polishing pad for chemically-mechanically polishing a substrate. The polishing pad comprises at least a grooved region and an exclusion region, wherein the exclusion region is adjacent to the circumference of the polishing pad, and wherein the exclusion region is devoid of grooves.
    Type: Application
    Filed: October 16, 2014
    Publication date: April 23, 2015
    Inventors: Ching-Ming TSAI, Shi-Wei CHENG, Jia-Cheng HSU, Kun-Shu YANG, Hui-Feng CHEN, Gregory GAUDET, Sheng-Huan LlU