Patents by Inventor Sheng-Jen Yu
Sheng-Jen Yu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20120058033Abstract: The present invention relates to a method for treating fluoro-containing and silicon-containing gas. The method comprises treating the gas with thermal-treating, particles-treating, catalyst-treating, and acid-removing sequentially to remove perfluorocompounds. The invention achieves results of reducing the working temperature, increasing the lifetime of the catalyst, reducing the operating cost of the system, and increasing the applications of the catalyst in the aspect of fluoride-containing gas, silicon-containing gas and particles containing gas treatment by sequential treating.Type: ApplicationFiled: November 15, 2011Publication date: March 8, 2012Applicant: Industrial Technology Research InstituteInventors: Sheng-Jen YU, Shou-Nan LI, Shao-I YEN, Tzu-Ming CHEN
-
Patent number: 7833324Abstract: A wet electrostatic precipitator is disclosed to include a condensation-growth chamber, a precipitation chamber connecting with the condensation-growth chamber, three dual-sleeve members mounted in the precipitation chamber, three discharge electrodes connecting with the dual-sleeve members, two insulating members covering on the inner surface of the precipitation chamber, and two ground electrodes mounted on the outside of the precipitation chamber. Thus, a uniform water film is formed on the surface of the insulating members to wash away the particles from waste gas. The condensation-growth chamber is provided for the particles to grow therein and thereby enhances the collection efficiency. The insulating member acts as a shield between the discharge electrodes and the ground electrodes and thereby avoids a short circuit or sparks.Type: GrantFiled: November 14, 2008Date of Patent: November 16, 2010Assignee: Industrial Technology Research InstituteInventors: Tzu-Mimg Chen, Shou-Nan Li, Chuen-Jinn Tsai, Sheng-Jen Yu, Guan-Yu Lin
-
Publication number: 20090314162Abstract: A wet electrostatic precipitator is disclosed to include a condensation-growth chamber, a precipitation chamber connecting with the condensation-growth chamber, three dual-sleeve members mounted in the precipitation chamber, three discharge electrodes connecting with the dual-sleeve members, two insulating members covering on the inner surface of the precipitation chamber, and two ground electrodes mounted on the outside of the precipitation chamber. Thus, a uniform water film is formed on the surface of the insulating members to wash away the particles from waste gas. The condensation-growth chamber is provided for the particles to grow therein and thereby enhances the collection efficiency. The insulating member acts as a shield between the discharge electrodes and the ground electrodes and thereby avoids a short circuit or sparks.Type: ApplicationFiled: November 14, 2008Publication date: December 24, 2009Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Tzu-Mimg CHEN, Shou-Nan Li, Chuen-Jinn Tsai, Sheng-Jen Yu, Guan-Yu Lin
-
Patent number: 7572320Abstract: A method for removing high concentration ozone from a waste gas stream is disclosed, which includes the following steps: (1) providing an apparatus, which includes: a tank having an input port, an exhaust port and a packing, wherein the input port is near the bottom of the tank, the exhaust port is on the top of the tank, and the packing is contained in the tank; a liquid injection element for injecting reductant solution through the packing; and a storage vessel connecting to the liquid injection element; (2) transporting a gas into the tank through the input port for contacting the reductant solution; and (3) the gas exiting the reactor by way of the exhaust port.Type: GrantFiled: August 31, 2005Date of Patent: August 11, 2009Assignee: Industrial Technology Research InstituteInventors: Shaw-Yi Yan, Sheng-Jen Yu, Shou-Nan Li, Chang-Fu Hsu, Ping-Chung Chung
-
Publication number: 20090145741Abstract: The present invention relates to a method for treating fluoro-containing and silicon-containing gas. The method comprises treating the gas with thermal-treating, particles-treating, catalyst-treating, and acid-removing sequentially to remove perfluorocompounds. The invention achieves results of reducing the working temperature, increasing the lifetime of the catalyst, reducing the operating cost of the system, and increasing the applications of the catalyst in the aspect of fluoride-containing gas, silicon-containing gas and particles containing gas treatment by sequential treating.Type: ApplicationFiled: April 7, 2008Publication date: June 11, 2009Applicant: Industrial Technology Research InstituteInventors: Sheng-Jen Yu, Shou-Nan Li, Shao-I Yen, Tzu-Ming Chen
-
