Patents by Inventor Sheng-Jen Yu

Sheng-Jen Yu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120058033
    Abstract: The present invention relates to a method for treating fluoro-containing and silicon-containing gas. The method comprises treating the gas with thermal-treating, particles-treating, catalyst-treating, and acid-removing sequentially to remove perfluorocompounds. The invention achieves results of reducing the working temperature, increasing the lifetime of the catalyst, reducing the operating cost of the system, and increasing the applications of the catalyst in the aspect of fluoride-containing gas, silicon-containing gas and particles containing gas treatment by sequential treating.
    Type: Application
    Filed: November 15, 2011
    Publication date: March 8, 2012
    Applicant: Industrial Technology Research Institute
    Inventors: Sheng-Jen YU, Shou-Nan LI, Shao-I YEN, Tzu-Ming CHEN
  • Patent number: 7833324
    Abstract: A wet electrostatic precipitator is disclosed to include a condensation-growth chamber, a precipitation chamber connecting with the condensation-growth chamber, three dual-sleeve members mounted in the precipitation chamber, three discharge electrodes connecting with the dual-sleeve members, two insulating members covering on the inner surface of the precipitation chamber, and two ground electrodes mounted on the outside of the precipitation chamber. Thus, a uniform water film is formed on the surface of the insulating members to wash away the particles from waste gas. The condensation-growth chamber is provided for the particles to grow therein and thereby enhances the collection efficiency. The insulating member acts as a shield between the discharge electrodes and the ground electrodes and thereby avoids a short circuit or sparks.
    Type: Grant
    Filed: November 14, 2008
    Date of Patent: November 16, 2010
    Assignee: Industrial Technology Research Institute
    Inventors: Tzu-Mimg Chen, Shou-Nan Li, Chuen-Jinn Tsai, Sheng-Jen Yu, Guan-Yu Lin
  • Publication number: 20090314162
    Abstract: A wet electrostatic precipitator is disclosed to include a condensation-growth chamber, a precipitation chamber connecting with the condensation-growth chamber, three dual-sleeve members mounted in the precipitation chamber, three discharge electrodes connecting with the dual-sleeve members, two insulating members covering on the inner surface of the precipitation chamber, and two ground electrodes mounted on the outside of the precipitation chamber. Thus, a uniform water film is formed on the surface of the insulating members to wash away the particles from waste gas. The condensation-growth chamber is provided for the particles to grow therein and thereby enhances the collection efficiency. The insulating member acts as a shield between the discharge electrodes and the ground electrodes and thereby avoids a short circuit or sparks.
    Type: Application
    Filed: November 14, 2008
    Publication date: December 24, 2009
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Tzu-Mimg CHEN, Shou-Nan Li, Chuen-Jinn Tsai, Sheng-Jen Yu, Guan-Yu Lin
  • Patent number: 7572320
    Abstract: A method for removing high concentration ozone from a waste gas stream is disclosed, which includes the following steps: (1) providing an apparatus, which includes: a tank having an input port, an exhaust port and a packing, wherein the input port is near the bottom of the tank, the exhaust port is on the top of the tank, and the packing is contained in the tank; a liquid injection element for injecting reductant solution through the packing; and a storage vessel connecting to the liquid injection element; (2) transporting a gas into the tank through the input port for contacting the reductant solution; and (3) the gas exiting the reactor by way of the exhaust port.
    Type: Grant
    Filed: August 31, 2005
    Date of Patent: August 11, 2009
    Assignee: Industrial Technology Research Institute
    Inventors: Shaw-Yi Yan, Sheng-Jen Yu, Shou-Nan Li, Chang-Fu Hsu, Ping-Chung Chung
  • Publication number: 20090145741
    Abstract: The present invention relates to a method for treating fluoro-containing and silicon-containing gas. The method comprises treating the gas with thermal-treating, particles-treating, catalyst-treating, and acid-removing sequentially to remove perfluorocompounds. The invention achieves results of reducing the working temperature, increasing the lifetime of the catalyst, reducing the operating cost of the system, and increasing the applications of the catalyst in the aspect of fluoride-containing gas, silicon-containing gas and particles containing gas treatment by sequential treating.
    Type: Application
    Filed: April 7, 2008
    Publication date: June 11, 2009
    Applicant: Industrial Technology Research Institute
    Inventors: Sheng-Jen Yu, Shou-Nan Li, Shao-I Yen, Tzu-Ming Chen
  • Patent number: 7528373
    Abstract: A system for detection of gas leakage sources. An open-path FTIR detection system is located before the return filter of recirculating air of a factory to detect gas composition of recirculating air and transmits the result to a data server through a communication network. A multi-port extractive FTIR system is located in the factory to collect and detect gas sample of local area air using pipelines located in different areas and transmits the result of gas composition to the data server through the communication network. An IR monitor system obtains the gas composition from the data server through the communication network. A process exhaust management system obtains the gas composition from the IR monitor system through the communication network for the analysis of a gas leakage source.
    Type: Grant
    Filed: July 6, 2006
    Date of Patent: May 5, 2009
    Assignee: Industrial Technology Research Institute
    Inventors: Gen-Hou Leu, Shaw-Yi Yan, Hui-Ya Shih, Sheng-Jen Yu
  • Publication number: 20070007450
    Abstract: A system for detection of gas leakage sources. An open-path FTIR detection system is located before the return filter of recirculating air of a factory to detect gas composition of recirculating air and transmits the result to a data server through a communication network. A multi-port extractive FTIR system is located in the factory to collect and detect gas sample of local area air using pipelines located in different areas and transmits the result of gas composition to the data server through the communication network. An IR monitor system obtains the gas composition from the data server through the communication network. A process exhaust management system obtains the gas composition from the IR monitor system through the communication network for the analysis of a gas leakage source.
    Type: Application
    Filed: July 6, 2006
    Publication date: January 11, 2007
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Gen-Hou Leu, Shaw-Yi Yan, Hui-Ya Shih, Sheng-Jen Yu
  • Publication number: 20060042465
    Abstract: A method for removing high concentration ozone from a waste gas stream is disclosed, which includes the following steps: (1) providing an apparatus, which includes: a tank having an input port, an exhaust port and a packing, wherein the input port is near the bottom of the tank, the exhaust port is on the top of the tank, and the packing is contained in the tank; a liquid injection element for injecting reductant solution through the packing; and a storage vessel connecting to the liquid injection element; (2) transporting a gas into the tank through the input port for contacting the reductant solution; and (3) the gas exiting the reactor by way of the exhaust port.
    Type: Application
    Filed: August 31, 2005
    Publication date: March 2, 2006
    Applicant: Industrial Technology Research Institute
    Inventors: Shaw-Yi Yan, Sheng-Jen Yu, Shou-Nan Li, Chang-Fu Hsu, Ping-Chung Chung
  • Patent number: 6700093
    Abstract: A dielectric barrier discharge apparatus and module for perfluorocompound (PFC) abatement. The apparatus includes a housing, first dielectric tube disposed in the housing, a second dielectric tube disposed in the first dielectric tube, and at least one electrode disposed in the housing. By this arrangement, a first cooling gas passage is formed between the housing and the first dielectric tube, a PFC passage is formed between the first and second dielectric tubes, and a second cooling gas passage is formed in the second dielectric tube. When the applied voltage for the electrodes is greater than a breakdown voltage, high energetic electrons generated in the PFC passage can ionize or dissociate the PFC to be removed. Meanwhile, cooling gas is introduced to the cooling gas passage for cooling the electrodes. A dielectric barrier discharge module composed of a plurality of dielectric barrier discharge apparatuses is provided to promote the capacity of the treatment of PFC gases.
    Type: Grant
    Filed: June 28, 2002
    Date of Patent: March 2, 2004
    Assignee: Industrial Technology Research Institute
    Inventors: Shin-Fu Chiou, Gen-Hou Leu, Sheng-Jen Yu
  • Publication number: 20030116541
    Abstract: A dielectric barrier discharge apparatus and module for perfluorocompound (PFC) abatement. The apparatus includes a housing, first dielectric tube disposed in the housing, a second dielectric tube disposed in the first dielectric tube, and at least one electrode disposed in the housing. By this arrangement, a first cooling gas passage is formed between the housing and the first dielectric tube, PFC passage is formed between the first and second dielectric tubes, and a second cooling gas passage is formed in the second dielectric tube. When the applied voltage for the electrodes is greater than a breakdown voltage, high energetic electrons generated in the PFC passage can ionize or dissociate the PFC to be removed. Meanwhile, cooling gas is introduced to the cooling gas passage for cooling the electrodes. A dielectric barrier discharge module composed of a plurality of dielectric barrier discharge apparatuses is provided to promote the capacity of the treatment of PFC gases.
    Type: Application
    Filed: June 28, 2002
    Publication date: June 26, 2003
    Inventors: Shin-Fu Chiou, Gen-Hou Leu, Sheng-Jen Yu