Patent number: 7528373Abstract: A system for detection of gas leakage sources. An open-path FTIR detection system is located before the return filter of recirculating air of a factory to detect gas composition of recirculating air and transmits the result to a data server through a communication network. A multi-port extractive FTIR system is located in the factory to collect and detect gas sample of local area air using pipelines located in different areas and transmits the result of gas composition to the data server through the communication network. An IR monitor system obtains the gas composition from the data server through the communication network. A process exhaust management system obtains the gas composition from the IR monitor system through the communication network for the analysis of a gas leakage source.Type: GrantFiled: July 6, 2006Date of Patent: May 5, 2009Assignee: Industrial Technology Research InstituteInventors: Gen-Hou Leu, Shaw-Yi Yan, Hui-Ya Shih, Sheng-Jen Yu
-
Publication number: 20070007450Abstract: A system for detection of gas leakage sources. An open-path FTIR detection system is located before the return filter of recirculating air of a factory to detect gas composition of recirculating air and transmits the result to a data server through a communication network. A multi-port extractive FTIR system is located in the factory to collect and detect gas sample of local area air using pipelines located in different areas and transmits the result of gas composition to the data server through the communication network. An IR monitor system obtains the gas composition from the data server through the communication network. A process exhaust management system obtains the gas composition from the IR monitor system through the communication network for the analysis of a gas leakage source.Type: ApplicationFiled: July 6, 2006Publication date: January 11, 2007Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Gen-Hou Leu, Shaw-Yi Yan, Hui-Ya Shih, Sheng-Jen Yu
-
Publication number: 20060042465Abstract: A method for removing high concentration ozone from a waste gas stream is disclosed, which includes the following steps: (1) providing an apparatus, which includes: a tank having an input port, an exhaust port and a packing, wherein the input port is near the bottom of the tank, the exhaust port is on the top of the tank, and the packing is contained in the tank; a liquid injection element for injecting reductant solution through the packing; and a storage vessel connecting to the liquid injection element; (2) transporting a gas into the tank through the input port for contacting the reductant solution; and (3) the gas exiting the reactor by way of the exhaust port.Type: ApplicationFiled: August 31, 2005Publication date: March 2, 2006Applicant: Industrial Technology Research InstituteInventors: Shaw-Yi Yan, Sheng-Jen Yu, Shou-Nan Li, Chang-Fu Hsu, Ping-Chung Chung
-
Patent number: 6700093Abstract: A dielectric barrier discharge apparatus and module for perfluorocompound (PFC) abatement. The apparatus includes a housing, first dielectric tube disposed in the housing, a second dielectric tube disposed in the first dielectric tube, and at least one electrode disposed in the housing. By this arrangement, a first cooling gas passage is formed between the housing and the first dielectric tube, a PFC passage is formed between the first and second dielectric tubes, and a second cooling gas passage is formed in the second dielectric tube. When the applied voltage for the electrodes is greater than a breakdown voltage, high energetic electrons generated in the PFC passage can ionize or dissociate the PFC to be removed. Meanwhile, cooling gas is introduced to the cooling gas passage for cooling the electrodes. A dielectric barrier discharge module composed of a plurality of dielectric barrier discharge apparatuses is provided to promote the capacity of the treatment of PFC gases.Type: GrantFiled: June 28, 2002Date of Patent: March 2, 2004Assignee: Industrial Technology Research InstituteInventors: Shin-Fu Chiou, Gen-Hou Leu, Sheng-Jen Yu
-
Publication number: 20030116541Abstract: A dielectric barrier discharge apparatus and module for perfluorocompound (PFC) abatement. The apparatus includes a housing, first dielectric tube disposed in the housing, a second dielectric tube disposed in the first dielectric tube, and at least one electrode disposed in the housing. By this arrangement, a first cooling gas passage is formed between the housing and the first dielectric tube, PFC passage is formed between the first and second dielectric tubes, and a second cooling gas passage is formed in the second dielectric tube. When the applied voltage for the electrodes is greater than a breakdown voltage, high energetic electrons generated in the PFC passage can ionize or dissociate the PFC to be removed. Meanwhile, cooling gas is introduced to the cooling gas passage for cooling the electrodes. A dielectric barrier discharge module composed of a plurality of dielectric barrier discharge apparatuses is provided to promote the capacity of the treatment of PFC gases.Type: ApplicationFiled: June 28, 2002Publication date: June 26, 2003Inventors: Shin-Fu Chiou, Gen-Hou Leu, Sheng-Jen Yu